TEM images were recorded using a JEOL 2100F microscope equipped with a high‐resolution objective lens pole piece at 200 kV. The tomography series were acquired between tilting angles of ±70° with a 2° Saxton scheme, and the subsequent series alignments were performed with the IMOD software using Au nanoparticles (5–7 nm) as fiducial markers. To resolve details at maximum resolution the SIRT algorithm implemented in fast software running on multicore computers, Tomo3D was used. The size of the TEM projections used for the reconstruction was 2k × 2k pixels.
2100f microscope
Manufactured by JEOL
Sourced in Japan
The JEOL 2100F is a high-resolution transmission electron microscope (TEM) designed for advanced materials characterization. It features a field emission gun (FEG) electron source and can achieve a maximum accelerating voltage of 200 kV. The microscope is capable of providing high-resolution imaging and analytical capabilities for a wide range of samples.
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Lab products found in correlation
Inca x sight, by Oxford Instruments (4 mentions)
Optima 2100 dv instrument, by PerkinElmer (4 mentions)
Texture analysis d8 advance diffractometer, by Bruker (3 mentions)
Tm 1000 microscope, by Hitachi (3 mentions)
S 4800, by Hitachi (2 mentions)
S 4800 microscope, by Hitachi (2 mentions)
Digital micrograph, by Ametek (2 mentions)
Tridiem imaging filter, by Ametek (2 mentions)
Us4000 ccd camera, by Ametek (2 mentions)
V 730 spectrophotometer, by Jasco (2 mentions)
Axis ultra xps, by Shimadzu (2 mentions)
Ultima 4, by Rigaku (2 mentions)
Jsm 6700f microscope, by JEOL (1 mentions)
D2 phaser system, by Bruker (1 mentions)
Pips 2, by Ametek (1 mentions)
Microscopy suite software, by Ametek (1 mentions)
E500 spectrometer, by Bruker (1 mentions)
Akta pure fplc system, by GE Healthcare (1 mentions)
Akta pure, by Cytiva (1 mentions)
Zetasizer zs90, by Malvern Panalytical (1 mentions)
61 protocols using 2100f microscope
1
TEM Tomography with High-Resolution Imaging
2
Characterization of Ag/Ag2S/CdS Heterostructures
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The Ag/Ag2S/CdS heterostructures were characterized using various techniques such as X-ray diffraction (XRD) with a Bruker D2 phaser system (Billerica, MA, USA), field-emission scanning electron microscopy (FESEM) with a JEOL JSM 6700F microscope (Tokyo, Japan), field-emission transmission electron microscopy (FETEM) with a JEOL 2100F microscope (Tokyo, Japan), X-ray photoelectron spectroscopy (XPS) with a ULVAC-PHI PHI 5000 Versaprobe II system (Chigasaki, Japan), photoluminescence spectroscopy (PL) with an MRI532S instrument from Protrustech (Tainan, Taiwan), and UV–vis spectrophotometry with a U-2900 instrument from Hitachi (Tokyo, Japan). These techniques were employed to study the crystal structure, morphology, microstructures, chemical composition, and optical properties of the Ag/Ag2S/CdS heterostructures.
3
Scanning Transmission Electron Microscopy
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Scanning transmission electron microscopy was carried out using a JEOL 2100F microscope at 200 kV. Sample preparation was carried out by mechanical polishing and ion milling on a Gatan PIPS II. Collected high-angle annular dark field (HAADF) images were treated and Fourier-filtered using the Gatan Microscopy Suite software.
4
Comprehensive Material Characterization Protocol
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TEM/high-resolution images were obtained using a JEOL 2100F microscope at an acceleration voltage of 200 kV. AC HAADF-STEM micrographs were obtained on the JEM-ARM 200F STEM fitted with a double aberration-corrector at 200 kV with a cold filed-emission gun. XPS spectra were analyzed to identify the surface chemical composition and electron structure, which was measured by an ESCSLAB 250Xi spectrometer with Al Kα-source radiation (1486.6 eV). FTIR spectra were recorded by a NEXUS 670 spectrometer to analyze the functional groups on the samples. UV–vis DRS spectra were acquired on a SPECORD 200 ultraviolet spectrophotometer. PL spectra were obtained on a FluoroMax-4 fluorescent spectrometer at room temperature and time-resolved PL spectra were conducted on a FluoroCube-TCSPC fluorescence lifetime spectrometer. The VB energy level of the samples was recorded on an ESCSLAB 250Xi spectrometer (UPS) equipped with a He I light source with the photon energy of 21.22 eV. ICP-OES was conducted using an axial view inductively coupled plasma spectrometer. EPR spectra of the hydrogen radicals were investigated using X band on a Bruker E500 spectrometer. The crystal structure of the as-synthesized products was characterized by XRD (X pert pro MPD) with Cu Kα radiation at 40 kV, 40 mA.
5
Nanoparticle Characterization by DLS, TEM, and SEC
6
Characterization of Nanomaterial Compositions
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Inductively coupled plasma-optical emission spectrometry (ICP-OES) was performed on an OPTIMA 2100 DV instrument (PerkinElmer, Waltham, MA, USA). X-Ray diffraction (XRD) patterns were obtained using a Texture Analysis D8 Advance Diffractometer (Bruker, Billerica, MA, USA) with Cu Kα radiation. The TEM and HRTEM images were obtained on a 2100F microscope (JEOL, Tokyo, Japan) equipped with an EDX detector INCA x-sight (Oxford Instruments, Abingdon, UK).
7
Nanoparticle Characterization via Advanced Microscopy
8
Characterization of Nanomaterials by Advanced Microscopy and Spectroscopy
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Scanning electron microscopy (SEM) images were recorded using a field emission scanning electron microscope (FESEM, Hitachi S-4800). Transmission electron microscopy (TEM) and high-resolution TEM (HRTEM) images were taken on a JEOL-2100F microscope. X-ray photoelectron spectroscopy (XPS, Kratos Axis Ultra DLD) was employed to determine the chemical composition and element states. The powder X-ray diffraction (XRD) experiments were carried out with a high resolution X-ray diffraction system using Cu Kα radiation (λ = 0.15406 nm). Raman spectra were recorded on a Renishaw-2000 Raman spectrometer using the 514.5 nm line of an Argon ion laser.
9
Comprehensive Nanomaterial Characterization Protocol
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Transmission electron microscopy
(TEM) at lower resolution was performed with an FEI Morgagni microscope
at an accelerating voltage of 80 kV. High-resolution TEM was performed
on a JEOL 2100F microscope with 200 kV accelerating voltage. Samples
were drop-casted on a lacey carbon TEM grid. The cell samples were
first subjected to a protease k digest. Raman spectra were taken on
a Renishaw inVia Raman microscope with an excitation wavelength of
633 nm at 50% laser intensity and 10 s exposure time unless noted
otherwise. X-ray photoelectron spectroscopy (XPS) was performed on
a Thermo Scientific K-Alpha using monochromated Al Kα X-rays
as the source. UV–vis spectroscopy was carried out on a PerkinElmer
Lambda 900 spectrometer. Energy-dispersive X-ray (EDX) spectroscopy
was performed on a Phillips XL30 FEG microscope equipped with an EDAX
assembly. Dynamic light scattering (DLS) was performed using a quasi-elastic
light scattering spectrometer (Brookhaven 90 Plus Particle Size Analyzer).
(TEM) at lower resolution was performed with an FEI Morgagni microscope
at an accelerating voltage of 80 kV. High-resolution TEM was performed
on a JEOL 2100F microscope with 200 kV accelerating voltage. Samples
were drop-casted on a lacey carbon TEM grid. The cell samples were
first subjected to a protease k digest. Raman spectra were taken on
a Renishaw inVia Raman microscope with an excitation wavelength of
633 nm at 50% laser intensity and 10 s exposure time unless noted
otherwise. X-ray photoelectron spectroscopy (XPS) was performed on
a Thermo Scientific K-Alpha using monochromated Al Kα X-rays
as the source. UV–vis spectroscopy was carried out on a PerkinElmer
Lambda 900 spectrometer. Energy-dispersive X-ray (EDX) spectroscopy
was performed on a Phillips XL30 FEG microscope equipped with an EDAX
assembly. Dynamic light scattering (DLS) was performed using a quasi-elastic
light scattering spectrometer (Brookhaven 90 Plus Particle Size Analyzer).
10
Multimodal Nanomaterial Characterization
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TEM and HRTEM were conducted on a Tecnai G2 F30 S-Twin electron microscope operated at 300 kV. HAADF-STEM images and energy-dispersive x-ray (EDX) mappings were taken on a JEOL 2100F microscope. SEM images were recorded on a Hitachi S4800 microscope. Powder XRD was performed on an X’Pert PRO diffractometer with Cu Kα radiation (PANalytical). Small-angle x-ray scattering (SAXS) measurements (Rigaku NANO-Viewer) were used to evaluate the textural information on the nanoarchitectures. The SAXS instrument used a Cu Kα radiation (40 kV, 30 mA) source with a camera length of 700 mm. TG (Shimadzu DRG-60) was applied to trace the weight loss in the carbonization stage. Nitrogen adsorption-desorption isotherms were obtained by using a BELSORP-mini (MicrotracBEL Corp.) at 77 K. The surface areas were estimated by the multipoint Brunauer-Emmett-Teller method at a P/P0 range of 0.05 to 0.5 based on the adsorption data. The total pore volumes and pore size distributions were calculated from the adsorption branches of isotherms based on the Barrett-Joyner-Halenda model. ICP-MS was performed on a Thermo IRIS Intrepid II XSP spectrometer. Before measuring, the samples were degassed in a vacuum at 120°C for 12 hours. Surface chemical analysis was performed by XPS (PHI Quantera SXM, ULVAC-PHI Inc.).
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