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Az1505 photoresist

Manufactured by MicroChemicals
Sourced in Germany

AZ1505 is a positive photoresist designed for high-resolution photolithography applications. It is a liquid polymer coating that undergoes a chemical change when exposed to ultraviolet light, allowing for the selective removal of exposed areas during the development process. The product is intended for use in the fabrication of microelectronic devices and other precision components.

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3 protocols using az1505 photoresist

1

Fabrication of Nanoparticle Sensor Array

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Pyrex glass wafers are coated with 10 nm chromium and 50 nm gold. This metal layer is patterned as metal tracks to form independent conductive domains on the wafer. Subsequently, AZ1505 photoresist (MicroChemicals GmbH) is spin-coated and patterned with circular openings towards the underlying metal tracks. The metal tracks are meander-shaped to accommodate an array of sensors in a small area, increasing the density of sensing nodes. The metal tracks end in pads that are connected to an external circuit which provides the negative bias voltage to collect positively charged nanoparticles produced by spark ablation. The total substrate size is 23 × 23 mm; however, the sensing area is 1600 × 600 µm2 located at the center of the chip. The chip is designed in such a way that it can be incorporated into an integrated circuit to form a plug-and-play device at a later stage.
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2

Fabrication of Microfluidic Biosensor

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LB, phosphate buffered saline (PBS), sodium chloride, Tween 40, Tween 60, and Tween 80 were purchased from Sigma Aldrich (Oakville, ON, USA). Fluorinert FC-40 was purchased from 3M (St. Paul, MN, USA) and chemicals for photolithography were supplied by Rohm and Haas (Marlborough, MN, USA). Fluoroalkylsilane Dynasylan F 8263 was supplied by Evonik (Essen, Germany). AZ1505 photoresist and Teflon-AFR were procured from Microchemicals GmbH (Ulm, Germany) and DuPont (Wilmington, DE, USA), respectively. Parylene-C dimer and Silane A174 were purchased from Plasma Parylene Coating Services (Rosenheim, Germany) and superparamagnetic Dynabeads M-280 Tosylactivated were purchased from Thermo Fisher Scientific (Waltham, MA, USA). Ampicillin and isopropyl β-D-1-thiogalactopyranoside (IPTG) were procured from Applichem, Darmstadt, Germany, and L-Arabinose from Acros Organics. Mouse monoclonal anti-Salmonella typhimurium LPS antibody (ab8274) was obtained from Abcam (Cambridge, UK).
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3

Yeast Strain Culturing with Specialized Reagents

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Saccharomyces cerevisiae strain BY4741 was used in all experiments. Propidium iodide (PI; 540/608 nm) was supplied by Sigma Aldrich (Saint Louis, MO, USA). Amphotericin B was purchased from Sigma Aldrich (Saint Louis, MO, USA). Fluorinert FC-40 was purchased from 3M (St. Paul, MN, USA). Chemicals for photolithography, including S1818 and 351developer, were supplied by Rohm and Haas (Marlborough, MN, USA). AZ1505 photoresist was purchased from Microchemicals GmbH (Ulm, Germany). Parylene-C dimer and Silane A174 were purchased from Plasma Parylene Coating Services (Rosenheim, Germany). Teflon-AF® was obtained from Dupont (Wilmington, DE, USA).
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