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M 2000

Manufactured by J.A. Woollam Co.
Sourced in United States

The M-2000 is a spectroscopic ellipsometer designed for thin film characterization. It measures the change in polarization of light reflected from a sample surface, allowing for the determination of optical properties and film thickness.

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18 protocols using m 2000

1

Comprehensive Ellipsometry Analysis of Device Layers

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Ellipsometry experiments were conducted for each layer of the device including bare glass of ITO, ITO layer, PCDTBT and metal (Al, Ag). The amplitude (Ψ) and phase (Δ) components of the complex reflectance ratio of light reflected were measured using a commercial spectroscopic ellipsometer (J.A. Woollam Co., M-2000) for three angles of incidence (55°, 65°, 75°). The normal incidence transmittance was also measured on the ellipsometer with the light source. The transmittance provided an additional data set that was fit simultaneously with the sets of Ψ and Δ spectra using the CompleteEASE ellipsometry modeling software. For PCDTBT, especially, 10 samples of different thicknesses were simultaneously fitted in order to achieve accurate n and k values.
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2

Pulsed Laser Epitaxy of Strained SCO Thin Films

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We used pulsed laser epitaxy to grow epitaxially strained SCO thin films on (001) (LaAlO3)0.3(SrAl0.5Ta0.5O3)0.7 (LSAT) substrates. We kept the sample thickness as 55 nm. Different annealing conditions were applied to systematically change the oxidation state of the BM-SCO thin films. P-SCO was also directly grown in O2 + O3 (5%) environment. Detailed sample preparation and other properties can be found elsewhere8 (link),10 (link). Spectroscopic ellipsometry was performed using an ellipsometer (M-2000, J. A. Woollam Co., Inc.) between 0.4 and 5.4 eV at an incident angle of ~60°, 70°, and 80°. Simple two-layer (film/substrate) model fit was used to successfully deduce the complex dielectric functions of thin films.
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3

Optical Characterization of Sr3(Ir1-xRux)2O7

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High-quality single-crystals of Sr3(Ir1-xRux)2O7 (x = 0.0, 0.22, 0.34, 0.42, 0.49, 0.65, 0.72, and 0.77) were grown via flux techniques. Dopant content was determined by energy-dispersive X-ray spectroscopy measurements which show a homogeneous Ru distribution within a central value ± 3% (Fig. S2 and Table S1 of the Supplemental Material). The X-ray diffraction measurements reveal no impurity phases within instrument resolution (~ 2–3%) (Fig. S3 of the Supplemental Material). Details of the growth procedure and characterizations were also described elsewhere22 (link),23 (link),28 (link).
We measured the ab-plane reflectivity spectra R(ω) in the photon energy region between 5 meV and 1 eV using a Fourier transform infrared spectrometer (VERTEX 70v, Bruker) with the in-situ gold overcoating technique52 (link). We employed spectroscopic ellipsometer (V-VASE and M-2000, J. A. Woollam Co.) to obtain the complex optical conductivity, σ ( ω) =  σ1(ω) + 2(ω), in the energy range from 0.74 to 5 eV. For the low-energy spectra below 5 meV, R(ω) was extrapolated by using the Hagen-Rubens relation24 . We carried out the Kramers–Kronig analysis of the R(ω) to obtain σ (ω).
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4

Growth and Optical Characterization of Sr3(Ir1-xMnx)2O7

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High-quality single crystals of Sr3(Ir1−xMnx)2O7 with x = 0, 0.09, 0.18, 0.36 were grown using a halide flux growth technique. Details of the single crystal growth were described in Ref. 22. We measured near-normal incidence reflectivity spectra R(ω) in the energy region between 5 meV and 1 eV using Fourier transform infrared spectrometer (Vertex 70v, Bruker). We employed in-situ gold overcoating technique to obtain accurate reflectivity data48 (link). Complex optical constants in the energy region between 0.74 and 5 eV were obtained using spectroscopic ellipsometer (M-2000, J. A. Woollam Co.). Optical conductivity was calculated from the R(ω) data through Kramers-Kronig transformation.
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5

Optical Characterization of Sb2Te3 Thin Films

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The refractive index and extinction coefficient were measured using a multiple-angle spectroscopic ellipsometer (J.A. Woollam Co. M-2000). The thickness of the Sb2Te3 thin film was determined through fitting the data from ellipsometer measurements. The thickness of the surface layer was 1.5 nm, and the thickness remains constant when the total thickness of the thin film increases. The reflection spectroscopy was measured using an ultraviolet–visible spectrophotometer.
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6

Ellipsometry Analysis of Photochromic Thin Films

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Ellipsometry was employed to determine the film thickness and the refractive index modulation vs. photo-stimulation, similarly to a recent paper on a related system [17 (link)]. Measurements were performed in a darkened room at 60°, 65°, and 70° angles of incidence, using a rotating compensator instrument (M-2000, J.A. Woollam Co. Inc., Lincoln, NE, USA) equipped with a 75 W Xe lamp. The measurements covered the 245–1700 nm spectral interval. The spot size on the sample was approximately a few mm2. Each sample was measured first in its open-ring form using a UV filter to prevent conversion during the procedure; the sample was then converted into closed-ring form with an UV LED at 325 nm (power density of 150 μW/cm2  for 10–15 min) and measured again. Dynamic measurements were collected in real-time during the conversion from the uncolored to the colored form. The data analysis exploited the manufacturer software (VASE, Lincoln, NE, USA). In this paper Ψ and Δ data have been fitted in the 800 nm < λ < 1700 nm range where both colored and uncolored forms are transparent. Cauchy and Sellmeier models were used for the wavelength dependence of the refractive index. In this spectral region, both models provide the same results.
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7

Multilayered Slab Waveguide Characterization

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The mode intensity profiles and effective refractive indices for the studied multilayered structures were calculated using the “1-D Waveguided Mode Solver for Dielectric Multilayer Slab Waveguides”56 . The confinement factors were calculated as the ratio of an optical field energy confined within a specific layer to the total mode energy. The experimental values of refractive indices were obtained using a rotating-compensator ellipsometer with a diode detector array and a xenon light source (J.A. Woollam Co. M-2000).
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8

Optical Characterization of Laser-Annealed Au Films

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The optical constants of Au
films before and after laser annealing were measured by spectroscopy
ellipsometry (M-2000, J.A. Woollam Co., NE, USA). We used an embedded
function of K–K mode in the CompleteEASE software (J.A. Woollam
Co., NE, USA) for the curve-fitting of the dielectric constants of
Au to maintain the consistency of the linear causality in the whole
spectrum physically. The data of the multiangle (45°, 55°,
65°, and 75°) measurements were analyzed. In addition, the
transmission spectra of the Au film before and after laser annealing
were measured using a spectrometer (QE-pro, Ocean Insight, FL, USA)
in the microscope, as shown in Figure 1a. From the transmission spectrum, the OD of the Au
film can be obtained. In particular, the integrity of the annealed
Au film can also be assessed by the bright-field image acquired by
the CCD of this microscope. The light source for the OD measurement
and the bright-field image is a halogen lamp.
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9

Spectroscopic Ellipsometry of Ultrathin Organic Films

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Spectroscopic Ellipsometry measurements were performed using a rotating compensator instrument (M-2000, J.A. Woollam Co., Lincoln, NE, USA, 245–1700 nm) equipped with a 75 W Xe lamp. Spectra have been collected in situ using a commercial liquid cell (J.A. Woollam Co., 0.5 mL).
To emphasize the contribution of the ultrathin organic layer, we analyzed difference spectra, which were obtained as the difference between the spectra acquired after the film deposition and the spectra measured on the substrate just prior to molecular deposition [40 (link),47 (link),49 (link)].
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10

Electrical Transport and Optical Properties of VO2 Thin Films

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To investigate the electrical transport properties, we used a physical property measurement system (Quantum Design Inc.). We used the four-point probe method, which is the most common method for measuring the resistivity35 . We deposited evenly spaced Pt contacts on the middle of the film surface. We applied a small constant current through the outer two contacts and measured the voltage between the inner two contacts. We swept the temperature in the range of 10–400 K. We measured the reflectance, R(ω), spectra in a photon energy range of 0.1–1 eV via a Fourier transform-type infrared spectrometer (model VERTEX 70 v; Bruker). We employed an in situ gold overcoating technique to obtain an accurate absolute value of R(ω). We obtained the optical conductivity of the VO2 film via a two-layer model fit of the measured R(ω) with Drude-Lorentz oscillators23 ,36 (link). We used spectroscopic ellipsometers (models V-VASE and M-2000; J. A. Woollam Co.) to obtain the complex dielectric constants, ϵ(ω)=ϵ1(ω)+iϵ2(ω) , in the energy region between 1 and 5 eV. The optical conductivity, σ1(ω), in this energy range can be calculated by σ1(ω)=ϵ0ωϵ2(ω) 23 , where ϵ0 is the vacuum permittivity.
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