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Thermo scientific k alpha xps system

Manufactured by Thermo Fisher Scientific
Sourced in United Kingdom, United States

The Thermo Scientific K-Alpha XPS system is a versatile and high-performance surface analysis instrument. It utilizes X-ray Photoelectron Spectroscopy (XPS) technology to provide detailed information about the chemical composition and electronic state of materials at the surface level. The K-Alpha system offers advanced capabilities for a wide range of applications, including materials science, catalysis, nanotechnology, and more.

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8 protocols using thermo scientific k alpha xps system

1

Comprehensive Characterization of Materials

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X-ray powder diffraction (XRD) experiments were carried out using a Rigaku TTRIII X-ray diffractometer (Rigaku D/max-3B, Tokyo, Japan) with Cu Kα radiation. The Brunauer–Emmett–Teller (BET) surface area was measured on a Micromeritics Tristar II Surface Area and Porosity Analyzer (Micromeritics, Norcross, GA, USA). A pore size distribution was obtained by Barrett–Joyner–Halenda (BJH) method using nitrogen desorption data measured at 77 K. Scanning electron microscopy (SEM) images were taken by FEIQuanta200FEG microscope (FEI, Eindhoven, The Netherlands) at an accelerating voltage of 15 kV. The transmission electron microscopy (TEM) and high-resolution transmission electron microscopy (HRTEM) images were obtained by JEM Fas-TEM-3010 electron microscope instrument (JEOL, Tokyo, Japan) at the accelerating voltage of 200 kV. UV–Vis diffuse reflectance spectra (UV–Vis DRS) were measured by UV-2401PC photometer (Shimadzu, Kyoto, Japan) using BaSO4 as a reflectance standard. X-ray photoelectron spectroscopy (XPS) measurements were performed using a Thermo Scientific K-Alpha XPS system (Thermo Fisher Scientific, Waltham, MA, USA) equipped with a monochromatic Al Kα source.
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2

XPS Analysis of Adsorbed Material

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The chemical composition of the adsorbed material following each deposition step was evaluated by XPS conducted in a Thermo Scientific K-Alpha XPS system (ThermoFisher Scientific, Hvidovre, Denmark) operating with an EX06 ion source and a hemispheric analyser with 180° double focus and a 128 channel detector. Two samples were studied for each working condition.
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3

Elemental Composition Analysis of PPHA on Ti6Al4V

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The chemical composition of PPHA on Ti6Al4V disks at various deposition times (0 s, 30 s, 45 s, 60 s, 90 s, and 120 s) was identified by using the Thermo Scientific K-Alpha+ XPS system (ThermoFisher, Thermo Fisher Scientific Inc., Hillsboro, OR, USA). The XPS system, consisting of a monochromatic Al-Kα source (hv = 1486.6 eV), was operated at a power of 15 mA, 15 kV. XPS was used to detect specific electron energies and identify chemical bonds based on peak shifts, excluding hydrogen detection, in a vacuum chamber (5 × 10−9 mbar). Survey spectra were recorded and analyzed to evaluate the atomic percentages of carbon, oxygen, and nitrogen in the thin PPHA film. The binding energy scale of the C1s peak was adjusted to 284.8 eV to account for the C–C/C–H component. All peaks were fitted with reference to 284.8 eV using XPSPEAK41 software 4.1.0.0. The determination of peak intensities was performed using Shirley-background subtraction. The XPS fitting curves of different samples were processed using OriginPro 2023 learning edition (OriginLab Corporation, Northampton, MA, USA). Subsequently, the relative chemical contents (C%, N%, O%, NH2/C%) were calculated by employing peak area normalization.
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4

Characterization of BT, IS and BTIS

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The crystalline structures of BT, IS and BTIS were investigated by X-ray diffraction (XRD) using an X'Celerator detector (XRD, X'Pert Pro, PANalytical, Los Altos, CA) with a slow scanning speed of 1° min−1 and Cu Kα radiation (k = 1.5406 Å) in the 2θ range of 5–80°. A Carl Zeiss 55 instrument (Carl Zeiss Microscopy GmbH, Germany) was used to probe the morphology of IS, BT and BTIS. The detailed microstructures of BTIS was observed by high-resolution transmission electron microscopy (HRTEM, JEM-2100HR, JEOL, Japan). X-ray photoelectron spectroscopy (XPS) measurements were performed to investigate the binding states of indium (In), sulfur (S), barium (Ba), titanium (Ti), and oxygen (O) atoms in above-said three samples using an Thermo Scientific K-Alpha XPS system (Thermo Fisher Scientific, America). UV-vis diffuse reflectance spectrum (UV-vis-DRS) measurements of BT, IS and BTIS were performed by a Shimadzu 2550 PC spectrophotometer, using BaSO4 as a reference sample. A photoluminescence (PL) spectra of BT, IS and BTIS recorded on a Hitachi F-4500 fluorescence spectrophotometer (Hitachi, Japan) were employed to qualitatively characterize the recombination rates of the photogenerated electron–hole pairs. Inductively coupled plasma-atomic emission spectrometry (ICP-AES) measurement was performed by SPECTRO ARCOS.
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5

X-ray Photoelectron Spectroscopy of Plastic

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XPS signals for the studied plastic were recorded using a Thermo Scientific K-Alpha XPS system (Thermo Fisher Scientific, UK) equipped with a microfocused, monochromatic Al Kα X-ray source (1486.68 eV) (more details in Supplementary material).
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6

XPS Analysis of BC Composites

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To check the chemical composition of control BC, BC–Chi0.2 and BC–Chi2 composites all samples were drop-casted on Al foils and XPS measurements were performed on a Thermo Scientific K-Alpha XPS system (Thermo Fisher Scientific, UK).
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7

Raman and XPS Spectroscopic Characterization

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Raman measurements were provided by confocal Raman microscope Alpha 300R (WiTec, Germany) using a 532 nm excitation laser line. The laser power was kept below 1 mW to avoid any beam damage. The scattered light was collected by 50× (NA = 0.8) microscope objective and detected by a cooled CCD camera. For dispersing the scattered light, a grating with 1800 gr/mm was used. The spectral resolution of the entire Raman system is about 0.75 cm−1. All the spectra were taken at ambient conditions.
XPS (X-ray photoelectron spectroscopy) spectra were recorded using Thermo Scientific K-Alpha XPS system (Thermo Fisher Scientific, UK) equipped with a micro-focused, monochromatic AlKα X-ray source (1486.6 eV). X-ray beam of 400 µm in diameter was used at 6 mA × 12 kV. The spectra were acquired in the constant analyzer energy mode with the pass energy of 200 eV for the survey. Narrow regions were collected using the snapshot acquisition mode (150 eV pass energy), enabling rapid collection of data (5 s per region). Charge compensation was achieved with the system flood gun that provides low energy electrons and low energy argon ions (20 eV) from a single source. Thermo Scientific Avantage software was used for digital acquisition and data processing. Spectral calibration was performed using an automated calibration routine and the internal Au, Ag and Cu standards.
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8

XPS Analysis of PLA Surface Modifications

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The assessment of the chemical modifications induced into the PLA surface was carried out by the XPS analysis of non-treated, plasma-treated and coated samples, using a Thermo Scientific K-Alpha XPS system (Thermo Fisher Scientific, UK) and the CasaXPS software (version 2.3.19PR1.0, Casa Software Ltd., Teignmouth, UK) for data analysis. Flat-surface samples obtained by compression molding (as detailed in Section 2.2.) were used for this test and three samples per group were analyzed. The oxygen/carbon (O/C) ratio of the surface was evaluated from the peak areas of the XPS survey using a U2 Tougaard background for peak fitting. In a first step, the hydrocarbon component of the C1s spectrum (284.80 eV) was used to calibrate the energy scale.
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