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Oxygen plasma cleaner

Manufactured by Harrick
Sourced in United States

The Oxygen Plasma Cleaner is a lab equipment designed to clean and activate surfaces through the use of oxygen plasma. It generates a high-energy, oxygen-based plasma that effectively removes organic contaminants and enhances surface wettability for various materials.

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12 protocols using oxygen plasma cleaner

1

Millifluidic Platform for Microbial Cultivation

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We microfabricated millifluidic channels 30 mm in length, 1 mm in width, and 1 mm in height. A PDMS mixture (RTV615A+B; Momentive Performance Materials) was poured at ambient temperature in a polyvinyl chloride home-micromachined mold and left to cure at least 3 h in an oven set at 65 °C. Then, the recovered templates were drilled for further plugging of adapted connectors and tubings. PDMS templates and glass coverslips were then cleaned using an oxygen plasma cleaner (Harrick) and immediately bound together to seal the channels. For connections, we used stainless steel connectors (0.013″ ID and 0.025″ OD) and microbore Tygon tubing (0.020″ ID and 0.06″ OD) supplied by Phymep (France). The thin metallic connectors provide a bottleneck in the flow circuit, which prevents upstream colonization. The medium was pushed into the channels at a controlled rate using syringe pumps for the 36–40 h of the experiment. Up to 12 channels can be run and monitored in parallel. The whole experiment was thermostatically maintained at 30 °C.
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2

Surface Characterization of SiNW-FET Devices

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The surface of the SiNW-FET device was cleaned using the oxygen plasma cleaner (Harrick Plasma, New York, NY, USA) before the surface modification. Each n-type SiNW-FET device had two nanowires, and each nanowire had a length of 2 μm and a width of 200 nm [20 (link)], measurements that had been used in previous reports [20 (link),21 (link),22 (link),23 (link)]. The SiNW-FET measurements were carried out on the chip-on-board (COB) detection platform provided by Helios Bioelectronics, Inc. (Hsinchu County, Taiwan). Atomic force microscopy (AFM; SPA-400 DFM, Seiko, Japan) was utilized to analyze the surface roughness of the FET surface after each modification step. In addition, X-ray photoelectron spectroscopy (XPS; Thermo VG-Scientific, Loughborough, UK) was applied to identify the elemental composition and chemical state of the SiNW-FET surface.
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3

Millifluidic Cell Culture Fabrication

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Millifluidic channels were microfabricated to be 30 mm x 1 mm x 1 mm (length x width x height). A polydimethylsiloxane (PDMS) mixture (RTV615A+B; Momentive Performance Materials) was poured at ambient temperature in a polyvinyl chloride home-micromachined mold and left to cure at least 3 hours in an oven set at 65°C. Next, the recovered templates were drilled for further plugging of adapted connectors and tubing. PDMS templates and glass coverslips were then cleaned using an oxygen plasma cleaner (Harrick) and immediately bound together to seal the channels. The channels are then immediately filled with ultrapure sterile water to avoid prolonged contact with air before injecting the cells within the following 3 to 4 hours. For connections, we used stainless steel connectors (0.013” ID and 0.025” OD) and microbore Tygon tubing (0.020” ID and 0.06” OD) supplied by Phymep (France). The thin metallic connectors provide a bottleneck in the flow circuit, which prevents upstream colonization. The sterile medium was pushed into the channels at a rate of 1 ml/h with syringe pumps for the 36-40 hours of the experiment. The whole experiment was thermostatically maintained at 30°C.
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4

Hydrogel Microwell Arrays Fabrication

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To bond the hydrogels onto the glass surface, the following procedure was carried out. The microscopic glass slide was soaked in 0.4% v/v 3-(trimethoxysilyl) propyl methacrylate (TMS-PMA) (Sigma Aldrich, Singapore) for 12 h to provide bonding sites on the glass surface [54 (link)]. The glass side was then rinsed with water and dried at 70 °C for 2 h. Two coverslips were stacked up as spacers on the glass slide. Then the PDMS stamp was placed on top of the two coverslips (Figure 7B). To make the PDMS surface wettable, the PDMS stamp was treated using an oxygen plasma cleaner (Harrick Plasma, Ithaca, NY, USA) for 3 min. Afterwards, 50 μL of 5.0% w/v MeHA prepolymer solution was carefully added into the gap between the PDMS stamp and glass slide using a micropipette. The prepolymer solution was then exposed to ultraviolet (UV) radiation of 4.3 W/cm2 for 40 s at 4 cm to the light source OmniCure s2000 (Excelitas Technologies, Waltham, MA, USA). After exposure, the PDMS stamp was peeled off from the surface, coverslip spacers were removed, and the formed hydrogel microwell array was placed in 10 mL of PBS solution.
The fabrication of hydrogel microwell arrays containing DPSCs is presented separately in Section 2.6.
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5

Millifluidic Channel Fabrication and Characterization

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We micro-fabricated millifluidic channels 30 mm in length, 1 mm in width and with heights ranging from 250 μm to 1 mm. A polydimethylsiloxane (PDMS) mixture (RTV615A+B from Momentive) was poured at ambient temperature in a polyvinyl chloride home-micromachined mold and left to cure at least 3 hours in an oven set at 65°C. Then, the recovered templates were drilled for further plugging of adapted connectors and tubings. PDMS templates and glass coverslips were then cleaned using an oxygen plasma cleaner (Harrick) and immediately bound together to seal the channels. The last step consisted in adapting connections: we used stainless steel connectors (0.013" ID and 0.025" OD) and microbore Tygon tubing (0.020" ID and 0.06" OD) supplied by Phymep (France). The thin metallic connectors accommodate on the flow circuit a bottleneck which prevented upstream colonization. Next the plugged device—usually a set of five channels 250 μm; 350 μm; 500 μm; 750 μm and 1 mm in height, respectively—was fixed on the microscope stage using a customized holder. The medium was pushed into the channels at a controlled rate using syringe pumps.
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6

Microfluidic Device Fabrication by Soft Lithography

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The microfluidic devices were fabricated by soft lithography. Photomasks designed in AutoCAD were printed on transparencies. The features on the photomask were transferred to a negative photoresist (MicroChem, SU-8 2025) on a silicon wafer (University Wafer) by UV photolithography. Polydimethylsiloxane (PDMS, Dow Corning, Sylgard 184) prepolymer mixture was poured over the patterned silicon wafer and cured in a 65 ºC oven for 2 h. The PDMS replica was peeled off and punched for inlets and outlets by a 0.75 mm biopsy core (World Precision Instruments). The PDMS slice was bound to clean glass by oxygen plasma cleaner (Harrick Plasma), followed by baking at 65 ºC for 1h to ensure strong bonding. The microfluidic channels were treated with Aquapel (PPG Industries) and baked at 65 ºC for 30 min for hydrophobicity.
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7

Phosphorescent Quartz Glass Surface Characterization

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A LED-driving UV Curing System (Lamplic, Shenzhen, China) was used in curing process of photolithography. An oxygen plasma cleaner (Harrick Plasma, Ithaca, NY) was used for quartz glass surface activation. A Fluoromax-4 spectrofluorophotometer (Horiba Scientific Instruments) was used for phosphorescence measurements. A mask aligner (MA6BA6) was obtained from Germany. An ADS-800 Series advanced dicing system (Optium, Veeco, NY) was used for cutting quartz glass into squares of 13 mm × 13 mm, which can fit diagonally into a quartz fluorescence cuvette at an angle of 45° to the excitation light. A scanning electron microscopy (SEM, S-3000N, Hitachi) was utilized for characterization of film surface topography. An atomic force microscopy (AFM, Bruker Multimode 8) using Si-cantilevers with a resonance frequency in 70 kHz and a force constant in 0.4 N m−1 (ScanAsyst mode, ambient atmosphere, room temperature) was utilized for analysis of surface roughness and topography. A laboratory water purification system (Master series, HITECH) was used to produce double distilled water. All experiments were accomplished at room temperature and 45–70% relative humidity except cell culture.
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8

Plasma Activation and Silane Functionalization

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PDMS discs were cleaned by washing with isopropanol and ethanol and deionized in sequence, followed by drying under nitrogen flow. The cleaned discs were then activated by an oxygen plasma cleaner (30 W at 20 mtorr pressure; Harrick Plasma) for 3 min. After oxygen plasma treatment, the activated discs and 1 g of 3-glycidyloxypropyltrimethoxysilane were put into a vacuum oven, placed at room temperature and left for 12 h. Once the reaction was complete, the discs were washed twice with anhydrous ethanol and DI water, respectively, for 5 min each time. Subsequently, they were washed once more with anhydrous ethanol and then dried in an oven at 60 °C for 1 h.
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9

Surface Modification for Cell Culture

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Before seeding cells in the microfluidic channels, the inner surface of PDMS was modified to covalently bond extracellular matrix molecules33 (link). Briefly, PDMS chips and standard glass slides were cleaned, activated in an oxygen plasma cleaner (Harrick Plasma, New York, USA) at 650 mTorr for 3 min, and bonded together. Immediately after bonding, the hydrophobic PDMS surface in the microchannels was silanized to make it hydrophilic by filling the channels with 5% 3-triethoxysilylpropylamine (APTES, Sigma-Aldrich, Buchs, Switzerland) and incubation for 20 min at room temperature. The channels were then washed with ultrapure water and treated with 0.1% glutaraldehyde (Sigma-Aldrich) for 30 min to provide a crosslinking substrate for the immobilization of extracellular matrix proteins. Microchannels were incubated with 50 µg/ml human fibronectin (Millipore, Schaffhausen, Switzerland) in PBS for 1 h at 37 °C or at room temperature overnight under UV light, followed by 100 μg/ml bovine collagen I in 0.2 mol/l acetic acid (Gibco, Thermo Fisher Scientific) at room temperature for 1.5 h. Cell culture medium containing 10% FBS was then rinsed through the microfluidic channels to block unspecific protein binding sites as well as to wash out unbound collagen I before cell loading.
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10

PDMS-Based Microfluidic Device Fabrication

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The microfluidic devices
were fabricated in polydimethylsiloxane (PDMS) using standard soft
lithography. Photomasks designed by AutoCAD were printed on transparencies
and the features on the photomask were transferred to a silicon wafer
(University Wafer) using a negative photoresist (MicroChem, SU-8 2025)
by UV photolithography. A PDMS (Dow Corning, Sylgard 184) prepolymer
mixture of polymer and cross-linker at a ratio of 10:1 was poured
over the pattered silicon wafer and cured in a 65 °C oven for
2 h. The PDMS replica was peeled off and punched for inlets and outlets
by a 0.75 mm biopsy core (World Precision Instruments). The PDMS slab
was bound to a clean glass using an oxygen plasma cleaner (Harrick
Plasma), followed by baking at 65 °C for 30 min to ensure strong
bonding between the PDMS and glass. The microfluidic channels were
treated with Aquapel (PPG Industries) and baked at 65 °C overnight
for hydrophobicity.
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