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Supra 40vp sem

Manufactured by Zeiss
Sourced in Germany

The Supra 40VP SEM is a scanning electron microscope (SEM) produced by Zeiss. It provides high-resolution imaging capabilities for a variety of applications. The Supra 40VP SEM utilizes a field emission gun (FEG) as its electron source, enabling the generation of a high-brightness electron beam. This instrument is designed to deliver detailed, high-quality images of samples at the nanoscale level.

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32 protocols using supra 40vp sem

1

Characterization of Si Nanowires in SiNWS

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To characterize the Si nanowires embedded in the SiNWS, we cut the SiNWS to expose the cross sections of the silicon nanowire arrays. The broken SiNWS was placed on the SEM sample holder for SEM imaging (ZEISS Supra 40VP SEM at an accelerating voltage of 10 keV). For SEM characterization of EVs captured on Si nanowires, the SiNWS were separated from the NanoVilli Chip after capturing EVs from 100 μL of artificial plasma samples. The EVs immobilized on SiNWS were fixed in 4% PFA for 1 h. The samples were dehydrated by sequential immersion in 30, 50, 75, 85, 95, and 100% ethanol solutions for 10 min per solution. After overnight lyophilization, sputter-coating with gold was performed at room temperature. The morphology of EVs immobilized on Si nanowires was observed using a ZEISS Supra 40VP SEM at an accelerating voltage of 10 keV.
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2

Elemental Analysis of Recovered Implants

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After the implant push-out test, the dislocated Ti implants were recovered from femur bones.The implant surface was scanned by EDS (Supra 40VP SEM, ZEISS, Thornwood, NY). EDS analysis was completed in 5 segments, covering the entire length of the implant. The elemental composition of Ti, calcium (Ca) and phosphorous (P) was determined from the mean of the 5 segment measurements for each implant. The recovered implants were further spatter-coated with iridium (Ir) and examined by SEM (Supra 40VP SEM, ZEISS, Thornwood, NY).
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3

SEM and Elemental Analysis of Tissue

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Ring quarters for SEM and elemental analysis were embedded in Optimal Cutting Temperature compound, flash-frozen in liquid nitrogen, and stored at -80°C. Frozen sections were collected on Cryofilm 2c (UConn Health Sciences, Molecular Core Facility), attached to 12.7 mm Zeiss aluminum pin subs (16111–9, Ted Pella, Redding, CA) using adhesive carbon dots (16084–1, Ted Pella, Redding, CA), and critical point dried before sputter coating with iridium, as above. All samples were imaged using a Zeiss Supra 40VP SEM (Carl Zeiss Microscopy, LLC, White Plains, NY). EDS was performed using an integrated Thermo Noran UltraDry System SIX EDS system (ThermoFisher, Waltham, MA). The details of SEM imaging are presented in the appropriate Figure legends.
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4

Scanning Electron Microscopy of Powder Samples

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SEM images of the powders were obtained using a Zeiss Supra 40VP SEM (Carl Zeiss Microscopy GmbH). Powder samples were mounted on aluminum SEM stubs using double-sided carbon tape, and then sputter coated with 15–20 nm of platinum/palladium (Pt/Pd) under argon using a Cressington sputter coater 208 HR (Cresssington Scientific Instruments Ltd., Watford, UK). To compare the morphology of undispersed powders versus fully dispersed powders, a second set of samples was prepared in which the powder was dispersed onto double-sided tape using the RODOS disperser at 4 bar pressure. Imaging proceeded as previously described.
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5

Hydrogel Swelling and Imaging

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Hydrogels were submerged in deionized water for 5 h. After full swelling, the hydrogels were sectioned and freeze-dried for 3 d. All sectioned samples were then sputter-coated with Iridium using an ion beam sputter deposition (Ion Beam Sputter Deposition and Etching System, South Bay Technology) and imaged using a ZEISS Supra 40VP SEM (Carl Zeiss) at the California NanoSystems Institute at University of California-Los Angeles.
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6

Clearing Seeds for Microscopic Analysis

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Immature seeds were cleared in Hoyer’s solution (30 mL of water, 100 g of chloral hydrate, 7.5 g of Arabic gum, and 5 mL of glycerin) on a glass slide and examined with a compound microscope equipped with Nomarski optics. For scanning electron microscopy (SEM) the plant material was dried in liquid carbon dioxide and mounted on stubs using double sided adhesive and conductive tabs. Next, plant material was coated with gold and platin before imaging with a Zeiss Supra 40VP SEM (Carl Zeiss NTS, Oberkochen, Germany). For each experiment at least three biological replicates were used.
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7

Nanoparticle Characterization by SEM

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Samples were visualized by Scanning Electron Microscopy (SEM) on a Zeiss supra 40 V P SEM (Carl Zeiss Microscopy GmbH, Iena, Germany), fitted with a GEMINI column, which made it possible to work in Inlens mode. It was equipped with an energy dispersive spectroscopy (EDS) microanalysis system. The nanoparticle solution samples were deposited on copper, silicon and/or platinum substrates (one drop deposit). They were not metallized before observation. The areas of interest were first located in backscattered electron mode.
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8

Platinum/Palladium Sputter Coating SEM Imaging

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Samples mounted on standard aluminum SEM stubs were sputter coated with 12 nm platinum/palladium (Pt/Pd) in an argon atmosphere using a sputter coater 208HR (Cressington Scientific Instruments Ltd., Watford, UK). The particles were imaged using a Zeiss Supra 40VP SEM (Carl Zeiss Microscopy GmbH, Jena, Germany).
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9

Characterization and Mechanical Properties of Zn-TiB2 Nanocomposite

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The high purity Zn and Zn-3vol%TiB2 nanocomposite samples, both in hot rolling conditions, were prepared by mechanical grinding, alumina nanoparticle polishing and ion milling polishing for microstructure characterization using a scanning electron microscopy (ZEISS Supra 40VP SEM). The dispersion and size distribution of in situ TiB2 nanoparticles was also investigated by SEM and energy-dispersive x-ray spectroscopy (EDS) analysis, with image processing through Image Pro. Microhardness test was performed covering the entire samples by LM 800AT microhardness tester using a load of 200gf with a 10s dwell time. The tensile testing specimens were fabricated by electrical discharge machining (EDM). The gage length and width of the tensile specimens were 10 mm and 4 mm, respectively (ASTM E8/E8M standard sub-size). Tensile tests were carried out using Instron ElectroPlus 1000 at a strain rate of 2 mm/min. 0.2% proof stress was used as yield strength.
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10

Characterizing EV Distribution on Si Nanowires

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To characterize the distribution of EVs on Si nanowire arrays after capture/release, SiNWS were cut to expose the cross-sections of Si nanowire arrays and incubated with 4% PFA for 1 h at room temperature. Next, the substrates were dehydrated by sequentially immersing in 30%, 50%, 75%, 85%, 95%, and 100% ethanol solutions for 10 min per solution. After drying, the substrates were sputter-coated with gold and imaged under a ZEISS Supra 40VP SEM at an accelerating voltage of 10 keV.
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