Axis ultra dld x ray
The Axis Ultra-DLD X-ray is a high-performance analytical instrument that utilizes X-ray photoelectron spectroscopy (XPS) technology. It is designed to provide detailed information about the chemical composition and surface properties of a wide range of materials.
Lab products found in correlation
3 protocols using axis ultra dld x ray
Characterization of Hydrogel Fibers
Characterizing C/SL Material Properties
the material was characterized by QUANTA 200 scanning electron microscope.
The X-ray pattern of C/SL was measured by the TDF-3200 and Cu Kα
radiation source (k = 1.540598 Å). The diffraction
angle of 2θ was 5–80°, and the detection rate was
0.02° min–1. The composition of the sample
was characterized by Raman spectroscopy (Raman, ATC0400-UV). Fourier
transform infrared spectroscopy (FTIR) was used to study the surface
groups on the material surface. A Thermo Scientific spectrometer,
Nicolet 5700, was used with a resolution of 4 cm–1, a collection rate of 20 min–1, and a spectral
range of 4000–400 cm–1. The samples to be
tested and KBr were pressed in the ratio of 1:100. The elemental content
of the sample was characterized and analyzed with an element analyzer
(Perkinemer 2400II). XPS was performed on a Kratos Axis Ultra DLD
X-ray photoelectron spectrometer using monochromatic Al Kα (1486.6
eV) X-rays and an analytical chamber with a base pressure of 10–9
Torr. C/SL solution (0.1 mol L–1) was prepared from
aqueous solutions of HCl (0.10 mol L–1) and NaOH
(0.10 mol L–1) in the pH range of 4.0–10.0.
25.0 mL of aliquot of each solution and 0.2 g L–1 C/SL sample were added into the polypropylene bottle and shaken
for 24 h. The pH of the mixed solution was measured, and a graph of
ΔpH (pHlast–pHinitial) versus pH
initial was drawn. pHpzc represents the point where ΔpH
= 0.
Comprehensive Material Characterization Techniques
Scanning electron microscope (SEM) images were obtained on a FEI Helios 600 Nanolab Dual Beam System focused ion beam (FIB) equipped with an Oxford Instruments, INCA PentaFET-x3 X-ray detector with the electron beam set to 2 keV and a beam current of 0.69 nA.
XPS spectra were acquired by using a Kratos Axis Ultra DLD X-ray photoelectron spectrometer with a base pressure of 6 × 10–9 Torr, a monochromatic Al Kα X-ray source, and an analyzer pass energy of either 80 eV or 20 eV for survey and high resolution scans respectively.
X-ray diffraction were used to characterize the prepared NiO films. A Rigaku SmartLab was utilized which consisted of an X-ray source (3 kW Cu tube) and the detector – a 0D scintillation detector.
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