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Axis ultra instrument

Manufactured by Shimadzu
Sourced in United Kingdom, Japan

The AXIS Ultra is a high-performance X-ray photoelectron spectroscopy (XPS) instrument designed for surface analysis. It provides detailed information about the elemental composition, chemical state, and electronic structure of a material's surface and near-surface region. The instrument's core function is to analyze the photoelectrons emitted from a sample surface when exposed to X-rays, enabling researchers to obtain quantitative and qualitative data about the sample.

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10 protocols using axis ultra instrument

1

X-ray Photoelectron Spectroscopy Analysis

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According to the procedures
reported previously,22 (link) the X-ray photoelectron
spectroscopy (XPS) was performed using an AXIS-ULTRA instrument fitted
with a delay-line detector and a monochromated Al Kα line (0.8339
nm, 1.486 keV) operating at 10 kV and 13 mA (Shimadzu Corp., Kyoto,
Japan).
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2

X-ray Photoelectron Spectroscopy Characterization

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According to previously reported procedures [14, 15] , X-ray photoelectron spectroscopy (XPS) was performed using an AXIS-ULTRA instrument fitted with a delay-line detector and a monochromated Al Kα line (0.8339 nm, 1.486 keV) operating at 10 kV and 13 mA (Shimadzu Corp., Kyoto, Japan).
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3

Comprehensive Materials Characterization Protocol

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The morphology of the samples was examined by using scanning electron microscopy (SEM, Hitachi S4800) with an accelerating voltage of 10 kV. The transmission electron microscopy (TEM) images were recorded on a JEOL JEM-2010EX transmission electron microscope with an accelerating voltage of 200 kV. The Fourier transform infrared (FT-IR) spectra were collected within the 400–4000 cm−1 spectral range on a Thermo Fisher Nicolet-6700 spectrometer. The X-ray powder diffraction (XRD) patterns from 5° to 80° were taken on a D8 Focus diffractometer (Bruker) with Cu target (40 kV, 40 mA). The X-ray photoelectron spectra (XPS) were obtained on an AXIS Ultra instrument from Kratos Analytical. The nitrogen adsorption–desorption isotherms were collected using a Micromeritics ASAP 2020 instrument. The specific surface areas were calculated using the Brunauer–Emmett–Teller (BET) method, and the pore size distributions were evaluated using the Barrett–Joyner–Halenda (BJH) model. The thermogravimetric analyses (TGA) were carried out using a TG/SDTQ600 instrument in atmosphere within temperature range of 0–900 K. The ultraviolet-visible (UV-vis) spectroscopy measurements were carried out with a UV-3600 UV-vis spectrophotometer (Shimadzu).
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4

Comprehensive Characterization of Graphene Oxide

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GO was characterized by transmission electron microscopy (TEM, JEM-200CX, JEOL, Japan), AFM (SPM-9600, Shimadzu, Japan), and Raman spectroscopy (Renishaw Invia Plus laser Raman spectrometer, Renishaw, UK). Zeta potential analyzed by the Nano Zetasizer using a dynamic light scattering (DLS) technique. To perform AFM measurement, a few drops of the GO suspension was pipetted on Si substrates, and then the substrates were air-dried and placed under the AFM tip for morphology analysis. Elemental composition analysis was carried out by XPS (AXIS Ultra instrument, Kratos, UK).
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5

Characterization of BiVO4-n Electrodes

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The surface characteristics of the BiVO4-n electrodes were investigated by field-emission scanning electron microscopy (FESEM, Zeiss Merlin, Germany). Surface roughness analysis was carried out by atomic force microscopy (AFM, Agilent 5400SPM, Agilent Technologies, USA), at scan areas of 2.0 × 2.0 μm and 5.0 × 5.0 μm for all samples. Powdered X-ray diffraction (XRD, Bruker D8 Advance diffractometer, USA, using Cu Kα radiation, λ = 1.5418 Å) was used to characterize the crystallinity of the samples. All samples were analyzed by XRD in the range of 15–70° at a scan rate of 0.5° min−1; the crystal sizes of the BiVO4-n were estimated with the Scherrer formula.32 (link) The diffuse reflectance UV-Vis absorption spectra of the samples were recorded with a spectrophotometer (UV 2550, Shimadzu, Japan), with fine BaSO4 powder as a reference. In thermal gravimetric analysis (TGA, NETZSCH, Germany),100 μL precursor was vacuum-dried for 5 h prior to the measurements. X-ray photoelectron spectroscopy (XPS) results were collected by an Axis Ultra instrument (Kratos Analytical) under ultrahigh vacuum (<10−8 torr) and by using a monochromatic Al Kα X-ray source. The adventitious carbon 1s peak was calibrated at 285 eV and used as an internal standard to compensate for any charging effects.
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6

XPS Analysis of Cement-Graphene Oxide

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For the XPS measurement, the same concentrations (750 mg/L) of GO/CFGOs aqueous dispersion were prepared. Then, 0.09 g cement and 60 g GO/CFGOs aqueous dispersion was added into a beaker flask. For the pure cement sample, 0.09 g cement was added in 60 g water. The mixture was vibrated in the oven-controlled crystal oscillator at room temperature for 5 h. Finally, the mixture was vacuum filtered. The filter cake can be used to test the adsorption layer thickness of GO/CFGOs on the surface of cement. The XPS analysis was carried out on an AXIS–Ultra instrument from Kratos Analytical (Manchester, UK) using monochromatic Al Ka radiation (225 W, 15 mA, 15 kV) and low–energy electron flooding for charge compensation. To compensate for surface charges effects, binding energies were calibrated using C1s hydrocarbon peak at 284.80 eV.
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7

Characterization of Perovskite Solar Cells

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The surface morphology of the perovskite film and section morphology of the PSC was characterized using a field emission scanning electron microscope (FESEM, Quanta 200 FEG, FEI Co.). The time-resolved (PL) spectra were acquired using a FLS920 spectrometer from Edinburgh Instruments. The current density–voltage (JV) curves were measured (2400 Series Source Meter, Keithley Instruments) under simulated air mass 1.5 global sunlight (AM 1.5G). The external quantum efficiency (EQE) measurement was performed through a combination system of xenon lamp, monochromator, chopper and lock-in amplifier together with a calibrated silicon photodetector. UV-Vis absorption measurements of the CeOx film were carried out in a Shimadzu UV-2550 spectrometer. The X-ray photoelectron spectroscopy (XPS) measurement was performed using an AXIS Ultra instrument (Kratos UK) at a base pressure of ∼10–8 torr at 295 K.
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8

X-ray Photoelectron Spectroscopy Protocol

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X-ray photoelectron
spectroscopy (XPS) measurements were carried out using a Kratos AXIS
ULTRA instrument with a monochromatic Al Kα X-ray source (1486.6
eV) at 12 kV anode potential (120 W) and 10 mA emission current.
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9

Structural and Chemical Analysis of ZnO

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The microtubes were grounded to powder for XRD and XPS analyses. In addition, a standard undoped n-type ZnO substrate was employed as the control sample for the XPS analysis. The XRD used Cu-Kα1 (λ = 1.5418 Å) radiation generated at 36 KV/20 mA at a scanning speed of 0.02° min−1 in the range of 20°–80°. The XRD date was indexed by hexagonal wurtzite-type ZnO (JCPDS No. 80-0074). The XPS data were acquired by an AXIS-Ultra instrument from Kratos Analytical with monochromatic Al Kα radiation (225 W, 15 mA, and 15 KV) and low-energy electron flooding for charge compensation. In order to compensate to surface charges, binding energies were calibrated using C1s hydrocarbon peak at 284.80 eV.
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10

Comprehensive Material Characterization

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The morphologies electrodes were characterized by scanning electron microscopy (SEM, FEI, Quanta 600). The crystalline structure of the samples was analyzed by X-ray diffraction (XRD) (Bruker D8 Discover diffractometer, using Cu Kα radiation (1.540598 Å)). The chemical compositions and status were analyzed by X-ray Photoelectron Spectroscopy (XPS) with an Axis Ultra instrument (Kratos Analytical) under ultrahigh vacuum (<10−8 torr) and by using a monochromatic Al Kα X-ray source. The adventitious carbon 1 s peak was calibrated at 284.8 eV and used as an internal standard to compensate for any charging effects.
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