Agar sputter coater b7340
The Agar Sputter Coater B7340 is a laboratory equipment used for the deposition of thin metallic films on samples. The device utilizes a vacuum chamber and an electric field to ionize and accelerate metal atoms, which then deposit onto the surface of the sample. This process is commonly used in various scientific and industrial applications to enhance the conductive or optical properties of samples for analysis or further processing.
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3 protocols using agar sputter coater b7340
Scanning Electron Microscopy Analysis of Root Canal Smear Layer
Visualizing Native and Processed Wheat Bran
As an alternative to SEM microscopy, samples were also visualized via cryo-SEM using a Jeol JSM 7100F scanning electron microscope (JEOL Ltd, Tokyo, Japan). A small amount of wheat bran was placed on a sticky carbon surface mounted on an aluminium stub, vitrified in a nitrogen slush and transferred under vacuum conditions into the cryo-preparation chamber (PP3010T Cryo-SEM Preparation System; Quorum Technologies, Lewes, UK) conditioned at −140 °C. Subsequently, the sample was sublimated for 20 min at −70 °C to remove frost artefacts, sputter-coated with platinum using argon gas, transferred to the SEM stage at −140 °C and electron beam targeted at 3 keV.
Scanning Electron Microscopy of Gut Microbiome
(2003) 52 . After complete evaporation of the HMDS, samples were mounted on an aluminium pin (diameter: 12 mm) using double sided carbon tape and subsequently gold sputtered for 45 sec at 30mA (Agar Sputter Coater B7340, Agar Scientific, UK). Images were collected using a Phenom Pro X SEM microscope (Phenom-World B. V., the Netherlands) with a beam intensity of 10 keV.
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