Su6600 schottky emission vpfe sem instrument

The sheet resistances of the ITO nanowire networks were measured using a digital multimeter (LDX-M-3) with a four-point probe. Bright-field transmission electron microscopy (TEM) analyses were conducted on a JEOL JEM 2100 F microscope (JEOL, Tokyo -Japan), operated at 200 kV acceleration voltage. The scanning electron microscopy (SEM) analyses were conducted on a HITACHI SU6600 Schottky Emission VPFE-SEM instrument. The X-ray diffraction (XRD) analyses were conducted on X’Pert PRO (Almelo-Netherlands). The X-ray Photoelectron Spectroscopy (XPS) analyses were carried out with a Kratos Axis Ultra DLD spectrometer using a monochromatic Al Kα source operated at 150 W. Spectra have been charge corrected to the main line of the C 1 s spectrum set to 284.3 eV. The surface electric field was tested by the scanning near-field optical microscope (SNOM, NTMDT-Ntegra Spectra SNOM) with Kelvin probe (30 nm) under AFM mode. The AFM scanning mode is Contact Topography Mode and the scanning Rate is 8000 Hz. The scanning area is 15 μm × 15 μm.

Bright-field transmission electron microscopy (TEM) analyses were conducted on a JEOL JEM 2100 F microscope (JEOL, Tokyo -Japan), operated at 200 kV acceleration voltage. The scanning electron microscopy (SEM) analyses were conducted on a HITACHI SU6600 Schottky Emission VP FE-SEM instrument. The X-ray diffraction (XRD) analyses were conducted on X’Pert PRO (Almelo-Netherlands). The X-ray Photoelectron Spectroscopy (XPS) analyses were carried out with a Kratos Axis Ultra DLD spectrometer using a monochromatic Al Kα source operated at 150 W. Spectra have been charge corrected to the main line of the C 1 s spectrum set to 284.3 eV.