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Axis ultra dld photoelectron spectrometer

Manufactured by Shimadzu
Sourced in United Kingdom

The Axis Ultra DLD Photoelectron spectrometer is a scientific instrument designed for the analysis of the chemical composition and electronic structure of materials at the surface level. It uses X-ray photoelectron spectroscopy (XPS) technology to provide detailed information about the elemental composition, chemical bonding, and electronic states of the material being analyzed.

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2 protocols using axis ultra dld photoelectron spectrometer

1

XPS Analysis of Materials

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X-ray photoelectron spectroscopy analysis was performed with a Kratos Axis Ultra DLD Photoelectron spectrometer utilizing a monochromatized Al Kα radiation (1486.6 eV) as the X-ray source.
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2

Characterization of PES-Ag3PO4/g-C3N4 Photocatalysts

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The crystallinity and phase formation of the PES and PES-Ag3PO4/g-C3N4 film photocatalysts were analyzed using an X-ray diffractometer (PHILIPS PW 3040/60, Almelo, Netherlands) with CuKα radiation (λ = 0.154 nm, 30 kV, 30 mA) in the scan range of 2θ = 10° to 80° with a 2°/min of scanning speed. The surface film’s morphology was observed using a scanning electron microscope equipped with an electron dispersive X-ray analyzer (Fei Nova Nanosem 230, Eindhoven, Holland). Meanwhile, the cross-section film morphology was visualized by a scanning electron microscope equipped with an electron dispersive X-ray analyzer (SEM-EDX, HITACHI TM3000, Tokyo, Japan. A 3D measuring laser microscope (OLS5000 OLYMPUS, Hamburg, Germany) was used to capture the film’s surface roughness. The X-ray photoelectron spectra (XPS) of the prepared samples were recorded using a Kratos Analytical Axis Ultra DLD photoelectron spectrometer (Manchester, UK) using an Al Kα radiation monochromatic source. The water contact angle of the film was analyzed by a water surface analysis system (VCA 3000S, Billerica, MA, USA).
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