PDMS stamps for microcontact printing were prepared as previously described.23 (link) A photolithographic mask was designed in AutoCAD (Autodesk Inc.) and ordered from Output City (Brandon, OR, USA). Each mask consists of an array of bihexagonal islands with a single shared edge, each shape having a total area of 5000 μm2 (hexagon edge length, 31 μm). This mask was imposed on top of a silicon wafer (Wafer World, FL, USA) spin-coated with SU-8 2002 negative photoresist (MicroChem Corp., MA, USA), which was then exposed to UV light to crosslink the pattern. Uncrosslinked regions were dissolved by submerging the wafers in propylene glycol methyl ether acetate, followed by isopropyl alcohol, and then dried. PDMS (Sylgard 184, Dow Corning, MI, USA) was poured over the wafer and then degassed in a vacuum desiccator. After curing, the patterned PDMS was peeled off the surface and cut to be used as stamps (ESI Fig. S25 ).
Su 8 2002 negative photoresist
Manufactured by MicroChem
Sourced in United States
SU-8 2002 is a negative photoresist designed for microfabrication applications. It is a high-contrast, epoxy-based photoresist that can be used to create high-aspect-ratio structures. The core function of SU-8 2002 is to serve as a photosensitive material that can be patterned using standard photolithographic techniques.
Automatically generated - may contain errors
Lab products found in correlation
2 protocols using su 8 2002 negative photoresist
1
Microcontact Printing using PDMS Stamps
2
Fabrication of Microfluidic Stamps via Photolithography
Check if the same lab product or an alternative is used in the 5 most similar protocols
+ Expand
Standard photolithography and soft lithography protocols were used to make wafers and PDMS stamps52 (link). Briefly, wafer templates were fabricated by spin-coating SU-8 2002 negative photoresist (MicroChem) onto silicon wafers and exposing the coated wafer to UV light through a custom photomask using a mask aligner. The photomask consisted of either 15 μm wide lines separated by 2 μm wide gaps (15 × 2) or 10 μm wide lines separated by 10 μm wide gaps (10 × 10). Wafers were then immersed in developer solution to remove un-exposed photoresist and coated with trichloro (1H,1H,2H,2H-perfluorooctyl) silane. PDMS was created by mixing the elastomer base and curing agent of Sylgard 184 silicone elastomer kit (Dow Corning) in a 10:1 mass ratio. PDMS was then poured over a wafer template in a Petri dish, de-gassed, and cured at 65 °C for at least four hours. Cured PDMS was then carefully removed from the wafer and cut into square stamps measuring approximately 2 cm × 2 cm.
About PubCompare
Our mission is to provide scientists with the largest repository of trustworthy protocols and intelligent analytical tools, thereby offering them extensive information to design robust protocols aimed at minimizing the risk of failures.
We believe that the most crucial aspect is to grant scientists access to a wide range of reliable sources and new useful tools that surpass human capabilities.
However, we trust in allowing scientists to determine how to construct their own protocols based on this information, as they are the experts in their field.
Ready to get started?
Sign up for free.
Registration takes 20 seconds.
Available from any computer
No download required
Revolutionizing how scientists
search and build protocols!