Chloro decyl dimethylsilane

N-type phosphorus-doped silicon (111) wafers,
with resistivity of 0.01–0.018 Ω·cm, were used in
these experiments. Heptadecafluoro-1,1,2,2-tetrahydrodecyl) dimethylchlorosilane
(95% purum), (heptadecafluoro-1,1,2,2-tetrahydrodecyl)methyldichlorosilane
(97% purum) and 1H,1H,2H,2H-perfluorodecyltrichlorosilane (97% purum, stabilized
with copper) were purchased from abcr GmbH. Chloro-decyl-dimethylsilane,
acetone, diethyl ether, CH₂Cl₂ and triethylamine
(Et₃N) were purchased from Sigma-Aldrich. For surface modification,
CH₂Cl₂ was dried in a PureSolv EN solvent purification
system (Innovative Technology). Deionized (DI) water was obtained
from a Milli-Q Integral water purification system (Merck-Millipore).
Phosphate buffered saline (PBS, 10 mM, pH 7.4) was prepared from a
solution of NaCl (8.01 g/L), Na₂HPO₄ (1.41 g/L),
KH₂PO₄ (0.27 g/L) and KCl (0.20 g/L) in DI water.

n-Type
phosphorus-doped silicon (111) wafers,
with a resistivity of 0.01–0.018 Ω·cm, were used
in these experiments. Heptadecafluoro-1,1,2,2-tetrahydrodecyl)dimethylchlorosilane
(95% purum) was purchased from ABCR GmbH. Tris(pentafluorophenyl)borane,
chloro(dimethyl)octylsilane, chloro(decyl)dimethylsilane, chloro(dodecyl)dimethylsilane,
chloro(dimethyl)octadecylsilane, acetone, diethyl ether, CH₂Cl₂, and LiAlH₄ (1 M in ether) were purchased
from Sigma-Aldrich. Deionized (DI) water was obtained from a Milli-Q
Integral water purification system (Merck-Millipore). Phosphate-buffered
saline (PBS, 10 mM, pH 7.4) was prepared from a solution of NaCl (8.01
g/L), Na₂HPO₄ (1.41 g/L), KH₂PO₄ (0.27 g/L), and KCl (0.20 g/L) in DI water.