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Jem 1100

Manufactured by JEOL
Sourced in Japan

The JEM-1100 is a transmission electron microscope (TEM) manufactured by JEOL. It is designed to provide high-resolution imaging and analysis of samples at the nanoscale level. The JEM-1100 utilizes an electron beam to magnify and image the internal structure of materials, enabling the observation of fine details and the study of the atomic-scale properties of a wide range of specimens.

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5 protocols using jem 1100

1

Transmission Electron Microscopy of Nanocrystals

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The samples were prepared by dropping
dilute solutions of NCs onto carbon coated gold grids, which were
then placed under a vacuum to preserve them from oxidation. Low resolution
transmission electron microscopy (TEM) measurements were carried out
on a JEOL JEM-1100 transmission electron microscope operating at an
acceleration voltage of 100 kV. High resolution TEM (HRTEM) was performed
with a JEOL JEM-2200FS microscope equipped with a 200 kV field emission
gun, a CEOS spherical aberration corrector in the objective lens,
enabling a spatial resolution of 0.9 Å, and an in column energy
filter. High angle annular dark field images were acquired on the
same microscope in scanning mode (STEM) with a nominal probe size
of 0.2 nm, and an inner cutoff angle of the annular detector of 75
mrad.
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2

Visualizing Particle Trimer Nanostructures

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TEM was used to control the correct assembly of the particle trimer nanostructures. A droplet of the solution containing the purified structures was deposited on a plasma-exposed carbon-formvar-coated TEM grid (Ted Pella) and then dabbed off after 3 minutes. The grid was stained with 1% uranyl formate for 15 seconds. Imaging was performed with a JEOL JEM-1100 at an acceleration voltage of 80 kV.
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3

Polyplexes Characterization via TEM

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Polyplexes (pDNA concentration 10 μg/mL) were formed in water instead of HBG. The preparation of carbon-coated copper grids (Ted Pella, USA, 300 mesh, 3.0-mm OD) and the staining procedure was performed as described previously.46 All grids were analyzed with a JEOL JEM-1100 (JEOL, Tokyo, Japan) electron microscope at 80 kV acceleration voltage.
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4

Visualizing Particle Trimer Nanostructures

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TEM was used to control the correct assembly of the particle trimer nanostructures. A droplet of the solution containing the purified structures was deposited on a plasma-exposed carbon-formvar-coated TEM grid (Ted Pella) and then dabbed off after 3 minutes. The grid was stained with 1% uranyl formate for 15 seconds. Imaging was performed with a JEOL JEM-1100 at an acceleration voltage of 80 kV.
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5

Ultrastructural Analysis of Cells

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Cells (5 × 105 per well) were placed in 6-well flat-bottom plates (Corning®) with 2 mL of supplemented medium (Gibco™) for 24 h. Adherent cells were treated with IC50 of samples and controls for 24 h. Then, the culture medium was removed, and cells were fixed with 2.5% glutaraldehyde (Sigma®) for 24 h at 25 °C. Next, cells were washed with 0.1 M sodium cacodylate (Sigma®) (pH 7.2), and post-fixed with 1% osmium tetraoxide (Sigma®) for 1 h at 25 °C. Subsequently, cells were dehydrated with EtOH: propylene oxide (C3H6O, Sigma®) (50, 70, 90, 100% EtOH and 100% C3H6O, v/v) for 10 min at 4 °C. The inclusion of the cells was done with Poly/Bed® 812 epoxy resin (Polysciences®) at 60 °C for 24 h. Finally, ultrathin sections (60 nm thickness) were obtained with an ultramicrotome (Porter-Blum MT-1, Sorvall®). The slices were contrasted with 2% uranyl acetate (Polysciences®) for 20 min, and 0.2% lead citrate (Polysciences®) for 5 min. The observation of preparations was carried out in a TEM (JEM-1100, Jeol™) [30 ].
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