The Sn-content and strain of the GeSn stripes were estimated using micro-Raman scattering spectra and TEM. The micro-Raman measurements were performed using Raman instrumentation (LabRAM HR800, HORIBA Jobin Yvon) at room temperature, with a 488 nm line Ar + laser and a Si photodetector. The spot size of the laser on the sample was approximately 1.5 μm. Cross-sectional TEM specimens were prepared using a dual-beam focused ion beam (FIB) apparatus (FEI Helios Nanolab 600). STEM and TEM images were recorded using a transmission electron microscope (FEI Tecnai G2 F20 S-Twin). EDX and SAED under the TEM model were employed to study the chemical composition and the structure of the GSOI stripe.
Helios nanolab 600
Manufactured by Thermo Fisher Scientific
Sourced in United States, Germany
The Helios NanoLab 600 is a dual-beam focused ion beam (FIB) and scanning electron microscope (SEM) system designed for high-resolution imaging and nanoscale fabrication. It combines a gallium-based ion beam and an electron beam column to enable advanced sample preparation and analysis capabilities.
Automatically generated - may contain errors
Lab products found in correlation
S 4800, by Hitachi (3 mentions)
Lambda 1050, by PerkinElmer (2 mentions)
Xe 100, by Park Systems (2 mentions)
X max 50 mm2 detector, by Oxford Instruments (2 mentions)
Smartlab, by Rigaku (2 mentions)
Jem 2100f, by JEOL (2 mentions)
Tecnai g2 f20 s twin, by Thermo Fisher Scientific (1 mentions)
Labram hr800, by Horiba (1 mentions)
Digital micrograph software package, by Ametek (1 mentions)
Edx detector, by Oxford Instruments (1 mentions)
Xl30 feg, by Thermo Fisher Scientific (1 mentions)
Tecnai f20, by Thermo Fisher Scientific (1 mentions)
Tecnai g2 20 twin, by Thermo Fisher Scientific (1 mentions)
Quanta 450 feg, by Thermo Fisher Scientific (1 mentions)
Pyris 1, by PerkinElmer (1 mentions)
Spectrum 100, by PerkinElmer (1 mentions)
Leap 4000x hr, by Cameca (1 mentions)
Tecnai g2 30, by Thermo Fisher Scientific (1 mentions)
Ultrasonic processor up200st, by Hielscher (1 mentions)
Em ace600, by Leica camera (1 mentions)
42 protocols using helios nanolab 600
1
Structural Analysis of GeSn Stripes
2
Characterization of SG Metal Grid Transparent Conductive Electrodes for OLEDs
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The SG metal grid TCs were imaged using field-emission SEM (S-4800, Hitachi). Cross-sectional profiles of the SG metal grid TCs were measured using FIB-SEM (Helios Nanolab 600, FEI), and the surface roughness of the SG metal grid TCs was measured using AFM (XE-100, Park Systems). The transmittance spectra were measured using a UV-VIS-NIR spectrophotometer (Lambda 1050, Perkin-Elmer). The Rs of the SG metal grid TCs was measured using the two-terminal method and four-point probe method (4200-SCS, Keithley). Two electrodes between the metal grids, separated by a square area (25 mm2), were fabricated using conductive pens of CW2200MTP and CW2900 (ITW Chemtronics). The electro-luminance characteristics of OLEDs were measured using a source meter (2400, Keithley), a fiber-optic spectrometer (EPP2000, StellarNet) and a calibrated Si-photodiode (FDS-100, Thorlab) in N2-filled glove box. The motorized goniometric system was used to characterize angular electroluminescence profile of OLEDs. The cyclic bending test of OLEDs was performed using a custom-made bending tester that can control the number of cycles and a bending radius.
3
Characterization of Boron Nanostructures
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Scanning electron microscope (SEM) observations as well as TEM analyses (energy-dispersive X-ray spectroscopy and EFTEM) were also performed on the 209-day sample to confirm our results. For the TEM study, a thin film of ~100-nm thick was prepared with a dual beam SEM/FIB microscope (FEI Helios NanoLab 600) following the method described in ref. 60 . EFTEM boron images were acquired with a TEM FEI Titan 80–300 Cs operating at 200 kV under the following conditions: acquisition time 10 s per image, energy window width 20 eV and a bining of 2 × 2, giving 1,024 × 1,024 pixel images. Images were processed with Gatan’s Digital Micrograph software package. The three-window technique was used to obtain boron elemental maps61 . The B profile was calculated with the ImageJ software.
4
Grain Size and Composition Analysis of FeMn Alloy
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Surface images of the samples were optically evaluated in order to determine the grain sizes of the different annealing states. To reveal the grains, focused ion beam (FIB) etching was used to prepare the sample surface. Also, the imaging was done using an FIB to get an additional orientation contrast of the grains due to ion channeling effects. Furthermore, images of the fracture area of the tensile test samples were made after the measurement to estimate the fracture behavior. EDX analyses were used to determine the composition of the sputtered foils. To determine the compositional homogeneity, an elemental mapping was done over an entire 4-inch wafer, coated with a 10 µm thick FeMn film. The measurements were done on a Helios NanoLab 600 (FEI, Frankfurt, Germany) and an EDX detector (Oxford instruments, Abingdon, UK).
5
Fabrication and Characterization of Metal Grid Transparent Conductors
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The images of the metal grid TCs were measured using field-emission SEM (S-4800, Hitachi). Cross-sectional images of the metal grid TCs were measured using FIB-SEM (Helios Nanolab 600, FEI), and the surface roughness of the flexible metal grid TCs was measured using AFM (XE-100, Park Systems). The transmittance spectra were measured using a UV-VIS-NIR spectrophotometer (Lambda 1050, Perkin-Elmer). The Rs of the metal grid TCs was measured using the two-terminal method and four-point probe method (4200-SCS, Keithley)38 (link). Two electrodes between the metal grids, separated by a square area (25 mm2), were fabricated using conductive pens (CW2200MTP and CW2900, ITW Chemtronics).
6
Exfoliated α-MoO3 Slab Patterning
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Thin α-MoO3 slabs were prepared by mechanically exfoliating bulk crystals45 (link). PoCs were fabricated in a large-area α-MoO3 slab using a focused ion beam microscope (FEI Helios Nanolab 600) with an electron source that is capable of capturing high-resolution scanning electron microscopy images for device quality check right after patterning. A 28 pA patterning current (gallium ions) was selected with 30 kV accelerating voltage to minimize any potential damage to the functional areas in the α-MoO3 slab with an optimized period of total milling time. Note that the PoCs were etched through α-MoO3 slabs precisely to minimize overmilling and the redeposition effect by calibrating a test sample first.
7
Nano Disc Surface Characterization
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ABT and Nano discs were examined using a Helios Nanolab 600 (FEI Company, Hillsboro, OR, USA) at the electron microscopy laboratory of the Roma Tre University (LIME, Rome, Italy). Nano samples presenting a saline coating were observed both unprocessed and after salt removal by solubilization in distilled water and subsequent drying, in order to visualize both the titanium surface and the salt coating. Disc surfaces were scanned by detecting secondary electrons with an operating voltage of 5 kV and an applied current ranging from 0.86 pA to 0.34 nA. In order to analyze the topographical features on the meso-, micro- and nanoscale, the samples were inspected at different magnifications, varying from 1000× (horizontal field of view of 298 μm) to 500,000× (horizontal field of view of 597 nm). For each disc, micrographs were acquired in randomly selected regions of the sample surface (excluding areas that were clearly non-commensurable) [33 ].
8
Nanostructure Imaging of Hemp Shiv
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Photomicrographs of coated and uncoated hemp shiv samples were captured using a dual beam focused ion beam (FIB) system model FEI Helios NanoLab 600. This system is equipped with an extremely high resolution Elstar scanning electron microscopy (SEM) column and a fine-probe ion source. A high beam current of gallium ions was used for site specific sputtering and milling to prepare a specific area within the sample. All the samples were gold coated using an Edwards Scancoat Gold Sputter Coater. A further layer of platinum was deposited on the areas where higher beam current of gallium ions was used.
9
Conductive Fiber Characterization
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PPy/DBS films and MWCNT-CDC fibers were examined by scanning electron microscopy (Helios NanoLab 600, FEI, Hillsboro, OR, USA). The electrical conductivity of the fibers was measured by a simple two-point probe method.
10
Reduction of Nano-Anode Functional Layers
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The prepared anode supports or NiO–BZY nano-AFLs deposited on them were placed in a tube furnace under the flow of 4% H2–Ar at 650 °C for 10 h to investigate the morphology changes of nano-AFLs resulting from reduction. SEM (XL-30 FEG, FEI) was utilized to observe morphologies of the anode surface and the full cell surface and cross-section. To investigate in-depth microstructure crystallinity of the thin BZY electrolyte and its near anode and cathode grains, TEM (Tecnai F20, FEI) was used. Focused ion beam (Helios NanoLab 600, FEI) was used to prepare the TEM sample.
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