After the μXRD experiment, the same area of the 3D printed sample was investigated under BSE mode in a Hitachi SU6600 field emission SEM operating at a 10 kV accelerating voltage. Under these conditions, most of the BSE signals were collected within hundreds of nm underneath the sample surface according to the simulation using CASINO39 (link). The crack and precipitates were clearly observed, and slight contrast was also seen at the substrate-cladding interface.
Su 6600 field emission sem
Manufactured by Hitachi
Sourced in United Kingdom
The SU-6600 is a field emission scanning electron microscope (FE-SEM) manufactured by Hitachi. It is designed to provide high-resolution imaging of a wide range of sample types. The SU-6600 utilizes a cold field emission gun to generate the electron beam, enabling high-quality imaging at low accelerating voltages. The system is equipped with various detectors to capture different signals, allowing for comprehensive analysis of the sample's surface topography and composition.
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5 protocols using su 6600 field emission sem
1
SEM Analysis of 3D Printed Samples
2
SEM Analysis of AgNPs Morphology
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The size and surface morphology of the AgNPs were examined via SEM analysis using a Hitachi SU-6600 field emission SEM. Then, 0.1 mL of the AgNPs sample was dispersed in 0.9 mL of ethanol and drop-casted on silicon wafer, which was analysed [20 (link)].
3
Hydrogel Imaging via Freeze-Drying and SEM
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To image the hydrogels and leached samples, known quantities of each were freeze-dried before samples were attached to aluminium stubs with carbon adhesive pads. Samples were sputter coated (ACE200, Leica Microsystems, Wetzlar, Germany) with gold to reduce charging in the SEM. Samples were viewed with a Hitachi SU6600 Field Emission SEM at voltage 5 kV under standard vacuum settings at magnifications of 300 ×, 1000 × and 10,000 ×.
4
Visualizing Silver Nanoparticles via SEM and STEM
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SEM micrographs for free and encapsulated AgNP were obtained using a Hitachi SU-6600 field emission SEM (Hitachi, Maidenhead, UK) at an accelerating voltage of 25 kV and working distance of 8 mm. For SEM analysis, a 5 µL drop-cast of each sample was made onto a 5 × 5 mm pure silicon wafer substrate (Ted Pella Inc., Redding California, USA) 24 h prior to obtaining the micrographs and allowed to air dry. For STEM analysis, 3 µL of each sample was dropcast onto a carbon formvar copper grid (Agar Scientific Ltd., Stanstead, UK) 24 h prior obtaining and allowed to air dry.
5
Characterization of Silver Nanoparticles by SEM
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SEM micrographs for free and encapsulated AgNP were obtained using a Hitachi SU-6600 field emission SEM (Hitachi, Maidenhead, UK) at an accelerating voltage of 25 kV and working distance of 8 mm. For SEM analysis, a 5 μL drop-cast of each sample was made onto a 5 × 5 mm pure silicon wafer substrate (Ted Pella Inc., Redding California, USA) 24 h prior to obtaining the micrographs and allowed to air dry. For STEM analysis, 3 μL of each sample was drop-cast onto a carbon formvar copper grid (Agar Scientific Ltd., Stanstead, UK) 24 h prior obtaining and allowed to air dry.
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