where the refers to the average thickness (nm) of SiBN coating; Hi (i = 1, 2... 10) refers to the thickness (nm) of SiBN at different positions; v refers to the deposition rate (nm/h); t refers to the deposition time (h).
X-ray diffraction (XRD, X’Pert pro, Philip; Cu K-Alpha, λ = 0.154 nm) was used to characterize the phase composition of the SiBN coating with a scanning speed of 0.1 s/step with 0.02°/step from 10° to 90°. The element types, element content and chemical bonding states of the SiBN coating were analyzed by X-ray photoelectron spectroscopy (XPS, Al K-Alpha, Thermo Scientific, New York, NY, USA) with pass energy of 100 eV, energy step of 1.0 eV, and number of energy steps is 1361.