Triethoxysilane

The polymeric siloxane precursors: poly(methylhydrosiloxane) (P-H-100; M_nGPC = 1800 g/mol, PDI = 2.56) and (50–55% methylhydrosiloxane)-dimethylsiloxane copolymer (random distribution of SiH groups) (P-H-50; M_nGPC = 2800 g/mol, PDI = 1.48), both terminated with trimethylsilyl groups, were purchased from ABCR (Karlsruhe, Germany).
Triethoxysilane (95%), eugenol (99%), linalool (97%) and vinyltrimethylsilane (97%) were purchased from Sigma Aldrich (St. Louis, MO, USA) and used as received. Pt⁰/divinyltetramethyldisiloxane complex (Karstedt’s catalyst, 2.1–2.4%Pt, solution in xylene) was obtained from ABCR (Karlsruhe, Germany). Hydrochloric acid (aqueous solution 35–38 wt%) was bought from PPH Stanlab Sp. J., Lublin, Poland.
Solvents used for the synthesis, toluene (Avantor Performance Materials Poland S.A., Gliwice, pure p.a.), dichloromethane (Avantor Performance Materials Poland S.A., Gliwice, pure p.a), ethanol (Avantor Performance Materials Poland S.A., Gliwice, pure p.a) and tetrahydrofuran (THF, Chempur, Karlsruhe, Germany, pure p.a.), were purified according to the literature procedures [48 ].

Reagents were purchased from Sigma-Aldrich (Burlington, MA, USA) and used as received, unless stated otherwise: acrylamide (AAm; ≥99%) and 2-acrylamido-2-methyl-1-propanesulfonic acid (AMPS; 99 %); N, N’-methylenebisacrylamide (MBIS; 99%); photoinitiator 2-hydroxy-4′-(2-hydroxyethoxy)-2-methylpropiophenone (Irgacure 2959; 98%), 1, 3, 5 –trioxane (≥99%); (3-aminopropyl), ammonium hydroxide (28–30% NH₄OH basis), tetraethyl orthosilcate (TEOS; 98%), triethoxysilane (APTES; ≥98%), deuterium oxide (D₂O; 99.9 atom % D), cerium (IV) ammonium nitrate (CAN; ≥99.99% trace metals basis), sodium dodecyl sulphate (SDS; ≥98.5%). No additional processing and/or purifications were performed. D-glucose (G) and glucose oxidase (GOx; from aspergillus niger as a lyophilized powder) were purchased from Sigma-Aldrich (Burlington, MA, USA) and stored in phosphate buffer saline (PBS) aliquots at −20 °C when received.
Amine functionalized silica nanoparticle (ASNP) synthesis, the procedure for polymer conversion studies of argon degassing and Gox, and the characterisation techniques used in this work can be found in the supplementary information. A schematic representation of ASNP synthesis can also be found in the Supplementary Information Figure S1. TEM images of the polymer-ASNPs can be found in the Supplementary Information Figure S2 [14 (link),47 (link),62 (link),63 (link),64 (link),65 (link)].