The synthesized PANI powder and PANI/Gr were characterized by SEM, TEM, Fourier-transform infrared spectroscopy (FT-IR), and Raman spectroscopy (RS). The surface morphologies and compositions were characterized using a SEM-EDS, JSM-6510LA (JEOL, Tokyo, Japan). The TEM observation were carried out on a JEM-2100F (JEOL, Tokyo, Japan). The formed PANI layer was analyzed by RS and FT-IR. For RS, a Raman polychromator spectrometer (Bunko-Keiki M30-TP-M, Tokyo, Japan) was used with excitation by YVO4 solid-state laser at 532.0 nm wavelength. The laser power for the excitation was controlled below 5 mW to avoid damage to the PANI films. FT-IR spectra were measured in the wavenumber range of 4000–400 cm−1 at a resolution of 4.0 cm−1 by using Vertex-70 (Bruker, Ettlingen, Germany). XPS measurements were performed on a JPS-9200 (JEOL, Tokyo, Japan) with a Mg Ka (1253.6 eV) radiation. The calibrations of the binding energies were referenced to the Au 4f7/2 electron peak at 84.00A eV. The DC electrical conductivity of the powder was measured using a multifunction digital four-probe electrical conductivity measuring instrument (ST4742B, Suzhou Jingge Electronic Co. Ltd., Jiangsu, China). The AC dielectric properties of the ZRP coatings treated with different pigments were determined using an impedance analyzer Agilent E4980AL (Agilent, Santa Clara, CA, USA).
Jps 9200
Manufactured by JEOL
Sourced in Japan
The JPS-9200 is a high-resolution X-ray photoelectron spectroscopy (XPS) system designed for surface analysis. It provides precise measurements of the elemental composition and chemical state of the outermost layers of a material's surface.
Automatically generated - may contain errors
Lab products found in correlation
Jem 2000fx, by JEOL (3 mentions)
Miniflex 600, by Rigaku (2 mentions)
Na2hpo4, by Merck Group (2 mentions)
Nah2po4, by Merck Group (2 mentions)
Jsm 7001fa, by JEOL (2 mentions)
Jem 2100f, by JEOL (1 mentions)
Vertex 70, by Bruker (1 mentions)
Jsm 6510la, by JEOL (1 mentions)
Belsorp mini 2, by Microtrac (1 mentions)
Jem arm200finstrument, by JEOL (1 mentions)
Atx g, by Rigaku (1 mentions)
Jem arm200f microscope, by JEOL (1 mentions)
Jamp 9500f, by JEOL (1 mentions)
Tga dsc 3, by Mettler Toledo (1 mentions)
Jsm 7400f, by JEOL (1 mentions)
Ultrapycnometer 1000, by Anton Paar (1 mentions)
Palladium chloride, by Merck Group (1 mentions)
100 spectrometer, by PerkinElmer (1 mentions)
Hydroquinone, by Merck Group (1 mentions)
Jem 2100f uhr field emission instrument, by Ametek (1 mentions)
14 protocols using jps 9200
1
Characterization of PANI/Graphene Composites
2
Characterization of Nitrogen-Containing Thermoelectrics
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The elemental
analysis of NCT was performed using CHN
analyzers (CE440,
Exeter Analytical, Inc. and JM10, J-SCIENCE LAB Co., Ltd.) at the
Global Facility Center, Hokkaido University, Japan. For specific surface
area measurements of NC1223, the sample was pretreated
at 373 K under vacuum for 6 h, and then, the measurements were carried
out at 77 K using Belsorp-mini II (MicrotracBEL). Nitrogen was used
as the adsorptive gas. XPS data were collected at a pass energy of
10 eV using an Al X-ray source on a photoelectron spectrometer JPS-9200
(JEOL). The peak of C=C in the C 1s region was used as an internal
standard (284.7 eV) to calibrate the binding energies of the elements.
TEM images were taken by using JEM-2000FX (JEOL). HAADF–STEM
and EDS elemental mapping images were obtained using a JEOL JEM-ARM200F
instrument at 200 kV.
analysis of NCT was performed using CHN
analyzers (CE440,
Exeter Analytical, Inc. and JM10, J-SCIENCE LAB Co., Ltd.) at the
Global Facility Center, Hokkaido University, Japan. For specific surface
area measurements of NC1223, the sample was pretreated
at 373 K under vacuum for 6 h, and then, the measurements were carried
out at 77 K using Belsorp-mini II (MicrotracBEL). Nitrogen was used
as the adsorptive gas. XPS data were collected at a pass energy of
10 eV using an Al X-ray source on a photoelectron spectrometer JPS-9200
(JEOL). The peak of C=C in the C 1s region was used as an internal
standard (284.7 eV) to calibrate the binding energies of the elements.
TEM images were taken by using JEM-2000FX (JEOL). HAADF–STEM
and EDS elemental mapping images were obtained using a JEOL JEM-ARM200F
instrument at 200 kV.
3
Characterization of TiO2 powders by XPS
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Dried powders of TiO2-(1 ) and TiO2-(2 ) were placed on a carbon conductive tape to avoid the powders from swirling in the air. XPS data were collected by JEOL Ltd. JPS-9200.
4
Characterization of Amorphous Tantalum Oxide Thin Films
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The thickness
and mass density of the a-TaOx thin films
were determined by X-ray reflectometry using an X-ray diffractometer
(ATX-G, Rigaku Co., Ltd.). Characterizations of the atomic structures
and film porosity were performed via transmission electron microscopy
on a JEM-ARM200F microscope (JEOL Co., Ltd.) for a-TaOx (200 nm)/SiO2/Si thin films patterned
by focused ion beam milling with an FB-2000A system (Hitachi). The
resistivity of a-TaOx was measured by
the DC four-point probe method (in the van der Pauw electrode configuration)
with a source measurement unit (Keithley 2450) for a-TaOx (50 nm)/glass (CORNINGEAGLE XG) thin films. The
chemical compositions of the a-TaOx (5.7
nm)/Nb:STO (001) thin films and Rh-coated C-AFM probes were analyzed
by X-ray photoelectron spectroscopy with a photoelectron spectrometer
(JEOL Co., Ltd., JPS-9200) and AES with an Auger electron spectrometer
equipped with a field-emission scanning electron microscope (JEOL
Co., Ltd., JAMP-9500F).
and mass density of the a-TaOx thin films
were determined by X-ray reflectometry using an X-ray diffractometer
(ATX-G, Rigaku Co., Ltd.). Characterizations of the atomic structures
and film porosity were performed via transmission electron microscopy
on a JEM-ARM200F microscope (JEOL Co., Ltd.) for a-TaOx (200 nm)/SiO2/Si thin films patterned
by focused ion beam milling with an FB-2000A system (Hitachi). The
resistivity of a-TaOx was measured by
the DC four-point probe method (in the van der Pauw electrode configuration)
with a source measurement unit (Keithley 2450) for a-TaOx (50 nm)/glass (CORNINGEAGLE XG) thin films. The
chemical compositions of the a-TaOx (5.7
nm)/Nb:STO (001) thin films and Rh-coated C-AFM probes were analyzed
by X-ray photoelectron spectroscopy with a photoelectron spectrometer
(JEOL Co., Ltd., JPS-9200) and AES with an Auger electron spectrometer
equipped with a field-emission scanning electron microscope (JEOL
Co., Ltd., JAMP-9500F).
5
Comprehensive Characterization of MEPCM
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The phase compositions of the samples were characterized using X-ray powder diffraction (XRD, Rigaku, Miniflex600, Cu Kα). The surface chemical state was analyzed using X-ray photoelectron spectroscopy (XPS, JEOL, JPS-9200). XPS spectra were acquired using an Al Kα X-ray source (1486.6 eV). The calibration was carried out by referring to Au 4f7/2 (84.00 eV), Cu 2p3/2 (932.63 eV), and Ag 3d5/2 (368.28 eV). The morphology was observed by scanning electron microscopy-energy dispersive spectroscopy (SEM–EDS, JEOL, JSM-7400F). Brunauer–Emmett–Teller (BET) specific surface areas of the samples were analyzed based on the N2 adsorption/desorption techniques using a gas adsorption analyzer (Yuasa Ionics, Autosorb 6AG). The density of the samples was measured using a gas pycnometer (Quantachrome instruments, Ultrapycnometer1000). Additionally, the phase transition temperature and thermal storage ability were measured using a differential scanning calorimetry analyzer (DSC, Mettler-Toledo, TGA/DSC3 +). The MEPCM sample was placed in an Al2O3 crucible and heated from room temperature to 600 °C at a rate of 5.0 °C min−1 and maintained at this temperature for 5 min under an Ar gas flow (Purity 99.5%, rate 50 mL min−1).
6
Synthesis and Characterization of Pd@PSi-PPy-C Nanocomposite
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Powdered silicon (~40 µm), NaH2PO4, Na2HPO4, HF, HNO3, palladium chloride, polypyrrole-doped carbon black, and hydroquinone were purchased from Sigma Aldrich and used as received. We utilized double-distilled water for preparing all the solutions. The XPS for the Pd@PSi−PPy−C was achieved utilizing the MgKα spectrometer (JEOL, JPS 9200) under the following conditions: pass energy = 50 eV (wide-scan) and 30 eV (narrow-scan), voltage = 10 kV, and current = 20 mA. XRD spectra were recorded using the PANalytical X-ray diffractometer using Cu Kα1/2, λα1 = 154.060 p.m., λα2 = 154.439 p.m. radiation. A Perkin Elmer 100 spectrometer was used to record the FTIR spectra from the PSi and Pd@PSi−PPy−C nanocomposite. FE-SEM investigations were performed using an FE-scanning electron microanalyzer (JEOL-6300F, 5 kV). The elemental analysis of the as-grown Pd@PSi−PPy−C was performed by EDS (JEOL, Japan). TEM micrographs were taken at 200 kV using a JEOL JEM-2100F-UHR field emission instrument fitted out with a Gatan GIF 2001 energy filter and 1 k-CCD camera. Electrochemical investigations were performed utilizing a Zahner Zennium potentiostat (German).
7
Structural Characterization of Materials
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Powder X-ray diffraction (XRD) measurements were performed using a MiniFlex-600 (Rigaku, Cu Kα (λ = 1.5405 Å)). Transmission electron microscopy (TEM) observations were conducted using a JEM-2010 (JEOL). High-angle annular dark-field scanning-TEM (HAADF-STEM) observations and TEM electron energy loss spectroscopy (TEM-EELS) measurements were performed using a Titan3 G2 60-300 (FEI). TEM/STEM observations and EDS measurements shown in Fig. S3–S5† were performed using a JEM-2100 (JEOL). X-ray photoelectron spectroscopy measurements were performed using a JPS-9200 (JEOL, using Mg Kα X-ray).
8
Synthesis and Characterization of Yb2O3.CuO@rGO
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All necessary chemicals, including ascorbic acid, copper (II) nitrate, ytterbium (III) nitrate, sodium hydroxide, reduced graphene oxide, NaH2PO4, Na2HPO4, citric acid, glucose, uric acid, dopamine, sodium chloride, and calcium nitrate, were purchased from Sigma–Aldrich, and utilized exactly as they were given. All solutions were made using double-distilled water. The XPS investigation of Yb2O3.CuO@rGO was performed using a MgKα spectrometer (JEOL, JPS 9200) in the subsequent circumstances: pass energy = 50 eV (wide-scan) and 30 eV (narrow-scan), Voltage = 10 kV, Current = 20 mA. A PANalytical X-ray diffractometer was used to acquire X-ray diffraction (XRD) spectra with Cu Kα1/2, λα1 = 154.060 pm, λα2 = 154.439 pm radiation. A “Raman station 400 (Perkin Elmer)” spectrometer was used to acquire the Raman spectra. A FE-SEM (JEOL-6300F, 5 kV) was used to analyze the morphology and structural characteristics of Yb2O3.CuO@rGO. EDS (JEOL) was used to investigate the elemental composition of the Yb2O3.CuO@rGO. A JEOL JEM-2100F-UHR field emission apparatus fitted with a Gatan GIF 2001 energy filter and a 1 k-CCD camera was used to capture transmission electron microscopy (TEM) micrographs at 200 kV. Electrochemical measurements were conducted using a Zahner Zennium potentiostat.
9
Comprehensive Material Characterization Techniques
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X-ray diffraction (XRD) patterns of the samples were obtained using an X-ray diffractometer (Rigaku, Miniflex) equipped with a Cu Kα source operating at 40 kV and 15 mA. The surface morphologies were observed by field emission scanning electron microscopy (FE-SEM, JSM-7001FA, JEOL). Transmission electron microscopy (TEM) and selected area electron diffraction (SAED) patterns for the crystal were obtained using a conventional transmission electron microscope (JEM-2000FX, JEOL) operated at 200 kV. The nanoparticles were characterized using an X-ray photoelectron spectroscopy (XPS, JEOL, JPS-9200), equipped with a monochromatic Al Kα X-ray source (1486.6 eV). The analyzed area of the samples was 3 mm × 3 mm (large scale). The peak positions and areas were optimized by a weighted least-squares fitting method using 70% Gaussian and 30% Lorentzian line shapes. All XPS spectra were calibrated to the C (1 s) core level peak at 286.0 eV.
10
Characterization of Fabricated Membranes
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Transmission electron microscope (TEM) images of the fabricated membranes were observed using a JEM-2100F electron microscope (JEOL Ltd., Tokyo, Japan). Field Emission Scanning Electron Microscope (FE-SEM) images were observed using JSF-7500F electron microscope (JEOL Ltd.). Atomic force microscopy (AFM) images were observed using a SPA-400 (Hitachi High-Tech Science, Tokyo, Japan). The AFM observation was performed with an OMCL-AC160TS-C3 cantilever (OLYMPUS, Tokyo, Japan) in dynamic force mode. The crystal structures of the fabricated membranes were measured by powder X-ray diffraction (XRD) (Ultima IV Protectus, Rigaku Corp., Tokyo, Japan) using monochromatized Cu Kα radiation (at 40 kV and 40 mA). The ζ-potential of the sample surfaces was measured using an electrokinetic analyzer (SurPASS™ 3; Anton Paar, Graz, Austria) in 1 mmol/L of KCl aqueous solution. The surface chemical state of the membrane was analyzed using XPS (JPS-9200, JEOL Ltd.). Raman spectroscopy was recorded using a 532 nm laser (NRS-7100, JASCO, Tokyo, Japan). The samples for Raman spectroscopy were prepared by dropping each colloidal solution on a glass plate and drying.
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