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Tg 209 f1 thermal analyzer

Manufactured by Netzsch
Sourced in Germany

The TG 209 F1 thermal analyzer is a thermogravimetric analysis (TGA) instrument designed to measure the change in the weight of a sample as a function of temperature or time. The instrument provides precise measurements of weight changes, allowing for the determination of characteristics such as thermal stability, composition, and reaction kinetics of various materials.

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2 protocols using tg 209 f1 thermal analyzer

1

Thermogravimetric Analysis of Samples

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The thermogravimetry study was carried out on a NETZSCH TG 209 F1 thermal analyzer (NETZSCH STA 449 F1 Jupiter instrument, Netzsch, Selb, Germany) and the data obtained were analyzed. The thermal decomposition of the samples was analyzed in nitrogen in the temperature range from 25 to 700 °C. The protective and blowout gas flow rates were 20 mL/min. The samples were heated in cylindrical corundum crucibles in a dynamic temperature regime (10 °C/min). A TG 209 F1 analyzer was calibrated using the instructions and reference manifestations that appear with the instrument and weighing the samples on an XFR-125E laboratory balance. The measurement data were processed in the NETZSCH Proteus Thermal Analysis 4.8.4 software supplied with the instrument.
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2

Characterization of Graphene Oxide and Active Graphene

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The surface functional groups of graphene oxide (GO) and active graphene (JZGO) were analyzed by a Varian 640 infrared spectrometer, Varian Co., Atlanta, GA, USA. The test wavelength range was 400–4000 cm−1, the test resolution was 4 cm−1, and the scanning frequency was 32 times. The samples were analyzed by inVia-Reflex laser microscopy Raman spectroscopy. The excitation wavelength was 532 nm and the test range was 1000–3500 cm−1.
The crystallite sizes of the samples (GO and JZGO) and the change of the interlayer distance between the samples before and after the reaction were measured by D/max-2550VB+/PC X-ray diffractometer, Rigalcu Co., Tokyo, Japan. The test uses Cu-Kα radiation, tube pressure 40 kV, tube flow 200 mA, wavelength λ = 1.54 Å, and scanning angle range of 5–90°. The surface morphology of the samples was characterized by a HITACHI / TM-1000 scanning electron microscope, HITACHI, Tokyo, Japan. The thermogravimetric curve of the sample was measured by a TG 209 F1 thermal analyzer, NETZSCH Co., Selb, Germany. The temperature range was from room temperature to 900 °C under a gas atmosphere of N2 with a gas flow rate of 10 mL/min.
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