The current-time transients of the anodization were record by a programmed power source (Agilent, N5752, Santa Clara, CA, USA) linked to a computer. Field emission scanning electron microscopy (FESEM) micrographs were obtained by FE-SEM Philips Sirion 200 (Amsterdam, The Netherlands) to analyse the structure of the AAO films.
Sirion 200
Manufactured by Philips
Sourced in Netherlands, Japan
The Sirion 200 is a high-performance lab equipment designed for scientific applications. It features advanced imaging capabilities and precise analytical functions. The core function of the Sirion 200 is to provide users with reliable and accurate data for their research and experiments.
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Lab products found in correlation
4 protocols using sirion 200
1
Anodization Transient Monitoring and AAO Characterization
2
Alloy Surface Characterization with Macrophages
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Morphology, roughness and elemental composition of different alloy surfaces co-cultured with or without macrophages were observed using scanning electron microscopy (SEM; Sirion 200, Philips, Eindhoven, Netherlands) and 3D surface topography instrument (Nanjing RanRui Technology Co., Ltd, China). The different alloys were removed from the medium after 5-day culture either with macrophages or not. They were lightly rinsed in sterile deionized water, washed twice in PBS, underwent ultrasonic bath with distilled water for 5 min and then fixed in 2% glutaraldehyde for 30 min. Afterward, the samples were washed three times in PBS and dehydrated via a series of graded ethanol solutions (50, 70, 80, 90, and 100%). Finally, the coupons were analyzed by SEM at 15 kV and 3D surface topography instrument.
3
Anodization Transient Monitoring and AAO Characterization
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The current-time transients of the anodization were record by a programmed power source (Agilent, N5752, Santa Clara, CA, USA) linked to a computer. Field emission scanning electron microscopy (FESEM) micrographs were obtained by FE-SEM Philips Sirion 200 (Amsterdam, The Netherlands) to analyse the structure of the AAO films.
4
Comprehensive Material Characterization Protocol
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SEM analysis was conducted using a Carl Zeiss Supra 40 field emission scanning electron microscope (2–5 kV, depending on the sample state). The SEM samples were coated with Au film for 30 s at a constant current of 30 mA before observation.
EDS data were acquired by EDS (Hitachi S4800, Hitachi Ltd., Tokyo, Japan; FEI, Sirion 200, Philips, Hillsboro, OR, USA).
Infrared spectra of the samples were acquired by a Thermo Scientific Nicolet 8700 FT-IR (Thermo Fisher Scientific, Madison, WI, USA) spectrometer in the attenuated total reflectance (ATR) mode.
XRD data were measured by a PANalytical X’pert PRO MRD X-ray diffractometer equipped with Cu Kα radiation (λ = 1.54056 Å).
Samples were characterized using a UV−Vis−NIR spectrophotometer (Lambda 750, PerKinElmer Inc., Waltham, MA, USA).
EDS data were acquired by EDS (Hitachi S4800, Hitachi Ltd., Tokyo, Japan; FEI, Sirion 200, Philips, Hillsboro, OR, USA).
Infrared spectra of the samples were acquired by a Thermo Scientific Nicolet 8700 FT-IR (Thermo Fisher Scientific, Madison, WI, USA) spectrometer in the attenuated total reflectance (ATR) mode.
XRD data were measured by a PANalytical X’pert PRO MRD X-ray diffractometer equipped with Cu Kα radiation (λ = 1.54056 Å).
Samples were characterized using a UV−Vis−NIR spectrophotometer (Lambda 750, PerKinElmer Inc., Waltham, MA, USA).
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