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1

Characterization of Graphite, Graphene Oxide, and Thermally Exfoliated Graphene Oxide

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Example 3

XRD patterns of graphite, GO, and TEGO were recorded in a Rigaku MiniFlex diffractometer with Cu Ku radiation. Initial, final and step angles were 5, 30 and 0.02, respectively. The surface area of TEGO was measured by nitrogen adsorption at 77K using a Micromeritics FlowSorb apparatus with a mixture of N2 and He 30/70 by volume as the carrier gas. High-resolution XPS spectra were obtained using an Omicron ESCA Probe (Germany). Samples were de-gassed overnight within the XPS chamber (10-3 mbar) prior to analysis of the sample. Data were collected using 15 kV and 20 mA power at 10-9 mbar vacuum. The raw XPS data were analyzed to determine peak locations and areas in relation to specific binding energies that best fit the experimental data. The main C—C peak (C1s) at 284.6 eV was observed. An additional photoemission present at higher binding energy peaks at 286.1 eV represented —C—O— or C—O—C bonding.

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Determining the Physical Form of Onapristone

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Physical Form of Onapristone Compound

The physical form of onapristone, either as the bulk drug substance or in its compositions, was established using X-ray powder diffraction (XRPD). XRPD patterns were obtained using a Rigaku MiniFlex powder diffraction system, equipped with a horizontal goniometer operating in the θ/2θ mode. The X-ray source was nickel-filtered Kα emission of copper (1.54184 Å). Samples were packed into the sample holder using a back-fill procedure, and were scanned over the range of 3.5 to 40 degrees 2θ at a scan rate of 0.5 degrees 2θ/min. Using a data acquisition rate of 1 point per second, these scanning parameters equate to a step size of 0.0084 degrees 2θ. Calibration of the diffractometer system was effected using purified talc as a reference material. The intensity scale for all diffraction patterns was normalized so that the relative intensity of the most intense peak in the pattern equaled 100%.

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PXRD Analysis of Crystalline Samples

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PXRD patterns were measured using a diffractometer (MiniFlex, Rigaku, Japan) with a heat stage and CuKα (λ = 1.54059 Å). Cooling of the samples was performed outside the diffractometer using a cool plate (SCP-85, AS ONE, Japan). Preparation of the mixed system was conducted in the same method as described above.
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4

Failure Mode Analysis of Zirconia Composites

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To determine the failure mode, the fractured surfaces of the specimens were observed at 32× magnification using a stereoscopic microscope (Stemi DV4, Carl Zeiss, MicroImaging, Göttingen, Germany). The failure modes were categorized as follows: (A) adhesive failure at the zirconia/composite resin interface, (B) combination of adhesive failure at the zirconia/composite resin interface and cohesive failure within the composite resin, (C) adhesive failure at the zirconia/glazed layer interface, (D) combination of adhesive failure at the zirconia/ glazed layer interface and cohesive failure within the glazed layer, (E) adhesive failure at the glazed layer/ composite resin interface, (F) combination of adhesive failure at the glazed layer/composite resin interface and cohesive failure within the glazed layer, (G) combination of adhesive failure at the glazed layer/composite resin interface and cohesive failure within the composite resin, and (H) cohesive failure within the composite resin (Fig. 2). Representative specimens were sputter-coated with osmium (HPC-IS, Vacuum Device, Mito, Japan) and imaged by scanning electron microscope (SEM; S-4300, Hitachi High-Technologies, Tokyo, Japan). The representative specimens were also analyzed using an X-ray diffractometer (Miniflex, Rigaku, Tokyo, Japan) with Cu Kα radiation by scanning over the diffraction angle (2θ) range of 3°-90°.
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5

Comprehensive Material Characterization Protocol

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Chemical composition analysis and observation of metallographic structures were performed using plate specimens prepared in the same manner as the preparation of the specimens for the immersion tests. Chemical composition analysis was performed by fluorescent X-ray analysis (XRF) and X-ray diffraction (XRD). XRF was performed with a fluorescent X-ray analyzer (DELTA Professional, OLYMPUS, Tokyo, Japan). XRD was performed using a desktop X-ray diffractometer (MiniFlex, Rigaku, Tokyo, Japan). Surface structure was observed using a digital microscope (VHX-2000, KEYENCE, Osaka, Japan). The observation was performed on three patterns: as sintered, after polishing, and after etching (acidic solution (nitric acid:hydrofluoric acid:water = 4 1:5) was used for etching).
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6

Characterization of Lactose Carrier Formulations

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Corse lactose carriers, BDP and SDP powder formulations (F1 –F10) were studied via X-ray diffraction (XRD) (Rigaku Miniflex, Rigaku Ltd., Japan) using a diffracted beam monochromator with Cu-Kα (λ = 0.154nm). Each sample was loaded onto a silicon standard sample holder and the intensity of diffraction was recorded at an angle of two theta between the angular ranges of 5–55° using a scan rate of 2°/min. The experiments were conducted using a power of 30 kV voltage and 15 mA current. The scan peaks from individual lactose carriers, BDP and powder formulations were examined and compared with respect to their amorphous and crystalline form.
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7

X-ray Diffraction Analysis of Nanoparticle Crystallinity

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XRD is carried out to pinpoint the crystallinity of the NPs coated with SA. The powder XRD scans are performed using a MiniFlex automated X-ray diffractometer (Rigaku, The Woodlands, TX) at room temperature. Ni-filtered Cu K-alpha radiation is used at 30 kV and 15 mA. The diffraction angle is covered from 2Ɵ = 5° to 2Ɵ ° = 60° with a step size of 0.05° /step, and a count time of 2.5 s/step (effectively 1.1° /min for approximately 46 minutes/scan). The diffraction patterns are processed using Jade 8+ software (Materials Data, Inc., Livermore, CA). The relatives intensities of the diffracted beams which are directed by the position of atoms can be estimated using the following equations (14 ):
I=|F|2p(1+cos22sin2cos) where, F is defined as follows,
F=iNfne2πi(hun+kvn+Iwn) where, I = relative intensities of the diffracted beams, F = Structure factor for hkl reflection in terms of atom position in 3 dimensions with defined coordinates (u, v, w), Ɵ = Bragg angle, and p = the multiplicity factor.
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8

Characterization of MGA and SMGA

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The structures, morphologies, and elemental mappings of MGA, SMGA were investigated by a transmission electron microscope (TEM, Titan G260-300) at an accelerating voltage of 200 kV, a scanning electron microscope (SEM, Hitachi S4800), X-ray photoelectron spectrometer (XPS, AXIS SUPRA), X-ray diffraction instrument (XRD, Rigaku MiniFlex) using Ni-filtered Cu Kα radiation at a scan rate of 10° min−1, a Raman spectrometer (invia-reflex with 532 nm wavelength laser). The Zeta potentials of Ti3C2Tx, GO, Ti3C2Tx/GO, Ti3C2Tx/GO&APTES solution were tested using a zeta potential analyzer (Zetasizer Nano ZSP). The specific surface areas were tested using a Micromeritics ASAP2460 based on the Brunauer–Emmett–Teller (BET) method.
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9

Characterization of Phyto-Mediated Nano-Hybrids

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The synthesized nano-hybrid particles were characterized using UV-visible spectroscopy and maximum absorbance was recorded. The sample was subjected to vacuum pressure to remove the water content. The dried sample was layered onto the grid and morphological characteristic of nano-hybrid particles were studied with TEM model Zeiss Libra 120 PLUS. The instrument was equipped with TRS camera at Dual speed 220-V 50–60-Hz operating with Program—Olympus iTEM. The nano-hybrid particles were recorded and measured to obtain average size. The possible role of phyto-components to mediate the synthesis of nano-hybrid particles was studied using Fourier transform infrared spectroscopy (FTIR) analysis recorded on Shimadzu IRAffinity-1 spectrometer. The crystalline nature was determined using X-ray diffraction (XRD) analysis out according to the protocol described by Baker et al. [6 (link)], wherein the dried sample was coated on the XRD grid and spectra were recorded with Rigaku Miniflex operating at 30-kV voltage. The spectral scan was performed between 0 and 80° at 2 theta angle.
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10

Microstructural Characterization of Sintered Specimens

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Chemical composition analyses were performed via X-ray diffraction (XRD), with Cu Kα radiation at 30 kV and 15 mA, and X-ray fluorescence (XRF) analysis. XRD analysis was performed on the sintered specimens along each building direction using a desktop X-ray diffractometer (MiniFlex, Rigaku, Tokyo, Japan) (n = 6). XRF was performed using a fluorescent X-ray analyzer (DELTA Professional, OLYMPUS, Tokyo, Japan). The microstructures were observed via scanning electron microscopy (SEM) (JSM-IT200, JEOL, Tokyo, Japan) at an accelerating voltage of 15.0 kV, after sputter-coating the specimens with platinum under an argon gas environment using a sputter-coater machine (E-1030, Hitachi, Tokyo, Japan).
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