Axs d8 advance
The AXS D8 Advance is a versatile X-ray diffractometer designed for a wide range of applications. It features a high-intensity X-ray source and advanced optics to deliver precise and reliable data for materials analysis. The instrument is capable of performing a variety of measurements, including phase identification, crystal structure determination, and quantitative analysis. The AXS D8 Advance is a reliable and flexible tool for researchers and scientists working in materials science, geology, and other related fields.
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316 protocols using axs d8 advance
Structural and Elemental Analysis of LNMO Materials
Multifaceted Characterization of Novel Materials
Nanostructure Characterization: Microscopy and Diffraction
Morphology and cell interaction investigations were carried out using a Zeiss Auriga FE-SEM available at SNN-Lab, operated at different accelerating voltages (varying between 2 and 5 keV) depending on the sample type.
The chemical elemental composition was investigated by EDX analysis equipped together with FE-SEM (Auriga, Zeiss, Oberkochen, Germany), and operated at 17 keV.
The crystalline structure and phase purity analysis was performed by X-ray diffraction using a Bruker (AXS D8-Advance) X-ray powder diffractometer equipped with incident-beam focusing X-ray mirrors and a position sensitive detector (Bruker AXS GmbH, Karlsruhe, Germany). Data were measured at room temperature, in transmission mode, using Cu Kα radiation (λ = 1.5418 Å, 40 kV at 40 mA), in a 2θ angular range ranging from 20° to 140° with a step size of 0.022° and 1 s of counting time. Samples were prepared as capillary mounts. Data were evaluated by the Rietveld method using Topas software [54 ].
Characterization of Metal-Organic Framework Samples
Infrared (IR) spectra were measured in transmission mode using Tensor 27 FTIR spectrometer (Bruker, Germany) equipped with an MCT (Mercury-Cadmium-Telluride) detector at spectral resolution of 2 cm−1. Before measurement a sample was deposited on an IR-transparent silicon wafer (pure for electronic purposes) by placing its ethanol solution directly on the disc and evaporating the solvent. The wafer was placed in an IR cell with KBr windows and slowly heated under constant pumping (10−3 Torr) to 50°C (with the drug present) or 100°C (pure MOF).
Scanning Electron Microscopy (SEM) analysis was performed using Nova Nano SEM 200 (FEI Europe B.V.) cooperating with the Element Energy Dispersive Spectroscopy (EDS) analyzer (EDAX Inc., U.S.A.) using secondary electrons in low vacuum conditions (60 Pa). Samples of MOF without treatment, MOF after milling and MOF after milling and sonication were analyzed.
The particle size distribution of the powder samples was measured in terms of particle diameter at 50% in the cumulative distribution (Dx (38 (link))) using laser diffraction particle size analyzer Mastersizer 3000 (Malvern Instruments Ltd., United Kingdom).
Structural and Optical Characterization of Materials
The luminescence characteristics (excitation, emission spectra, luminescence decays) of the prepared samples were measured on a QuantaMasterTM 40 spectrophotometer equipped with an Opolette 355LD UVDM tunable laser, with a repetition rate of 20 Hz and a Hamamatsu R928 photomultiplier used as a detector for emission/excitation spectra and decay time measurements. A continuous Dragon Lasers DPSS 980 nm laser was used as the excitation source, coupled to a 200 µm optical fibre and collimator to determine dependencies between emission intensity and laser power.
Variable Temperature PXRD Analysis
High-Temperature XRD Analysis of Ti3O5 Powder
Characterization of Porous Materials
XRD measurements were performed using a Bruker AXS D8 Advance diffractometer (Bruker, Karlsruhe, Germany) with Cu Kα radiation (λ = 0.154 nm) at a step of 0.05° s−1.
Elemental analyses of the solids were carried out with Elementar Analyser Vario EL III (Elementar Analysensysteme GmbH, Hanau, Germany).
UV-VIS spectra were recorded using a Varian-Cary 300 Scan UV-Visible Spectrophotometer (Candela, Warszawa, Poland)
X-ray Diffraction Analysis of Films
Comprehensive Characterization of Catalysts
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