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Methyl isobutyl ketone mibk

Manufactured by Merck Group
Sourced in China, Germany, Israel, United Kingdom

Methyl isobutyl ketone (MIBK) is a clear, colorless organic solvent used in a variety of industrial applications. It is commonly employed as a chemical intermediate, a degreasing agent, and a solvent for paints, coatings, and resins. MIBK has a characteristic ketone odor and is miscible with a range of organic solvents.

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6 protocols using methyl isobutyl ketone mibk

1

Lead Solution Preparation Protocols

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Pb2+ solutions were prepared from PbNO3 (Hangfeng Chemical Co., Inc., Chengdu, China) for using in different experiments. 0.85% physiological saline, 6% nitric acid (HNO3), hydrogen peroxide (H2O2), 25% potassium iodide solution (KI), ascorbic acid solution (AA), and methyl isobutyl ketone (MIBK) were purchased from Sigma–Aldrich (Shanghai, China). All solutions were prepared using analytical-grade reagents and water was distilled and deionized with a Milli-Q® system (Millipore, Billerica, MA, USA).
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2

Determination of Lead in Solutions

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Analytical standard solutions of lead (Spectro ECON) were prepared by serially diluting a 1000 mg/L stock calibration standard solution. Reagents used included trichloroacetic acid (5%; TCA) and perchloric acid (extra pure, Riedel-de Haen, Germany), K2EDTA and ammonium pyrollidine dithiocarbamates (APDC; Merck (Darmstadt), calcium chloride and methyl iso-butyl ketone (MIBK; Sigma Chemical Co).
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3

Tantalite Ore Leaching and Characterization

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Employing an Anton Paar PerkinElmer Multiwave 3000 microwave reaction system fitted with an 8SXF100 rotor and eight PTFE reaction vessels, a concentrated tantalite sample was leached using a solution of 6 M HF and 1 M H2SO4. TGA was used to analyze the weight fraction, weight loss, and thermal stability of tantalite ore samples as their temperature increases. Model TA 50, Shimadzu America, and platinum cell in nitrogen with a flow rate of 30 mL/min were the instruments used. SEM with EDS (JEOL JSM-848 model) was used to examine the compositional and topographic changes that occurred both before and after the samples were leached. The dissolution procedure was conducted in a stainless batch reactor (SUS316) within a high-temperature furnace set at different temperatures of 100 -400 °C. No additional purification was required when using research-grade HF, H2SO4, ammonia solution, and methyl isobutyl ketone (MIBK) from Sigma-Aldrich.
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4

Synthesis and Characterization of Methacrylated Silicone Polymers

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All the methacrylated silicone polymers and co-polymers – methacryloxypropyl terminated polydimethylsiloxane (CAS: 58130–03-3), 1000 cSt, [2–4% (methacryloxypropyl)methylsiloxane]-dimethylsiloxane copolymer (CAS: 104780–61-2) (1000–2000 cSt), [4–6% (methacryloxypropyl)methylsiloxane]-dimethylsiloxane copolymer (CAS: 104780–61-2) (8000–10000 cSt) and [7–9% (methacryloxypropyl)methylsiloxane]-dimethylsiloxane copolymer (CAS: 104780–61-2) (2000–3000 cSt) were purchased from Gelest Inc. (Morrisville, PA). Ethyl (2,4,6-trimethylbenzoyl) phenyl phosphinate (TPO-L) and 2-isopropyl thioxanthone (ITX) were generously offered as samples from Esstech Inc. (Essington, PA). Dow Corning OS-10 silicone fluid and Dow Corning OS-20 silicone fluid, and Dynaloy Dynasolve M-10 cleaner fluid were purchased from Ellsworth Adhesives (Germantown, WI). Isopropyl alcohol (IPA), 3-(trimethoxysilyl)propyl methacrylate (TMSPMA), ethyl alcohol, acetone, n-hexane, methyl ethyl ketone (MEK), methyl isobutyl ketone (MIBK), toluene, xylenes and tetrahydrofuran (THF) were purchased from Sigma-Aldrich (St Louis, MO).
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5

Fabrication of PDMS-Based Electrodes

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PDMS (Sigma-Aldrich,
Rehovot, Israel) was mixed at a ratio of 1:10 with curing agent (Sylgard
184, Sigma-Aldrich, Rehovot, Israel). Nylon-6-6 beads were dissolved
in hexafluoro-2-propanol (HFIP; Sigma-Aldrich, Rehovot, Israel) at
60 mg/mL and sonicated at 45 °C for 30 min. CAB was dissolved
in methyl isobutyl ketone (MIBK; Sigma-Aldrich, Rehovot, Israel) at
84 mg/mL. The solution was mixed until fully dissolved. CAB and Ny
electrodes were soaked in MHDA solution (7.2 mg/mL in ethanol) to
improve adhesion.
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6

PMMA Resist Film Patterning

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The resist film, NANO TM PMMA (M w 950k, MicroChem, Newton, MA, USA) was prepared by spin-coating onto Silicon substrates as previously described (Falzone et al., 2012) . After exposure to energetic electrons the latent patterns were developed for 1 min in methyl isobutyl ketone (MIBK, Sigma-Aldrich, Dorset UK):isopropyl alcohol (IPA, Sigma-Aldrich,) in a ratio of 2:1 (Falzone et al., 2012 , Royle et al., 2015) .
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