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Phoxx 642

Manufactured by Toptica
Sourced in Germany

The Phoxx 642 is a continuous-wave diode laser that produces highly stable and coherent light at a wavelength of 642 nanometers. It is designed for use in a variety of scientific and industrial applications requiring a reliable and precise light source.

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2 protocols using phoxx 642

1

Dual-color Imaging of Platelet Ultrastructure

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Images were acquired using a modified Olympus IX81 inverted epifluorescence microscope with an oil-immersion objective (UApo N 100x/1.49 NA, Olympus, Vienna, Austria). The sample was positioned with nanometer precision on a XYZ piezo stage (P-733.3DD, Physical Instruments) on top of a mechanical stage with a range of 1 × 1 cm adjusted by precision screws (TAO, JPK Instruments, Berlin, Germany). A tube-lens with an additional magnification of 1.6 was used to achieve a final imaging magnification of 160 (corresponding to a pixel size of 100 nm). Platelets were illuminated with a 642 nm laser light from a diode laser (Omicron-laserage Laserprodukte GmbH, Phoxx 642, Rodgau-Dudenhofen, Germany), a 488 nm laser light from a solid-state laser (diode-pumped, Toptica Photonics, Graefelfing, Germany), and a 405 nm laser light from a diode laser (Insaneware, Gladbeck, Germany). The signal was detected using an Andor iXonEM+ 897 (back-illuminated) EMCCD camera (16 μm pixel size). The following filter sets were used: dichroic filter (ZT405/488/561/640rpc, Chroma, Olching, Germany), emission filter (446/523/600/677 nm BrightLine quad-band band-pass filter, Semrock, Rochester, NY, USA), and an additional emission filter (HQ 700/75 M, NC209774, Chroma Technology GmbH, Olching, Germany).
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2

High-resolution 3D Fluorescence Microscopy

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Images were acquired using a modified Olympus
IX81 inverted epifluorescent
microscope with an oil-immersion objective (PlanApo N, 60×, NA
1.42, Olympus, Vienna, Austria). Samples were mounted on a XYZ piezo
stage (PI Mars; P-562, Physical Instruments) which has nanometer accuracy,
combined with a coarse mechanical stage with a travel range of 1 cm
× 1 cm (Hybrid, JPK Instruments, Berlin, Germany). A tube lens
with an additional magnification of 1.6 was used to achieve a final
imaging magnification of 96 (corresponding to a pixel size of 167
nm). ECs were illuminated with a 642 nm laser diode (Omicron-laserage
Laserprodukte GmbH, Phoxx 642, Rodgau-Dudenhofen, Germany) and a 488
nm laser (Toptica Photonics, Germany). Signals were collected using
an Andor iXonEM+ 897 (back-illuminated) EMCCD camera (16 μm
pixel size). The following filter sets were used: dichroic filter
(ZT405/488/561/640rpc, Chroma, Germany), emission filter (446/523/600/677
nm BrightLine quad-band band-pass filter, Semrock, Rochester, NY,
USA), and additional emission filters: ET 700/75 M, Chroma Technology
GmbH, Olching, Germany; ET 525/50 M, Chroma Technology GmbH, Olching,
Germany. For 3D measurements, a cylindrical lens (f = 500 mm; Thorlabs, Newton, USA) was placed into the detection path
of the microscope.
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