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Xe 100 microscope

Manufactured by Park Systems
Sourced in Cameroon

The XE-100 microscope is a high-performance scanning probe microscope designed for advanced materials analysis. It features a state-of-the-art scanner and control system that enables precise 3D imaging and measurement capabilities.

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6 protocols using xe 100 microscope

1

Comprehensive Characterization of Nanomaterials

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Atomic force micrographs were acquired in non-contact mode with a ppp-NCHR 5M probe (Nanosensors) attached to a XE-100 microscope (Park Systems). The Raman spectra were acquired using a Renishaw In-Via system with a 532 nm excitation laser. The XRD profiles were obtained using a Dmax2500/PC (Rigaku) spectrometer operated at 40 kV, 200 mA, and 8 kW using a Cu target (1.5406 Å) at a scan rate of 2° min−1. The XPS profiles were acquired using a PHI 5000 VersaProbe (Ulvac-PHI) system at a base pressure of 6.7 × 10−8 Pa using a monochromated Al Ka (1486.6 eV) anode (25 W, 15 kV) with a spot size of 100 μm × 100 μm. The transmittance data were recorded on a Cary 5000 (Varian) spectrometer from 175 nm to 3300 nm at a scan rate of 600 nm·min−1 at a resolution of 1.0 nm. The optical spectrum, its characteristics, and those of the pulse waveform, were respectively measured using an autocorrelator (25 fs resolution, HAC-200, Alnair Labs), an optical spectrum analyzer (0.02 nm resolution, C-band scan range, SW7370C, Yokogawa), and an oscilloscope (DSO 5054A, Agilent Technology).
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2

Plasma-Induced Surface Modifications Analyzed by AFM and SEM

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The modifications encountered upon exposure of the substrates to various plasma configurations and experimental conditions were evaluated by means of AFM and, respectively, SEM techniques for characterization of surface topography and morphology. AFM images were recorded with a Park Systems XE-100 microscope (Suwon, Korea) operating in non-contact mode, for various areas; herein we presented data recorded over areas of 5 × 5 μm2. The analysis of the AFM data was carried out using the “XEI” software from Park Systems (version 1.7.6). First order line by line flattening was applied. Points with larger height (corresponding to the grains) were excluded from this line fitting using a height threshold mask. RMS values were calculated for one image, for each sample. SEM measurements were performed on a FEI S Inspect high-resolution microscope (Hillsboro, OR, USA), operating at an accelerating voltage of 5 kV. In order to prevent charge accumulation on the surface, the samples were coated with a very thin gold layer (5 nm) deposited by the magnetron sputtering technique.
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3

Atomic Force Microscopy of Surface Topography

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AFM investigations were performed in non-contact mode, using decoupled, flexure-guided crosstalk eliminated scanners with an XE-100 microscope from Park Systems. In all AFM measurements, sharp tips were used, NCHR from NanosensorsTM, with typically ~8 nm radius of curvature, ~125 µm mean length, 30 µm mean width, ~42 N/m force constant, and ~330 kHz resonance frequency. XEI program (v 1.8.0) from Park Systems was used for image processing and roughness evaluation. Below the AFM images, presented as “enhanced contrast” view mode, representative line scans are plotted, showing in detail the surface profile of the scanned samples.
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4

Atomic Force Microscopy Surface Analysis

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AFM analysis was made using an XE-100 microscope from Park Systems (Suwon-si, South Korea) in non-contact mode. Sharp tips, NCHR from NanosensorsTM, with typically ~8 nm radius of curvature, ~125 mm mean length, 30 mm mean width, ~42 N/m force constant, and ~330 kHz resonance frequency was used. The image processing and roughness evaluation were performed using the XEI program (v 1.8.0) from Park Systems. The detailed surface profile of the scanned films was presented in “enhanced contrast” view mode.
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5

Surface Morphology Analysis of Membranes

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SEM micrographics performed on samples were recorded using a high-resolution microscope, FEI Quanta 3D FEG instrument (FEI), operating in high vacuum mode with an accelerating voltage of 1 kV. Samples were placed on double-sided conductive tape and scanned without special preparation. The surface roughness of these membranes was investigated in contact mode by atomic force microscopy (AFM) using the XE-100 microscope from Park Systems, equipped with flexure-guided, cross-talk eliminated scanners. All AFM images were recorded with pre-mounted NSC36/Hard Al BS tips (MikroMash) with rotated tip shape, full cone angle of 40°, a radius of less than 20 nm, height ~ 15 mm, 90 mm mean length, 32.5 mm mean width, ~2 N/m force constant, and thickness ~ 1 mm. The recorded AFM images were processed using the XEI program (v 1.8.0-Park Systems) for displaying purpose and roughness evaluation. In order to increase the contrast of the morphological features, the images are presented in the so-called “enhanced contrast” view mode which uses the change of a pixel relative to its neighbors. Representative line scans are presented below the AFM images, showing, in detail, the surface profile of the scanned samples and the dimensions of the selected features (particles, pits, etc.).
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6

SERS Characterization of Nano-Scaled Samples

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SERS spectra were acquired using a homemade micro-Raman system based on an Olympus BX41 microscope (Olympus, Japan). A He-Ne laser with 633 nm radiation (Melles Griot, Australia) was used as the excitation source and the laser light was focused on the sample through a 50× objective (Mitutoyo, Japan) of the microscope. The spectra were measured with a thermodynamically cooled electron-multiplying charge-coupled device (Andor, UK) mounted on the spectrometer with a 1200 groove/mm grating (Dongwoo Optron, Korea). A holographic notch filter was used to reject the laser light (Kaiser Optical Systems, USA). The acquisition time was 1 min. SEM images were obtained from a Nova230 microscope (FEI Company). AFM images were obtained from a Park Systems XE-100 microscope.
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