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Nanoscope iva

Manufactured by Veeco
Sourced in United States

The Nanoscope IVa is a scanning probe microscope designed for high-resolution imaging and analysis of nanoscale surface features. It utilizes atomic force microscopy (AFM) technology to provide detailed topographical data and surface characterization capabilities.

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5 protocols using nanoscope iva

1

Epitaxial Ni-Mn-Ga Thin Film Characterization

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A 300 nm-thick Ni52.3Mn26.8Ga20.9 (at.%) film was epitaxially grown by magnetron sputtering onto a MgO(001) substrate heated at 500 °C under 2.6 × 10−2 mbar pressure and 150 W power. Composition of the film was determined with an uncertainty of 0.5 at.% by energy-dispersive x-ray spectroscopy (EDX), using a scanning electron microscope Jeol JSM-6400. Philips X’Pert PRO x-ray diffractometer (CuKα radiation) was used for the structure investigation in 100–450 K temperature range. The atomic force microscopy (Veeco Nanoscope IVA) was used for the visualization of the twin structure. Magnetic parameters of the films were determined from magnetic (Quantum Design SQUID MPMS-5 magnetometer) and ferromagnetic resonance measurements (Bruker ELEXSYS E500 electron spin resonance spectrometer). The magnetoresistance was measured using a standard four-probe method under magnetic fields up to 9 kOe in the temperature range of 100–370 K.
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2

Nanoscale Cellulose Fibre Morphology

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Surface morphology of cellulose nanofibres extracted from wood was analyzed using atomic force microscopy (Type: NanoScopeIVa, Multimode SPM; Company: Veeco Inc., Santa Barbara, USA), in tapping mode. Calibration was carried out by scanning, using a calibration grid with precisely known dimensions. All scans were performed with commercial Si Nanoprobes SPM tips with a resonance frequency of about 300–330 kHz. During sample preparation, highly diluted aqueous nanofibre suspension was pipetted out and then transferred over freshly cleaved mica surface. It was allowed to dry overnight at room temperature to obtain the thin films.
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3

AFM Measurements of Osteoclast Forces

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AFM was used to measure the force at the atomic level. To prepare for AFM measurements, OCs/TC-OCs were seeded at a density of 1 × 104 cells/well on a 12-mm microscope cover glass (Fisher Scientific,12-545-80) prepared in 48-well plates and then incubated for 24 h before imaging. One calcified tissue powder was attached to a tipless cantilever (CSG11/tipless, NT-MDT, force constant of 0.1 N/m as measured by the thermal tuning method). Both cells and cantilevers were thermally equilibrated at 37 °C for 40–60 mins prior to imaging to minimize thermal drift. For in situ AFM experiments, the cover glass containing cells was placed under the AFM liquid cell and modulated. Then, phenol red-free α-MEM (Gibco, USA, 10% FBS) supplemented with 25 µg/l M-CSF and 50 µg/l RANKL was injected into the liquid cell. The experiments were conducted on a commercial AFM (Nanoscope IVa, Veeco).
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4

Atomic Force Microscopy of Enamel

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AFM images of enamel specimens and CPIC-induced bulk ACP were collected under ambient conditions (temperature, 25°C; relative humidity, 40%) by using a multimode atomic force microscope (NanoScope IVa, Veeco, USA) in tapping mode. All images were analyzed with an image analysis software (NanoScope Analysis version 1.7).
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5

Resistance Measurement of Sensitive MIP Layers

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The resistance of the sensitive layer (after template removal) coated on IDT was measured by placing it in a glass cell having a supporting electrolyte as shown in Figure 1. The stock solution of analytes was added into the glass cell having 50 mL of supporting electrolyte to obtain final medium. Hewlett-Packard 4284A precision LCR meter (20 Hz–1 MHz) was operated in an AC mode to measure resistance of sensitive layers. The surface and the thickness of the MIP layers were measured with a VEECO Nanoscope IVa atomic force microscope.
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