To investigate the morphology of the hydrogels containing a large amount of liquid phase in their original form, optical microscopy images were obtained using an optical microscope XSP-104 equipped with a Micro Ocular PCE-ME 100 camera (Armed, Russia). In addition, the dried hydrogels were studied using a Quattro S scanning electron microscope (Thermo Fisher Scientific, Czech Republic). The hydrogels were dried at 1500 °C under vacuum.
Quattro s scanning electron microscope
Manufactured by Thermo Fisher Scientific
Sourced in Czechia
The Quattro S scanning electron microscope (SEM) is a versatile imaging and analysis tool designed for high-resolution, high-magnification examination of samples. It provides detailed information about the surface topography and composition of a wide range of materials. The Quattro S SEM utilizes an electron beam to scan the sample surface, generating signals that are used to create a magnified image.
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Lab products found in correlation
Escalab220i xl electron spectrometer, by VG Scientific (2 mentions)
Jem 2100f, by JEOL (2 mentions)
Labram hr evolution, by Horiba (1 mentions)
Arm200f, by JEOL (1 mentions)
Tenor 27 spectrophotometer, by Bruker (1 mentions)
Uv 2600, by Shimadzu (1 mentions)
Smartlab se x ray diffractometer, by Rigaku (1 mentions)
5 protocols using quattro s scanning electron microscope
1
Hydrogel Morphology Characterization
2
Scanning Electron Microscopy of Frozen Samples
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The morphology of the surfaces and cross-sections of the samples were obtained using a Quattro S scanning electron microscope (SEM) (Thermo Fischer Scientific, Černovice, Czech Republic). The images were recorded in secondary electrons at an accelerating voltage of 5 kV. A cross-section of the samples was analyzed after freezing in liquid nitrogen. The samples for the study were coated with gold using a Quorum Q150es plus sputter coater.
3
Comprehensive Materials Analysis by Multi-Techniques
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Samples were analyzed by means of Raman spectroscopy, atomic force microscopy (AFM), and scanning electron microscopy (SEM). The LabRAM HR Evolution (HORIBA) system was used to conduct Raman spectroscopy. AFM was performed by the NTMDT-SMENA to investigate the topography of the laser scan tracks. SEM images were obtained using Tescan Solaris dual-beam scanning electron microscope (Tescan, Brno, Czech Republic) and Quattro S scanning electron microscope (ThermoFisher Scientific, Waltham, MA, U.S.). Electrical measurements were carried out using a B1500A Agilent semiconductor analyzer.
4
Structural Characterization of Materials
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X-ray diffraction measurements were conducted on a Bruker D2 and D8 diffractometer using Cu KR radiation at a wavelength of 1.5406 Å. SEM and EDS were acquired by a Thermo Scientific (Waltham, MA) Quattro S scanning electron microscope. A JEOL JEM-2100F (JEOL, Tokyo, Japan) field emission transmission electron microscope was used to collect TEM and high-resolution TEM images. The spherical aberration–corrected HAADF-STEM images and EDS elemental mappings were obtained on a JEOL ARM200F with cold field emission gun and double hexapole Cs correctors (CEOS GmbH, Heidelberg, Germany). Raman spectra were recorded on the LabRAM HR Raman spectrometer with laser excitation at 514.5 nm from an Ar ion laser source. XPS analysis was based on a ESCALAB 220i-XL electron spectrometer from VG Scientific (Waltham, MA) using 300 W Al KR radiation (base pressure <10−5 mbar). X-ray absorption spectroscopy was conducted in a transmission mode at beamline X-ray absorption fine structure for catalysis of a Singapore Synchrotron Light Source (Singapore) operated at 700 MeV with a beam current of 200 mA.
5
Comprehensive Materials Analysis Protocol
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XRD measurements were conducted on a Rigaku SmartLab SE X-ray diffractometer. SEM and EDS data were acquired by a Thermo Fisher Scientific (TFS) Quattro S scanning electron microscope. TEM images and EELS spectra were collected on a field emission JEM-2100F (JEOL, Japan). The HAADF-STEM images and EDS elemental mappings were obtained on a double aberration-corrected Spectra 300 TEM/STEM (TFS). The order of magnitude of the electron dose is down to the 10 3 e -Å -2 . The FT-IR spectra were recorded on a Bruker TENOR 27 spectrophotometer employing the KBr pellets. The product analysis was made using NMR spectroscopy (300 MHz, Bruker AVANCE III BBO Probe) and ultraviolet-visible absorbance spectroscopy (UV-Vis spectrophotometer, SHIMADZU UV-2600). XPS analysis was based on a ESCALAB 220i-XL electron spectrometer from VG Scientific using 300 W Al KR radiation. X-ray absorption spectroscopy (XAS) was conducted in a transmission mode at beamline X-ray absorption fine structure for catalysis (XAFCA) of Singapore Synchrotron Light Source.
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