For data analysis, we used PHI MultiPak software (ULVAC-PHI). The signal background of each component was subtracted using the Shirley method. The atomic concentration was calculated by considering the relative sensitivity factor for each element corrected with the sensitivity factor of the system. The fitting protocol used the Gaussian-Lorentzian function, but the best fit results were obtained with Gaussian 100%.
Phi multipak software
PHI MultiPak software is a comprehensive data analysis tool designed for the interpretation of X-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy (AES) data. The software provides a suite of advanced analytical capabilities, including peak fitting, depth profiling, and quantitative analysis, to assist researchers in the characterization of materials at the surface and near-surface regions.
Lab products found in correlation
4 protocols using phi multipak software
XPS Analysis of Material Composition
For data analysis, we used PHI MultiPak software (ULVAC-PHI). The signal background of each component was subtracted using the Shirley method. The atomic concentration was calculated by considering the relative sensitivity factor for each element corrected with the sensitivity factor of the system. The fitting protocol used the Gaussian-Lorentzian function, but the best fit results were obtained with Gaussian 100%.
XPS Characterization of Anhydrous RuO2 Aerosols
Comprehensive Nanomaterial Characterization Protocol
X-ray Photoelectron Spectroscopy Analysis
Argon etching was accomplished using a 500V beam of Ar to bombard the surface of each specimen. Approximately 100 nm was removed from each sample using etch rates based off of computer simulated Monte Carlo calculations (Williams et al., 2003) (link).
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