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18 protocols using axis ultra xps

1

Multimodal Characterization of Powder Materials

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A Bruker D8 DaVinci powder
X-ray diffractometer was used for analysis of powders uniformly placed
on glass slides (Cu Kα, 0.0504°/s step). XPS was performed
on a Kratos Axis Ultra XPS (Al Kα) with samples mounted on carbon
tape. XPS peak analysis was performed using CasaXPS software (www.casaxps.com). ICP–OES
(PerkinElmer Optima DV 7000) was used for bulk elemental analysis.
Samples were dissolved in a heated 5:1 mixture of concentrated H2SO4:HNO3 and diluted with 5% HNO3. Calibration standards were prepared from 1000 ppm commercial
ICP standards for Ti, Co, Cu (Alfa Aesar), and Ni (Fluka). UV–vis
DRS spectra were collected on a Cary 5000 Series spectrophotometer
(300–800 nm, 10 nm/s). Raw reflectance data were converted
to Kubelka–Munk units [F(R)], and band gaps were calculated using [F(R) × E]1/2 extrapolations
of linear regions of the curve. SEM images were collected on a Hitachi
S-4800 FE-SEM with an accelerating voltage of 1.3 kV. Samples were
mounted on aluminum stubs using carbon tape and were not coated prior
to analysis. BET surface area measurements were collected on a Quantachrome
NOVA 1200 using approximately 50 mg of solid sample.
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2

XPS Characterization of Surface Composition

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Measurements were carried out using a Kratos Axis Ultra XPS (Manchester, UK) with a monochromated Al Kα source (1486.6 eV, 12 kV, 10 mA) and a charge neutralizer. Survey spectra were collected with 100 eV pass energy, while high resolution spectra were collected with 20 eV pass energy. The CasaXPS software was used for data analysis. The corresponding reference signal was the C1s signal with a binding energy of 285 eV. Curve fitting was performed using the Gaussian–Lorentzian distribution with the deduction of the Shirley background.
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3

Surface Characterization of Spectinamide 1599

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Surface characterization of as received spectinamide 1599 and L-leucine, spray dried 100% spectinamide and L-leucine, and spray dried spectinamide 1599:Leu measurements were made using a Kratos Axis Ultra XPS (Manchester, UK). Samples were analyzed using monochromated aluminum K-alpha X-rays at a setting of 15 kVand 10 mA. The pass energy was set to 160 eV for survey scans and 20 eV for region scans.
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4

X-ray Photoelectron Spectroscopy Analysis

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XPS spectra were obtained using a Kratos Axis Ultra XPS with monochromated Al source and using a charge neutralizer. Spectra were taken from 1200 to 10 eV and high-resolution scans were taken about the Co, Ni, Cu, and Zn 2p peaks. These high-resolution scans were used for quantification.
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5

Synthesis and Characterization of Graphene Quantum Dots

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GQDs were synthesized by a modified protocol through a top-down “oxidation-cutting” process.15 (link) 50 mg of carbon fibers was dispersed into a 4 mL mixture of sulfuric acid and nitric acid (3:1 v/v). The prepared solution was sonicated for 2 h and mechanically stirred for 24 h at 80 °C. Afterward, the mixture was cooled and diluted with deionized (DI) water to the concentration of 0.15 mg/mL. Sodium hydroxide was added into the solution to adjust the pH value to neutral. The mixture was further dialyzed in DI water for 3 days to obtain the final product. The size and shape of GQDs were characterized by TEM (JEOL 3011 HREM). The element analysis was performed by XPS (Kratos, Axis Ultra XPS). The light emission properties of GQDs and their assemblies were investigated by fluorescence spectroscopy (Horiba, Fluoromax-3).
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6

Characterization of Material Structure

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The structural properties of materials were characterized using an FEI Nova NanoSEM 450 (Thermo Fisher Scientific), FEI Talos F200X S/TEM (Thermo Fisher Scientific), Thermo Nicolet Nexus 870, and Kratos Axis Ultra XPS at the Manitoba Institute of Materials (MIM), University of Manitoba, Winnipeg, Canada. The SEM samples were mounted on pin stubs using carbon tape and coated with a gold‐palladium (Au‐Pd) coating to enable high magnifications. XRD peaks of powdered samples were collected in the range from 5 to 80° 2‐theta using continuous scan mode with a scan rate of 3° min−1 and report interval of 0.05°. The measurement of specific surface area of the materials was determined by the BET analysis.
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7

X-ray Photoelectron Spectroscopy Characterization

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XPS characterization was conducted using a Kratos AXIS-ULTRA XPS (Kratos Analytical, Manchester, UK). The X-ray source was a monochromatic Al source operated at 300 W. The analyzer was set in the constant pass energy mode, the lens system in the “hybrid” configuration, and the aperture in the “slot” position. This ensures the highest sensitivity with an analyzed spot of approximately 700 microns × 300 microns, which is the size of the monochromatic X-ray beam. Survey scans, used for elemental analysis and apparent concentrations calculations, were recorded with a pass energy of 160 eV and a step size of 1 eV. High energy resolution spectra, used for chemical analysis, were recorded at 20 eV or 40 eV pass energy and step size of 0.05 eV or 0.1 eV, depending on the amount of each element.
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8

X-ray Photoelectron Spectroscopy Analysis Protocol

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A Kratos Axis ULTRA XPS incorporating a 165 mm hemispherical electron energy analyzer was used. The incident radiation was monochromatic A1 X-rays (1486.6 eV) at 225 W (15 kV, 15 ma). Survey (wide) scans were taken at an analyzer pass energy of 160 eV and multiplex (narrow) higher resolution scans at 20 eV. Survey scans were carried out over 1200–0 eV binding energy range with 1.0 eV steps and a dwell time of 100 ms. Narrow higher resolution scans were run with 0.2 eV steps and 250 ms dwell time. Base pressure in the analysis chamber was 1.0 × 10–9 Torr and during sample analysis 1.0 × 10–8 Torr. The data were analyzed by the software XPS PEAK. An integral (nonlinear) backgrounds subtraction was used for the treatment of XPS data. The peak shape assumption uses the asymmetric mixed Gaussian–Lorentzian functions.
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9

X-ray Photoelectron Spectroscopy Analysis

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XPS was carried out using a Kratos Axis ULTRA XPS with monochromatic Al X-rays (1486.6 eV) at 225 W (15 kV, 15 mA). XPS was conducted using the conditions as reported by us previously.10 (link) The sensitivity factors provided with the instrument were C 1s – 1, N 1s – 1.676, and O – 2.881.
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10

Surface Composition of Etched Papers

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The surface composition of etched and unetched papers were examined using a Kratos AXIS Ultra XPS (Manchester, UK). Paper samples were also washed by dipping in deionized water (DI H2O) and then air dried to eliminate soot formed by the cutting/etching process.
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