Dsx1000

For qualitative observation of filament wettability, the digital microscope DSX1000 (co. Olympus, Tokyo, Japan) was used. An objective lens (DSX10-XLOB20X) with a 20 mm working distance and scanning mode polarisation observation was selected. Images were taken with a total magnification of 700.

The surfaces of the membranes were examined microscopically using a digital microscope (DM) DSX 1000 (Olympus, Tokyo, Japan) at 20× magnification. Analyses were performed at 3 different locations (1 mm × 1 mm) for each membrane. The DM provided the 2-dimensional and 3-dimensional images of the analyzed areas.

The printing efficiency was tested using an Olympus DSX 1000 (Olympus Corporation, Tokyo, Japan) microscope. The cross-sections of the vertically and horizontally orientated and heat-treated test specimens were tested. The samples were prepared for microscope observation via metallographic preparation, grounding and polishing. The cross-sections of the horizontally and vertically orientated test specimens are shown in Figure 7. The crossing direction was perpendicular to the printing direction of the test specimens.

Samples were mounted and prepared for metallographic observation combining the grinding steps for hard materials, SiC particles, and the polishing steps for soft materials, Al-Si matrix. Metallographic observations were performed by Olympus DSX1000 (Olympus Corporation, Shinjuku, Japan), optical microscope (OM) and JSM-7001F (JEOL, Akishima, Japan) scanning electron microscope (SEM). Octane Pro (Edax, Mahwah, NJ, USA) probe for energy X-ray dispersion spectroscopy (EDS) was employed for phase recognition.

An optical digital microscope (DSX1000, Olympus Co., Ltd., Tokyo, Japan) was utilized to obtain the 3-D micro-morphologies and 2-D cross-section profiles of the parts with appropriate magnifications. The measuring device has been calibrated by the technicians during installation, and the subsequent use process can ensure the accuracy and repeatability of the measurement. The measuring device has been calibrated by the technicians during installation, and the subsequent use process can ensure the accuracy and repeatability of the measurement. Ten of the microstructures at the same intervals along the diameter direction were selected and numbered from 1 to 10. The specific measurement method is shown in Figure 3b; relatively flat points are selected on the top and bottom of the rectangular microstructure. The d_i1 and d_i2 are measured, respectively, and the average value d_i (i = 1, 2, …, 10) is taken. The replication depth of the microstructure array was chosen as the response variable for statistical analysis of the experimental result.