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14 protocols using labram aramis raman spectrometer

1

Characterization of MXene Hydrogel Morphology

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The morphology of MXene hydrogels was observed using SEM (Zeiss ULTRA plus) and TEM (FEI Titan 80–300, 300 kV). Surface chemical information of the samples was analyzed by an Omicron Multiprobe XPS instrument equipped with a monochromatic Al Kα X-ray source (hν = 1486.6 eV). Raman spectra were recorded with a Horiba Labram Aramis Raman spectrometer at 633 nm (grating 1800 gr/mm, 10% of laser power). XRD patterns were obtained using a powder diffractometer (Bruker D8 Discover) with Cu Kα1 radiation. The N2 adsorption/desorption measurements were performed on Quantachrome Autosorb-iQ. Before measurement, the samples (vacuum-dried at room temperature) were further vacuum-dried at 150 °C for 10 h. The rheological properties of the inks were investigated using an Anton Paar MCR 302e rheometer using a 50 mm plate-plate geometry. The upper plate was a roughened plate (PP50/S) to lessen the effects of slip and a solvent trap was used to minimize the effects of evaporation.
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2

Raman Spectroscopy of Stainless Steel

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Raman data were acquired using a Horiba Jobin-Yvon LabRam Aramis Raman spectrometer. A 532-nm Ar-ion laser was used as the excitation source, and the substrate plate was stainless steel with no Raman signal, guaranteeing a fluorescence-free background. Wavenumbers ranging from 200 to 3000 cm−1 were scanned, and each spectrum was acquired for 60 s. The analysis was executed for more than three points for each sample for reproducibility and reliability.
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3

Characterization of Few-Layer Graphene

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The transmission electron microscopy (TEM) was performed on Topcon 002B microscope working at 200 kV accelerated voltage with a point-to-point resolution of 0.17 nm. The FLG was dispersed prior to analysis in ethanol and dropped on a perforated carbon coated copper grid.
The scanning electron microscopy (SEM) was carried out on a Jeol JSM-6700F working at 3 kV accelerated voltage, equipped with a CCD camera.
X-ray photoelectron spectroscopy (XPS) analyses was performed with a MULTILAB 2000 (THERMO) spectrometer equipped with Al K α anode (hν= 1486.6 eV).
Raman spectroscopy was performed using Horiba Scientific Labram Aramis Raman Spectrometer (Jobin Yvontechnolgy) with the following conditions: laser wavelength of 532.15 nm, D2 filter (1% power) and spectrum recorded in the regions from 1250 to1650 and from 2600 to 2800 cm−1, with an integration time of 100s for each region. The spectra were performed on SiO2/Si wafer supported flakes.
The electrical measurements were performed on Karl Suss PM8. The FLG was dispersed in ethanol and deposited on interdigitated FET-like device with gold electrodes with gaps of 2.5, 5 and 10 µm respectively. Deposited flakes were annealed prior to the measurements in Ar.
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4

Optical Characterization of Organic Materials

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Ultraviolet–visible (UV–vis)
absorption spectra of PTZ THF solution and TCNB acetonitrile solution
were recorded on a USB4000 Uv–vis spectrometer (Ocean Optics).
The solid UV–vis absorption spectra of PT and PT-S were recorded
using the U-4100 Uv–vis–NIR spectrophotometer (Hitachi,
Japan). The Raman spectra of PTZ, TCNB, PT, and PT-S were obtained
on a LabRAM Aramis Raman spectrometer (Horiba Jobin Yvon) equipped
with a 633 nm excitation line. The optical images of PT and PT-S were
captured by a T64000 Raman confocal microscope system and the distances
were measured by an object micrometer 0.01 mm × 100.
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5

Characterization of CVD Graphene

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CVD graphene
was characterized
by scanning electron microscopy (SEM), Raman spectroscopy and atomic
force microscopy (AFM). For SEM imaging, a JEOL JSM-6500F was operated
at 5 kV. Raman spectroscopy was conducted at room temperature using
a JY Horiba LabRAM Aramis Raman spectrometer equipped with a 532 nm
laser. Atomic force micrographs were recorded with a NanoScope MultiMode
AFM in contact mode (Nanosensors PointProbe Plus Contact Mode probes).
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6

Multi-Technique Characterization of Materials

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X-ray diffraction (XRD) patterns were obtained from a powder X-ray diffractometer (D8 Advance, Bruker AXS GmbH, Karlsruhe, Germany) with Cu Ka radiation (l = 0.154056 nm). Scanning electron microscopy (SEM) images were received from a scanning electron microscope (EVO10, ZEISS, Jena, Germany) operated at an acceleration voltage of 20.0 kV. Raman spectra were performed on a LabRAM Aramis Raman spectrometer (HORIBA Jobin Yvon, Paris, France). Transmission electron microscope (TEM) images were recorded with a transmission electron microscope (JEOL JEM-2100, Tokyo, Japan). X-ray photoelectron spectroscopy (XPS) was obtained on a Thermo Electron ESCALAB250 XPS Spectrometer (X-ray Source: Al). Fourier transform infrared spectroscopy (FTIR) spectra were recorded on an IRPrestige-21 Fourier transform infrared spectrometer (Shimadzu Corp., Kyoto, Japan). A traditional three-electrode system (unmodified or modified GCE (id = 3.0 mm)) was used as the working electrode, platinum wire as the counter electrode and saturated calomel electrode (SCE) as the reference electrode for all electrochemical tests. Second derivative linear sweep voltammetry (SDLSV) was performed on a JP-303E polarographic analyzer (Chengdu instrument factory, Chengdu, China).
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7

Optical Characterization of Organic Semiconductors

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The UV–vis absorption spectra of CuSCN and acceptor films were recorded using Cary 5000 spectrophotometer in the range 250–1100 nm. Fluoromax-4 spectrofluorometer from HORIBA Scientific was used to collect the steady-state PL. Temperature-dependent PL data of neat acceptors were recorded using LabRam Aramis Raman spectrometer from Horiba Jobin Yvon following 633 nm (for EH-IDTBR, Y6, IT-M, ITIC, IT-2Cl, IT-4F, and IDIC) and 473 nm (for PC71BM, and SF-PDI2) laser excitations. The PL quantum yield measurements of the acceptor films were carried out using an Edinburgh Instruments integrating sphere with an FLS920-s fluorescence spectrometer. The optical constants n and k for the active layers were collected by variable angle spectroscopic ellipsometry (VASE) with an M-2000 ellipsometer (J.A. Woolam Co., Inc). The VASE measurements were performed with incident angles being varied from 50° to 75° in steps of 5° relative to the samples. Transfer matrix modeling was used to simulate the maximum theoretical JSC plots as a function of active layer thickness (thickness range: 0–200 nm); the model assumes 100% internal quantum efficiency (IQE). The transfer matrix code for these simulations was developed by George F. Burkhard and Eric T. Hoke; code available from: transfermatrix/index.html.
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8

Raman and FT-IR Spectroscopic Analysis

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Raman spectra were recorded on a Jobin Yvon/HORIBA LabRam ARAMIS Raman spectrometer (Tokyo, Japan) equipped with an integral BX 41 confocal microscope (Tokyo, Japan). Radiation from an air‒cooled internal HeNe laser (632.8 nm) and an external cavity diode laser (785 nm) were used as the excitation source. The FT‒IR spectra of ninhydrin were recorded as KBr disks at room temperature by a Bruker IFS‒66V FT‒IR spectrometer (Karlsruhe, Germany), equipped with a DTGS detector (Karlsruhe, Germany) at a resolution of 4 cm−1.
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9

Raman Scattering Measurement Protocol

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Raman scattering measurements were performed in the backscattering geometry using a Jobin Yvon/HORIBA LabRam ARAMIS Raman Spectrometer (Horiba Jobin Yvon, Edison, NJ, USA), equipped with a confocal microscope and a Peltier-cooled charge coupled device (CCD) detector (DU420A, ANDOR). Measurements were performed using an internal HeNe (633 nm) laser, an external 785 nm diode laser (Melles Griot, Carlsbad, CA, USA), and a 532 nm diode pump solid-state (DPSS) laser (mpc6000, Laser Quantum, Stockport, UK). All spectra were collected at room temperature in air with 15 s exposure time and ten accumulations.
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10

Characterization of Catalyst Samples

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The crystal phases and structures of these samples were characterized by XRD (D8 Advance diffractometer, Bruker, Germany) with Cu Kα radiation (λ = 1.5406 Å). The composition and element chemical state of elements were determined by X-ray photoelectron spectroscopy (XPS, ESCALAB 250Xi, ThermoFisher Scientific, USA). The specified surface areas were measured using BET method with a Builder 4200 instrument (Tristar II 3020 M, Micromeritics Co., USA). Representative high-angle dark-field scanning transmission electron microscopy (HADDF-STEM) images with energy-dispersive EDX elemental mapping was conducted to characterize the dispersion and configuration of the catalysts, as well as to map the abundance of C, O, and Co in the catalyst. The insets of HRTEM were carried out via a JEM 2100F field emission transmission electron microscope at an accelerating voltage of 200 kV to characterize the morphological and textural properties. Raman spectra were recorded with a LabRAM Aramis Raman spectrometer (Horiba Scientific) with an Ar laser at 532 nm. The powdered sample was pressed into the sample holder and then placed into a home-built high-temperature reaction cell for in situ Raman measurements.
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