Jsm 5900 sem

Scanning electron micrographs were obtained in a JSM-5900 SEM (JSM-5900, JEOL, Tokyo, Japan) operating at 20 KV. Magnifications ranged from 100 to 3000x. Samples were sputter-coated with platinum (ion sputter, E-1020, Hitachi) for observation of the surface morphology. The chemical composition of the surface coating was analyzed with an energy dispersive spectroscope (EDX, Oxford) incorporated into the scanning electron microscope with an acquisition time of 2 min.

A scanning electron microscope (SEM)–electrochemical dispersive spectroscopy (EDS) investigation was carried out using the JSM 5900 SEM (JEOL, Tokyo, Japan) equipped with the X-ray-microanalysis Oxford-ISIS EDS (Oxford Instruments, Oxford, UK) that comprises the silicon (lithium) detector. The electron-beam voltage for the observation was between 5 kV and 20 kV and its current is between 0.01 nA and 10 nA. The samples were analyzed using the EDS instrument under a low vacuum, and with the working distance of 10 mm, the beam voltage of 20 kV, and the current of 0.25 nA.
Electron probe microanalysis (EPMA)–wavelength dispersive spectroscopy (WDS) maps were derived using the JXA 8800 R SUPER PROBE electron microprobe (JEOL, Tokyo, Japan) equipped with four spectrometers. The electron-beam voltage was 15 kV and the current was 40 nA. Cu, carbon, and oxygen maps were performed using the sample, and the maps were obtained with sets of 300 × 300 spots on areas of approximately 600 × 600 µm². In every map, each color represented the corresponding element, and every color was independent of the other colors.