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Parstat 2263

Manufactured by Ametek
Sourced in United States

The PARSTAT 2263 is a high-performance potentiostat/galvanostat from Ametek. It is designed for electrochemical analysis and testing applications. The device provides precise control and measurement of electrochemical signals.

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5 protocols using parstat 2263

1

Electrophoretic Deposition of Photoanodes

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All tested photoanodes were prepared via an electrophoretic deposition method (EPD) on conducting FTO glass supports. EPD was carried out in acetone (50 mL) containing the as-prepared samples (40 mg) and iodine (10 mg), which was dispersed by sonication for 10 min. Two FTO electrodes (1.6 × 2 cm2) were immersed parallel in the solution at a distance of 10 mm, and 15 V bias was then applied between the electrodes for 3 min using a potentiostat (PARSTAT 2263, Princeton Applied Research). The coated area was controlled to be ca. 1.6 × 1.0 cm2. The electrode was dried in air at room temperature. The average thickness of the as-prepared samples deposited on FTO was 3.0 μm under the EPD conditions.
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2

Cyclic Voltammetry of Hexacyanoferrate(III)

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Cyclic voltammetry (CV) experiments were performed using a PARSTAT 2263 advanced electrochemical analyzer (Princeton Applied Research, Oak Ridge, TN, USA) running Power CV software (Princeton Applied Research). All experiments were carried out by a three-electrode system with all-carbon electrodes as the working electrode, a platinum wire as the counter electrode, and an Ag/AgCl electrode as the reference electrode in DI water with the addition of 0.1 M potassium chloride (KCl) containing 1.0 mM potassium hexacyanoferrate(III) (K3Fe(CN)6, ACS reagent, Sigma-Aldrich, St. Louis, MO, USA). The CV measurement were recorded within a potential range from −0.1 to +0.5 V vs. Ag/AgCl.
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3

Characterization of Photoactive Semiconductors

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The PS samples were characterized by X-ray diffraction (XRD) (Philips X'Pert diffractometer) using PANalytical Pro, equipped with a source of Cu-Kα: 1.540598 Å, voltage at 40 kV, current at 40 mA, and X'Celerator detector. The software used to collate the results was the X'Pert HighScore Plus by Rietveld refinement and simulation of crystal structures complemented by the Jmol software. Scanning electron microscopy (SEM) and Energy Dispersive X-ray (EDX) (JEOL JSM-6490LV) measurements were obtained with 3.0-nm resolution, magnification × 5~300.000 and 0.3~30 kV accelerating voltage under high vacuum (~10−6 mbar). Atomic force microscopy (AFM) measurements were carried out using a Asylum Research MFP 3D system in tapping mode. Spectrophotometer Cary 5000 of UV-VIS-NIR at atmospheric pressure and room temperature was used for to obtain the reflectance measurements as a function of wavelength. The cyclic voltammetry experiments (CV) were carried out through a potentiostat (Princeton Applied Research, PARSTAT 2263) using a Electrochemistry PowerSuite software for data collected. This system has 3-electrode cell with a platinum wire as the counter electrode, a Si/Al substrate as the working electrode, and an Ag/AgCl (3 MNaCl) reference electrode; a analog system reported by Bhattacharyya [31 ].
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4

Mott-Schottky Analysis of FTO Substrate

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The sample was mixed
with a small amount of water; then, the obtained paste was coated
on a fluorine-doped tin oxide (FTO) conductive substrate via a squeezing
method and dried in air at 60 °C. The Mott–Schottky plots
were recorded using an electrochemical analyzer (PARSTAT2263, Princeton
Applied Research). Electrochemical measurements were performed in
a three-electrode cell using a Pt wire counter electrode, a Ag/AgCl
reference electrode, and phosphate-buffered solution (0.1 M, pH =
6.0) with an amplitude of 10 mV and a frequency of 1 kHz.
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5

Nanocomposite Films Structural Analysis

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Field emission scanning electron microscope (FE-SEM, Hitachi, Model SU 8220, Tokyo, Japan) and high-resolution transmission electron microscope (HR-TEM, Tecnai G2-F20, FEI Company, Hillsboro, OR, USA) equipped with EDS PV9761 detector at the acceleration voltage of 200 kV were used to investigate the morphology and structural properties of the deposited nanocomposite films. The NPs in the films were analyzed by X-ray photoelectron spectroscopy (XPS) measurements with a PHI 5800 ESCA System (Physical Electronics) equipped with a hemispherical energy analyzer and the monochromatized Al X-ray source of 250 W. A potentiostat instrument (PARSTAT 2263, Princeton Applied Research, Oak Ridge, TN, USA) was used for the electrochemical measurements. The FTO glass electrode, platinum mesh, and Ag/AgCl were used as a working electrode, counter electrode, and reference electrode, respectively.
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