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18 protocols using jspm 5200

1

Characterization of Polymer Thin-Film Transistors

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Ultraviolet-visible (UV-vis) absorption spectroscopy was measured using JASCO V-570 Spectrophotometer (JASCO Co. Ltd., Japan).
The surface morphology of the deposited films was investigated by atomic force microscopy (AFM) analysis performed using JEOL JSPM-5200 (JEOL Ltd. Japan).
Polymer TFT characteristics were measured with a computer-controlled source-measure unit (Keithley2612 sourcemeter, TEKTRONIX, Inc. Japan) under dry-air condition. Dry-air condition with a relative humidity of less than 5% was controlled by sealed vial bottle containing silica gel.
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2

Visualization of Extracellular Polymeric Substances

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The EPS-1a, EPS-2a, and EPS-3a were dissolved in distilled water with constant stirring (magnetically) overnight, respectively, so that the EPSs were dissolved completely. The sample solution was diluted with water to 100 μg/mL, and dropped on a surface of mica disk, and subsequently allowed to dry at room temperature. Finally, the AFM images were generated by atomic force microscope (JEOL JSPM-5200, JEOL Ltd, Tokyo, Japan) in tapping mode and three-dimensional images were obtained by SPM-offline 2.2 software (Shimadzu Corp., Kyoto, Japan). The driven amplitude was 0.430 V, and the cantilever oscillated at its proper frequency (158 kHz).
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3

APVEP Film with Nanometre-Cluster Characterization

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The APVEP film with nanometre-cluster was prepared by doping a 3-aminopropyl (triethoxy) silane-coupling reagent into the APP. Sheet specimens with a thickness of 15 μm were fabricated on the Si substrate by spin-coating. The specific density, glass-transition temperature, and water-adsorption rate was 2.03, 471 K, and 0.01%, respectively22 . The devices were fabricated mechanically8 .
Scanning Kelvin probe-force microscopy (NC-AFM, JSPM-5200, JEOL) based on the measurement of electrostatic force gradient was applied to measure the absolute electrical potential between the Pt-coated cantilever tip at 0 and 20 V and the APP surface as the work-function difference. The DC charging/discharging behaviour was analysed at 10 V, 1 pA~1 mA for ~300 s at room temperature, with a complex impedance between 1 mHz and 1 M Hz and 10 mV, using the galvanostatic charge/discharge on a potentiostat/galvanostat (SP-150, BioLogic Science). A red LED lump with standard power of 2 × 10−4 W was used to verify the electric storage.
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4

Polymer Substrate Characterization

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Morphological characters such as pore diameter, rim width and substrate thickness of PLGA, PS and PLA substrates were determined by calculating the average of three-point measurements. The surface area for smooth and 3DIS substrates was determined by image analysis. SPM (JSPM-5200, JEOL) analysis provided the topography data of the designed polymer substrates. Other parameters noted were polymer substrate stability in various exposure conditions such as chemical reagents, pH sensitivity, ultraviolet radiation etc.
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5

Comprehensive Material Characterization

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The morphologies were investigated by SEM (Hitachi SU8010), AFM (JEOL JSPM‐5200), and field emission transmission electron microscope (FE‐TEM, G2 60–300, FEI) equipped with EDS (Super‐X). The chemistry information was examined by XRD (Bruker D2 Phaser X‐Ray Diffractometer with Cu Kα radiation) and Raman spectroscopy (a Kr‐Ar ion laser at 633 nm produced by Spectra‐Physics Beamlok 2060‐RS laser combining Symphony CCD‐1LS detection system). The nitrogen adsorption–desorption isotherms were measured with a Quantachrome Autosorb AS‐6B system. The near surface chemical state of different elements was also done via XPS (ESCALAB 250 Xi). TGA was conducted by SDT Q600 (TA Instruments) in air with a ramp rate of 10 °C min−1.
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6

Investigating Monolayer Morphology via AFM

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Atomic force microscopy (AFM) was used to investigate the morphology of the GD and Al monolayers. A commercial 1.5 kV-AFM microscope (JSPM-5200; JEOL Ltd., Tokyo, Japan) and JEOL-original SPS mapping software (vol.54) in contact mode using a 10 μm tube-type scanner were employed. Both vertical and lateral deflections were detected by an optical beam deflection method with a four-segment photodetector to observe topographic and frictional forces, respectively. The resolution of the AFM image was about a mica atomic image. An HOPG (highly oriented pyloric graphite) substrate of area 20 × 20 mm2 was attached to the tip of the auto-elevation system and dipped into the water phase in a glass dish. The GD and Al monolayers were formed on the water surface, and after more than 45 min following the completion of monolayer formation, the HOPG substrate in water was horizontally scooped from below the monolayer using the scooping-up method [13 ,14 (link),15 (link),19 (link)]. With a 1 mm/min transfer velocity, the monolayer was transferred to the substrate at 26 ± 1 °C.
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7

Spectroscopic and Microscopic Characterization

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SEM-EDS were recorded on a Hitachi S-4300. The polarized reflectivity spectra were recorded on a JASCO MSV-5300YMT. The reflectance (%R) was obtained from the quotient of the sample and the Al deposition mirror as a standard. STM current images were recorded using a JEOL JSPM-5200 with a Pt/Ir(20%) (ϕ = 0.3 mm) probe under atmospheric pressure at room temperature. All data were summarized in an Excel file for the Source Data.
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8

Analyzing Nanoparticle Surface Magnetism

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The magnetic domains and topography analysis of the surface of the nanoparticles were performed using Scanning Probe Microscope JEOL, JSPM-5200 in Magnetic Force Microscopy mode (MFM). All powder samples were confined separately in carbon adhesive tape. A magnetic tip NSC18, Co-Cr/Al Micromasch, with an uncoated radius of 8 nm, coated radius <60 nm, and full tip cone angle of 40°, was used. This tip was magnetized with a neodymium magnet 5 min prior to the characterization. The 2D and 3D images, profiles, and domain measurements were processed with Gwyddion 2.62 software.
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9

Multimodal Microscopic Characterization

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Transmission electron microscopy (TEM) investigation was performed with an ARM 200F Cold FEG TEM/STEM equipped with a GIF Quantum ER (JEOL, Japan). Scanning electron microscopy (SEM) analyses were carried out with a JSM-840 (JEOL, Japan) or SUPRA 55 apparatus equipped with an energy-dispersive X-ray (EDX) microanalyzer (Zeiss, Germany), and the high-resolution SEM micrographs were obtained with the model JSM-IT500HR apparatus (JEOL). Atomic force microscopy (AFM) analysis was performed with Asylum JEOL JSPM-5200. Raman spectroscopy measurements were carried out with a RenishawinVia spectrometer with a green light laser (532 nm). X-ray diffraction (XRD) pattern was obtained using the Nanoviewer from Rigaku (CuK α radiation) at a scanning rate of 5 °C/min.
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10

Comprehensive Characterization of Synthesized Graphene

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Morphology of the synthesized graphene was characterized by both scanning electron microscopy (SEM, JSM-6500F/JSM-7001F, JEOL) and transmission electron microscopy (TEM, JEM-2100, JEOL). Atomic force microscopy (AFM) samples were prepared by spin-coating the rGO dispersion on a Si wafer. AFM measurements were conducted with a scanning probe microscope (JSPM-5200, JEOL) using the tapping mode. The structure was also examined by using powder X-ray diffraction (XRD, Rigaku SmartLab using Cu-Kα radiation with λ = 1.5418 Å) and Raman spectroscopy (Nanophoton Raman Plus, λ = 532 nm). The functional groups on GO and graphene were characterized with X-ray photoelectron spectroscopy (XPS, ULVAC-PHI Quantera SXM) and Fourier transform infrared spectroscopy (FTIR, Shimadzu, IRTracer-100). Elemental analyses were performed with energy-dispersive X-ray spectroscopy (EDS, JED-2300, JEOL). Nitrogen adsorption–desorption data (Quantachrome Autosorb iQ) were collected to calculate the specific surface area by the Brunauer–Emmett–Teller (BET) method and the distribution of pore sizes was obtained using density functional theory (DFT) calculations.
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