Ft ir 6100
The FT/IR-6100 is a Fourier Transform Infrared (FT-IR) spectrometer designed for laboratory use. It is a precision instrument that utilizes infrared radiation to analyze the molecular composition of materials. The core function of the FT/IR-6100 is to provide accurate and reliable infrared spectroscopy data for various sample types.
Lab products found in correlation
60 protocols using ft ir 6100
MIR-FEL Irradiation and FT-IR Analysis of E. coli
FTIR Analysis of Extracted PHAs
FTIR Analysis of Polymer Samples
Characterization of Organic Compounds
Microstructural Characterization of Samples
Structural Characterization of Nano-Silver
Physicochemical Characterization of GM-AA-CSNPs
FTIR Spectroscopic Analysis of Almotriptan Buccal Film
Comprehensive Characterization of PbTe Samples
The PbTe structure was obtained by using the XRD–D8 Advance (Bruker, Karlsruhe, Germany) with Cu-Kα line wavelength 1.54 Å. The morphological study of the synthesized material under higher magnification was done by SEM from JEOL (JSM-6400, Tokyo, Japan) with an accelerating voltage of 20 kV of A1 and A5. The energy dispersive X-ray spectroscopy is used for the compositional analysis of the sample A1 and A5. For the FTIR analysis, JASCO FT/IR 6100 (Tokyo, Japan), with a range from 400 to 4000 cm−1 was used to find the presence of various modes in the material. Cyclic voltammetry (CV) measurements were carried out by K-Lyte 1.2 with the research applications of K-Lyte hardware (K-Lyte 1.2, from Knopy Techno Solutions, Kanpur, India). Seebeck coefficient measurements were done by a TEP unit TYPE-2, purchased from Borade Embedded Solutions, Kolhapur, India. Finally, for each sample, the pellets with dimensions 12 mm × 3 mm were prepared by a hydraulic press machine to find the thermo-emf of the synthesized material.
Synthesis and Characterization of MgB2 Thin Films
A pulsed laser ablation device (PLFD-221-1R, Freedom Ltd., Kawasaki, Japan) was used for PLD. X-ray diffractometer (Smartlab, Rigaku Corporation, Tokyo, Japan), laser microscope (LEXT OLS5100, Olympus Corporation, Tokyo, Japan), TOF-SIMS 5-100-AD (ION-TOF GmbH, Germany), FT/IR-6100 (JASCO, Co., Ltd., Tokyo, Japan), atomic force microscope (SPM-9700, Shimadzu Corp., Kyoto, Japan) and scanning electron microscope (JEM-2010F, JEOL, Ltd., Tokyo, Japan) were used for characterization of prepared films.
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