Sineg
The SiNeg is a laboratory equipment designed for the deposition of silicon nitride (SiN) thin films. It utilizes plasma-enhanced chemical vapor deposition (PECVD) technology to create high-quality SiN films on various substrates. The core function of the SiNeg is to provide a controlled environment for the deposition of SiN, which is a widely used material in the semiconductor and microelectronics industries.
2 protocols using sineg
Silencing CSF-1 in Endometrial Cancer Cells
Lentiviral-Mediated RAD6B Knockdown
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