NI measurement was performed using Hysitron TI 950 Triboindenter (Bruker). Continuous stiffness measurements (CSM) with a cube corner indenter were employed. The Li and Vlassak method70 (link) implemented in a custom MATLAB script was applied to extract the YM of the top ZIF layers. Poisson’s ratio of the films was assumed 0.44 based on a previous study72 (link). At least ten CSM curves were analyzed per sample and the results were averaged. It should be noted that the method is in principle applicable only for bilayer stacks, i.e., thin film on a substrate. This complicates the extraction of elastic properties in case of ZIF-67 film, which is formed on top of 20 nm Co/Si substrate stack. Nonetheless, the additional elastic finite-element simulations demonstrated negligible influence of the intermediate metallic Co layer on the load-displacement characteristics. This can be attributed to the same order of magnitude of YM for Co (200 GPa)83 and Si (130 GPa)84 (link) in contrast to much lower value of YM of ZIF films under test (<5GPa). As a result, the presence of Co layer was ignored during the analysis of the stack containing ZIF-67 film.
Hysitron ti 950 triboindenter
Manufactured by Bruker
Sourced in United States
The Hysitron TI 950 Triboindenter is a highly versatile and advanced nanoindentation system designed for materials characterization. It enables precise measurement of mechanical properties, including hardness, modulus, and viscoelastic behavior, at the nanoscale level. The core function of the Hysitron TI 950 Triboindenter is to provide researchers and engineers with a powerful tool for understanding the fundamental mechanical properties of materials.
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Lab products found in correlation
4 protocols using hysitron ti 950 triboindenter
1
Nanoindentation Characterization of ZIF Films
2
Comprehensive Analysis of DLC Film Properties
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As-synthesized DLC
patterns subjected to various structural, morphological, topographical,
chemical bonding, and functional group analysis were performed by
using high precision and calibrated scientific equipment. The thickness
measurement of the DLC film was performed by a profilometer of KLA-Tencor,
AS-IQ, Alpha-Step D-300 model. The stylus is a diamond tip of a radius
of 2 μm, and a scanning speed of 50 μm/s was used with
an applied stylus force of 2 mg. The topological information was collected
from atomic force microscopy (AFM) of model XE7, Park Systems, and
the images were processed by XEI software. The morphological analysis
was carried out by JEOL, JSM-6701F field-emission scanning electron
microscopy (FESEM), and JEOL, JEM-2100F CS STEM transmission electron
microscopy (TEM). Fourier transform infrared (FTIR) spectroscopy studies
were performed using JASCO, FT/IR-4600 model, with a scanning range
from 4000 to 700 cm–1 in transmittance mode. The
Raman spectra were recorded by using a 532 nm excitation wavelength
from MRI, Protrustech Co., Ltd. X-ray photoelectron spectroscopy (XPS)
measurements were performed by PHI Hybrid Quantera with monochromatic
Al Kα (E = 1.487 keV) X-ray radiation. Data
analysis was performed using XPSPEAK41 software. The nanoindentation
measurements were performed using a Hysitron TI 950 triboindenter,
Bruker.
patterns subjected to various structural, morphological, topographical,
chemical bonding, and functional group analysis were performed by
using high precision and calibrated scientific equipment. The thickness
measurement of the DLC film was performed by a profilometer of KLA-Tencor,
AS-IQ, Alpha-Step D-300 model. The stylus is a diamond tip of a radius
of 2 μm, and a scanning speed of 50 μm/s was used with
an applied stylus force of 2 mg. The topological information was collected
from atomic force microscopy (AFM) of model XE7, Park Systems, and
the images were processed by XEI software. The morphological analysis
was carried out by JEOL, JSM-6701F field-emission scanning electron
microscopy (FESEM), and JEOL, JEM-2100F CS STEM transmission electron
microscopy (TEM). Fourier transform infrared (FTIR) spectroscopy studies
were performed using JASCO, FT/IR-4600 model, with a scanning range
from 4000 to 700 cm–1 in transmittance mode. The
Raman spectra were recorded by using a 532 nm excitation wavelength
from MRI, Protrustech Co., Ltd. X-ray photoelectron spectroscopy (XPS)
measurements were performed by PHI Hybrid Quantera with monochromatic
Al Kα (E = 1.487 keV) X-ray radiation. Data
analysis was performed using XPSPEAK41 software. The nanoindentation
measurements were performed using a Hysitron TI 950 triboindenter,
Bruker.
3
Polymer Nanoindentation Characterization
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Quasi-static nanoindentation was performed with a Hysitron TI 950 TriboIndenter (Bruker, USA) to determine the micro- and nanoscale stiffness of each polymer. Testing followed the Oliver–Pharr method17 (link) using a pyramidal Berkovich diamond tip. All samples were tested under a force-controlled trapezoidal load function. Indentation parameters will be discussed in the Results and discussions section. A range of loading and unloading times were tested and compared.
4
Nanoindentation of Au-Ni Multilayers
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A ‘Hysitron Ti 950 Triboindenter’ (Bruker) nanoindenter was utilized to determine the hardness of the as-grown Au-Ni multilayer samples by constituting the indentation load-displacement curves. A Berkovich type diamond triangular pyramid indenter was used in the measurements and different indentation loads from 2 to 8 mN were applied to the multilayer samples. The results are presented in Supplementary Fig. S3 .
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