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Tetraethoxysilane

Sourced in China

Tetraethoxysilane is a chemical compound used as a precursor in the synthesis of silica and silicate materials. It is a clear, colorless liquid with a distinct odor. Tetraethoxysilane serves as a key starting material in the production of various silicon-based materials and coatings.

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2 protocols using tetraethoxysilane

1

Synthesis of Functional Polymer Nanoparticles

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N-isopropyl acrylamide (NIPAM, 99%), 3-(methoxymethylsilyl) propyl methacrylate (TMSPMA 98%), and potassium persulfate (KPS 99%) were bought from J&K Chemical Ltd. (Beijing, China) and used as received; analytical grade tetraethoxysilane (TEOS, ≥28%, SiO2) was bought from Shanghai Lingfeng Chemical Reagent (Shanghai China); 3-ureidopropyltriethoxysilane (UPTES, 40.0–50.0%, methanol solution) was obtained from Aladdin Reagent (Shanghai, China). N-Cetyltrimethylammonium bromide (CTAB, 99%) was purchased from Shanghai Richjoint Chemical Reagents (Shanghai, China). Sodium phosphate tribasic dodecahydrate, potassium dihydrogen phosphate, methanol, sodium hydroxide (NaOH), ascorbic acid, antimony potassium tartrate, and hydrochloric acid (HCl) were of analytical grade and were purchased from Sinopharm Chemical Reagent (Beijing, China); Ammonium molybdate tetrahydrate (99%) was purchased from Shanghai Shenbo Chemical (Shanghai, China). Deionized water, which was purified by a Millipore Milli-Q system, was put to use in all experiments.
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2

Synthesis of Fluorescent Silica Nanoparticles

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Tetraethoxysilane (TEOS,A.R), ammonia solution(NH3·H2O) (25~28%, A.R), and sodium carbonate anhydrous(Na2CO3,A.R) were obtained from Shanghai Lingfeng Chemical Reagent Co.LTD. Ethyl alcohol absolute (EtOH) was obtained from Shanghai Zhenxing No.1 Chemical Plant. 3-Aminopropyltriethoxysilane (98%, APTES) was purchased from J&K Scientific LTD. Deionized water was used in all experiments. Cetyltrimethyl Ammonium Bromide (CTAB) was purchased from Sigma-Aldrich. Fluorescein isothiocyanate isomeric (FITC, 90%) was purchased from ACROS ORGANICS.
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