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S 5200 microscope

Manufactured by Hitachi
Sourced in Japan

The Hitachi S-5200 is a scanning electron microscope (SEM) designed for high-resolution imaging and analysis. It features a field-emission electron gun and advanced optics to provide detailed, high-quality images of a wide range of samples. The S-5200 is a versatile instrument suitable for applications in materials science, nanotechnology, and other fields requiring detailed surface characterization.

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4 protocols using s 5200 microscope

1

Microscopic and Adsorption Analysis of WO3/Ti Electrode

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Scanning electron microscopy (SEM) observation and energy dispersive X-ray spectroscopy (EDS) analysis were performed on a JSM-7800F microscope (JEOL, Japan). The electrode was directly deposited on carbon tape. High-magnification SEM observation was performed on S-5200 microscope (Hitachi, Japan) with an operating voltage of 5 kV. Before the high-magnification observation, the sample deposited on carbon tape was coated with gold using an E-1030 ion sputter coater (Hitachi, Japan).
Nitrogen adsorption isotherms were recorded at 77 K in the relative pressure range between 0.05 and 0.30 with a BELSORP-mini system (MicrotracBEL, Japan). Before the measurements, the electrode was outgassed at 473 K for 2 h. The Brunauer–Emmett–Teller (BET) equation was used to calculate the surface area of WO3/Ti fiber electrode. The BET specific surface area of the WO3 particles was estimated from the measured surface area of the electrode and the loading amount of the WO3 particles. The BET specific surface area of Ti microfibers was smaller than the measurement limit.
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2

Characterization of Polymer Properties

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The 1H nuclear magnetic resonance (NMR) measurements in deuterium chloroform (CDCl3) were performed on a Varian 400 MHz spectrometer and residual chloroform was used as an internal standard (7.26 ppm) for a chemical shift. A Shimadzu LC-20AD system equipped with a RID-10A detector and three directly connected TSKgel G6000H/G4000H/G2000H columns was used to conduct gel permeation chromatography (GPC). THF was used as the eluent at 40 °C with a flow rate of 1 mL min−1 and polystyrene standards were used for calibration. A Shimazu IR Affinity-1 spectrometer equipped with an attenuated total reflectance (ATR) unit was used to calculate Fourier transform infrared (FTIR) spectra. Thermogravimetric analysis (TGA) data were obtained using an SII EXSTAR TG-DTA6200 thermal analyzer at a heating rate of 10 °C min−1 under airflow of 100 mL min−1. Field emission scanning electron microscopy (FE-SEM) was performed on a Hitachi S-5200 microscope. The sample was coated with platinum by sputtering to prevent charging.
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3

Comprehensive Characterization of Catalytic Materials

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TPR experiments (ca. 45 mg of sample) were performed on a Micromeritics Autochem II within a temperature range of 60–900 °C (10 °C/min heating rate) under flowing (50 mL/min) 10%H2/Ar. The specific surface areas of the samples were obtained by adsorption–desorption of N2 at 77 K on a Micromeritics ASAP 2020 following the multi-point Brunauer–Emmett–Teller (BET) method. The samples were previously degassed at 300 °C under vacuum for 100 min. Powder XRD analyses were carried out on a Rigaku UltimaIV diffractometer employing CuKα radiation and a scanning rate of 2°/min. SEM observations were carried out on a Hitachi S5200 microscope, and samples were used without any further modification. Inductively coupled plasma atomic emission spectroscopy (ICP–AES) was used to determine the actual oxide content of the different samples. This measurement was made on a Varian Vista AX spectrometer, and samples were previously dissolved in 5 mL of aqua regia (HNO3:HCl, 1:3 in volume).
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4

Characterization of Upconversion Nanoparticles

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SEM imaging was carried out by dropping sample solutions onto the surface of silicon wafer. After drying, samples were observed using a Hitachi S-5200 microscope. For TEM observation, samples were dropped onto the carbon film of the copper grids and observed using a Hitachi H-7650 microscope. UV−vis absorption spectra were recorded using a Hitachi U-4100 spectrophotometer. FTIR spectra were collected in the wavelength range from 4000 to 500 cm−1 by a Thermo Fisher 4700 Fourier transform infrared spectrophotometer with the KBr method. Upconversion luminescence was measured using a HORIBA Jobin Yvon FluoroMax-4 spectrophotometer with a 980 nm diode laser at a power of 1 W cm−2 (Shanghai Laser & Optics Century Co. Ltd).
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