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Multipak

Manufactured by Physical Electronics
Sourced in United States

MultiPak is a versatile analytical instrument designed for material characterization. It provides a comprehensive suite of analytical techniques, including X-ray photoelectron spectroscopy (XPS), Auger electron spectroscopy (AES), and ion scattering spectroscopy (ISS), all integrated into a single system. MultiPak enables researchers and analysts to perform in-depth surface and depth-profile analyses of a wide range of materials, from thin films to bulk samples.

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8 protocols using multipak

1

Surface Elemental Composition Analysis by XPS

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An X-ray photoelectron spectrometer (XPS; PHI 5000 VersaProbe III, ULVAC Inc.) was used to quantify the surface elemental composition with a monochromatic Al Kα X-ray source (45°, 1486.6 eV, 50 W, sampling area; 200-μm diameter). Survey spectra were collected using a pass energy of 280 eV and a step size of 1.0 eV. Charge compensation was used, and spectra were calibrated to the C 1s signal at 284.8 eV. Surface elemental composition [as atomic composition (At %)] was determined using MultiPak (ULVAC Inc) from background-subtracted (system optimized) peak areas (n>3).
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2

Microstructural and Chemical Analysis of Metallic Glasses

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A field emission scanning electron microscope (S8230; Regulus, Tokyo, Japan) in second-electron mode with an energy-dispersive spectrometer was used to characterize the microstructure and element mapping of the surface and cross section of MGs. The acceleration voltage and working distance were set to 15 kV and 15 mm, respectively. X-ray photoelectron spectroscopy (XPS) using a PHI Quantera II SXM system (ULVAC-PHI, Kanagawa, Japan) was employed to characterize the surface chemical state of samples with Al K α radiation (1486.6 eV) as the excitation source to record the data. The spectral charge was corrected with the binding energy of the C1s signal. The Shirley method was carried out for background subtraction of all spectra. The survey spectrum and high-resolution spectra for the Mg2p signal were imported to MultiPak (ULVAC-PHI) involving Gaussian multi-peak fitting for further analyses.
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3

X-ray Photoelectron Spectroscopy Analysis

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A PHI 5000 VersaProbe III (ULVAC Inc., Japan) X-ray photoelectron spectrometer (XPS) was used to measure surface elemental composition with a monochromatic Al Kα X-ray source (45°, 1486.6 eV, 50 W, sampling area; 200 μm diameter). Survey spectra were collected using a pass energy of 280 eV with a step size of 1.0 eV. Charge compensation was used and calibrated with the C 1s signal located at 284.8 eV. Surface elemental composition [as atomic composition (atomic %)] was determined using MultiPak (ULVAC Inc.) from background-subtracted (system optimized) peak areas.
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4

XPS Analysis of Chemical Surfaces

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The chemical surface compositions were analyzed by high-resolution X-ray photoelectron spectroscopy (XPS) using a PHI VersaProbe II (Ulvac-phi, Inc., Chigasaki, Japan) with a monochromatic Al-Kα source, and photon energy of 1486.6 eV. The X-ray source used had a power of 100 W, whereby the sample surface was scanned with a beam size of 100 µm over an area of 1400 × 200 µm². High-resolution spectra of the coated and uncoated samples (n = 6) were recorded with a pass energy of 46.95 eV and a step size of 0.1 eV, with a constant electron take off angle of 45°. The spectrometer was calibrated to the copper and gold reference lines (932.62 eV and 83.96 eV), whereas the minimum detector resolution measured at the silver peak Ag (3d5/2) was 0.6 eV, with a pass energy of 23.5 eV. The measurements were obtained at room temperature and a base pressure of 2 × 10−6 Pa. To avoid charging effects, all measurements were carried out with charge compensation by utilizing a cold cathode electron flood source and low-energy argon ions. All spectra were shifted to the carbon peak (C1s) to 284.6 eV. The data analyses were performed using the software MultiPak (version 9.9.0.8, Ulvac-phi, Inc., Chigasaki, Japan).
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5

XPS Characterization of Materials

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The XPS measurements were carried out with the PHI 5000 VersaProbe II XPS system (Physical Electronics) with a monochromatic Al-K α source (15 kV, 50 W) and photon energy of 1486.7 eV. All spectra were recorded in a vacuum of 1.2 × 10 -7 Pa at a room temperature of 20 °C. The analyzed area of the sample was a spot of 200 µm in diameter. The survey spectra were recorded at a pass energy of 187.850 eV with an electronvolt step of 0.8 eV; the high-resolution spectra were recorded at a pass energy of 23.500 eV with an electronvolt step of 0.2 eV. Dual beam charge compensation was used for all measurements. The spectra were evaluated with the MultiPak (Ulvac -PHI, Inc.) software. All binding energy (BE) values were referenced to the carbon peak C 1s at 284.80 eV.
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6

X-ray Photoelectron Spectroscopy Analysis

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The samples were analyzed using a TFA XPS spectrometer (Physical Electronics Inc., Chanhassen, MN, USA) equipped with a monochromated Al-Kα X-ray source under ultra-high vacuum. The high-energy-resolution spectra of the characteristic peaks for elements Fe 2p, Fe 3p, O 1s, N 1s, and C 1s were recorded over a narrow energy range. The spectra were analyzed using MultiPak, Physical Electronics Inc., Chanhassen, MN, USA.
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7

Surface Characterization via XPS

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X-ray photoelectron spectroscopy (Quantera II, Physical Electronics, Chanhassen, MN, USA) was used to further elucidate the chemical composition of the surface of the samples. Survey scans were taken at a pass energy of 140 eV, after which atomic percentage concentrations were calculated from the elemental peak area. Results were averaged after 10 measurement cycles. Prior to measurements, samples were sputtered at 500 V for one minute to remove surface contamination. Ion and electron guns were turned on during measurements to neutralize the surface charge build-up of the non-conductive samples. Data analysis was performed using the MultiPak software (Version 9.6, Physical Electronics, Chanhassen, MN, USA).
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8

XPS Analysis of PDA and LAPDA Films

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XPS spectra of the pristine PDA and LAPDA films were obtained using Phi 5600 XPS (Perkin Elmer, USA) to analyze atomic compositions. A monochromatic X-ray source (Al Kα) was used for the data collection. To avoid the effect of surface charging, the neutralizer was applied simultaneously to the surfaces with a constant current (~1 µA). The at.%s were calculated by deconvolution of the XPS spectra with MATLAB-based software (MultiPak) provided by Physical Electronics, Inc.
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