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Zepto plasma cleaner

Manufactured by Diener Electronic
Sourced in Germany

The Zepto plasma cleaner is a compact and versatile laboratory equipment designed to clean and activate surfaces. It utilizes a low-pressure plasma discharge to remove organic contaminants and enhance surface wettability. The Zepto plasma cleaner operates at a frequency of 13.56 MHz and can accommodate a wide range of sample sizes.

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8 protocols using zepto plasma cleaner

1

Microfluidic Chip Fabrication for Biofilm Studies

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We fabricated the microfluidic chips following standard soft lithography techniques. More specifically, for the 24- and 48-h long biofilm experiments, we designed 1-cm long, 500 or 250-μm wide channels in Autodesk AutoCAD 2018 and printed them on a soft plastic photomask. We then coated silicon wafers with photoresist (SU8 2025, Microchem), with varying thicknesses (25, 50, and 90 μm) to allow a wider range of mean flow velocities for identical flow rate settings. The wafer was exposed to UV light through the mask and developed in PGMEA (Sigma-Aldrich) in order to produce a mold. PDMS (Sylgard 184, Dow Corning) was subsequently casted on the mold and cured at 80 °C for about 1 h 30 min. After cutting out the chips, we punched 1 mm inlet and outlet ports. We finally bonded the PDMS chips to glass coverslips (Marienfeld 1.5) in a ZEPTO plasma cleaner (Diener electronic). To fabricate channels for the 6-day long biofilm experiments, we followed a similar procedure, but adjusted the dimensions of the channel to leave more space for large 3D structures to form. More precisely, the channel was 2 mm wide, 110 μm high.
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2

Fabrication of Microfluidic Chip with Lumens

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PDMS (Sylgard 184, Dow Corning) was casted on the mold and cured at 60°C for about 1 h and 30 min. We then used a scalpel to cut out each chip individually and carefully remove it from the mold. In parallel, we prepared PDMS rods to pattern the lumens according to a published protocol [34 (link)]. In short, we filled gauge 14 needles (Sterican 2.1 × 80 mm, B. Braun) with PDMS and cured it as described above. We then used pliers to break the needles and extract the PDMS rods; their diameter was approximately 1.6 mm (i.e., inner diameter of the needle). We used a scalpel to cut them into 8–mm long pieces. Then, PDMS chips and rods were briefly immersed in isopropanol, left to dry, and cleaned using tape. Afterwards, the rods were inserted into the chips using tweezers; the assembled devices were subsequently autoclaved. They were then plasma bonded to either glass–bottom dishes or glass–bottom 6–well plates (1.5 coverslip, glass diameter 20 mm, MatTek) in a ZEPTO plasma cleaner (Diener electronic). Note that the chips contained thin PDMS membranes at the bottom of their inlet reservoirs (obtained owing to a shallow cavity in the 3D printed mold), so that the rod was not in direct contact with the underlying coverslip. Finally, we exposed the chips to 2 cycles of UV sterilization in a biosafety cabinet.
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3

Silanized Glass Coverslips with Biotin-PEG Functionalization

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Glass coverslips (22 × 22 mm, Marienfeld) were cleaned with a Zepto plasma cleaner (Diener Electronic) and incubated in acetone containing 2 % (v/v) 3-aminopropyltriethoxysilane for 5 min. Silanized coverslips were rinsed with ddH2O, dried and baked at 110°C for 30 min. Coverslips were then covered with a fresh solution of 0.4 % (w/v) Biotin-PEG-Succinimidyl Carbonate (MW 5,000) and 15 % (w/v) mPEG-Succinimidyl Carbonate (MW 5,000) in fresh 0.1 M NaHCO3 and incubated overnight at room temperature. Coverslips were rinsed with ddH2O, dried and incubated again with in a fresh Biotin-PEG/mPEG solution as described above. Functionalized PEG-Biotin microscope slides were again washed and dried and finally stored under vacuum.
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4

Cultivation and Plunge-Freezing of CRFK Cells

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Crandell-Rees feline kidney (CRFK) cells were cultivated in DMEM with 4,5 g/l D-glucose, supplemented with 2 mM glutamine and 10% FCS inside a humidified incubator at 37 °C. For preparing specimens, Quantifoil R2/2 AuG200F1 finder or Au-HZB-2 grids (Quantifoil Micro Tools GmbH, Germany) were first cleaned for 30 s at maximum power in a Diener Zepto plasma cleaner (Diener Electronic, Germany), then sterilized in 70% ethanol and placed inside empty wells of a 24-well plate. After letting the remaining ethanol evaporate, fresh full medium was added and subsequently CRFK cells were seeded, such that they had reached a confluency of 70 to 80 % the next day, when the cells were either fixed for two hours at room temperature in freshly prepared 2% glutaraldehyde or directly plunge-frozen in liquid ethane. The frozen specimens were stored in liquid nitrogen until imaging.
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5

Air Plasma Treatment for Cell Adhesion

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Air plasma surface treatment was performed to enhance cell adhesion on both TCES and RES. Prior to cell culture, the scaffolds were cut into 15 × 15 mm square pieces and placed into a Zepto plasma cleaner (Diener Electronic, Ebhausen, Germany) set with low-power parameters of 10 W–40 KHz and exposure time of 2 min. TCES and RES were stored at 4 °C in sealable bags to avoid any degradation of the plasma coating.
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6

Fabrication and Characterization of MIP Films

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Langmuir-Blodgett (LB) transfer of silica beads was performed by a Langmuir trough type BAM 601 (rectangular, 7 Â 75 cm 2 ) controlled using NIMA TR620 software. An MPW Medical Instruments centrifuge model MPW-351R was used to centrifuge silica beads. The surface of Au plates was cleaned and hydrophilized by a Zepto plasma cleaner (100 W) from Diener Electronic.
MIP films were imaged by scanning electron microscopy (SEM) using a Nova NanoSEM 450 microscope from FEI Nova. SECM measurements were performed with a home-build SECM system consisting of PIHera closed-loop piezo positioner (Physik Instrumente), two VA-10X patch-clamp amplifiers (npi Electronic Instruments) connected in a bipotentiostat, PCI-DAS1602/16, and PCI-DDA04 AD/DA cards (Measurement Computing) operating under SECMx software. 31 In the SECM experiments, a Pt microelectrode, ca. 25 mm in diameter, was used as an SECM probe, while a silver chloride-covered silver wire served as a pseudo-reference electrode.
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7

Planar Lipid Bilayer Formation

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Directly before use, silicon wafers were cut to ca. 7 mm  ×  22 mm, thoroughly rinsed with water and ethanol p.a., and dried under nitrogen stream. Wafers were cleaned with an oxygen plasma generated in a Diener Zepto plasma cleaner (Diener Electronic) as follows: 15 min of oxygen flow at 25 mbar, followed by a plasma process of 5.5 min at 25 mbar and 60% power. Subsequently, the wafers were mounted in home-built Teflon measuring chambers and hydrated with 350μL of spreading buffer (20 mM trisodium citrate, 50 mM KCl, 0.1 mM EDTA, 0.1 mM NaN3 , pH 4.8) immediately after plasma treatment. 250  μ L of vesicle solution (prepared as described above) was added and a bilayer formed over two hours at room temperature. 400  μ L of measuring buffer was added, and remaining vesicles were rinsed off with 6×1  mL of measuring buffer. 600  μ L of measuring buffer was added again to yield a sample volume of 1600  μ L.
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8

Bilayer Formation on Glass Surfaces

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Co. KG, Lauda-Königshofen, Germany) that were assembled into a flow chamber through double-sided sticky tape (Scotch, Conrad Electronic SE, Germany). Prior to their assembly, cover slides (#0102242, #1.5, 24 x 60 mm; #0102062, #1.5, 24 x 24 mm) were cleaned by sequential sonication in Milli-Q water, isopropanol, and Milli-Q water (15 min each), and subsequently dried under a nitrogen stream. Slides were then activated for 30 s (30% power, 0.3 mbar) in a Zepto plasma cleaner (Diener electronic GmbH, Ebhausen, Germany) using oxygen as the process gas. After flow chamber assembly, SUVs were added to each reaction chamber at a final concentration of 0.4 mg/mL in Min buffer with additional 2 mM CaCl2 to promote vesicle rupture. Unfused SUVs were removed through subsequent washing with Min buffer.
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