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Jem 7600f

Manufactured by JEOL
Sourced in Japan

The JEM-7600F is a high-performance field emission scanning electron microscope (FE-SEM) designed for advanced materials characterization. It features a stable electron optical column, high-resolution imaging, and a range of analytical capabilities to support various research and industrial applications.

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6 protocols using jem 7600f

1

Comprehensive Characterization of Metal-Organic Framework Materials

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Powder X-ray diffraction (PXRD) spectra were obtained using a Bruker instrument (D8 Advance) at 1600 W (40 kV, 40 mA). The scanning speed was 0.4 s/step at 0.04° increments. Nitrogen adsorption analysis was performed on a BELSORP-max automatic volumetric gas adsorption analyzer and the sample was activated by evacuating at 120 °C for 24 h. The morphology of MOF particles and coated separators was evaluated using a field emission scanning electron microscope (FE-SEM, JEM-7600F, JEOL, Tokyo, Japan). Attenuated total reflection Fourier transform infrared (ATR-FTIR) spectroscopy was performed using a Nicolet iS50 FTIR spectrometer (Thermo Scientific, Waltham, MA, USA). The UV-visible absorption spectra were recorded using a Shimadzu UV-2600 instrument with quartz cuvettes.
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2

Comprehensive Materials Characterization Protocol

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Powder X‐ray diffraction patterns were obtained by a SmartLab X‐ray diffractometer (Rigaku, Japan) with Cu Kα radiation at 1200 W (40 kV, 30 mA). X‐ray absorption spectroscopy including XANES and the EXAFS was conducted at a multipole‐wiggler 10C beamline and NEXAFS measurement were performed at the 4D beam line at the Pohang Accelerator Laboratory (PAL, Republic of Korea). The synchrotron radiations were monochromatized using a Si(111) double crystal monochromator. The incident beams were detuned with the proper rates for harmonic rejection. TEM and SEM images and video were obtained using a JEM‐ARM200F (JEOL, Japan) operated at 200 kV and JEM‐7600F (JEOL, Japan) operated at 15 kV, respectively. XPS spectra were collected by a Thermo VG Scientific K‐alpha (Thermo Scientific, USA) using Al Kα radiation at 350 W (3 mA). Four‐point probe measurement was conducted by CMT‐SR2000 (Changmin Tech Co., Ltd).
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3

Ultrastructural analysis of Fusarium oxysporum

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Conidia and mycelia of a 6-day culture of F. oxysporum f. sp. gladioli from the above mentioned treatments were fixed in solutions of 2.0% glutaraldehyde for 24 h at 5 °C. Samples were rinsed three times with 0.02 M phosphate buffer for 2 h and postfixed with 2% osmium tetraoxide for 2 h at room temperature (26 °C). Dehydration was made with ethanol at gradual concentrations (30-100%) for 15 min each one. They were dried in the presence of CO2 for 40 min (SAMDRI-780B Tousimis), and mounted on stubs with carbon tape and covered with gold in a metal ionizer (Baltec SDC 50) for 15 min. Samples were observed in an electronic scan microscope (Jeol model JEM 7600F) with a resolution of 4 nm at 15 Kv.
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4

Structural and Optical Analysis of VO2 Nanoparticles

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Structural analysis of as-purchased and as-fabricated VO2 nanoparticles and the VO2 mesh film were determined by
Shimazu X-ray diffractometer with Cu Kα radiation (λ =
0.1541 nm). The morphology of VO2 nanoparticles, as well
as the SAED (selected area electron diffraction), were characterized
using a transmission electron microscope (JEM-2010, JEOL, Japan) with
an accelerating voltage of 200 kV. The microstructures of the VO2 mesh film were observed by the optical and the field emission
scanning electron microscopes (JEM-7600F, JEOL, Japan). The element
analysis mapping of the VO2 mesh was also characterized
by energy-dispersive X-ray spectroscopy (EDX) attached with JEM-7600F.
The visible transmittance of transparent resistance switches and the
infrared transmittance for VO2 (M) confirmation were carried
out using Agilent Cary 5000 UV–vis–NIR spectrometer.
A heating stage (PE120, Linkam, U.K.) was employed to control the
temperature of the samples mounted on the spectrophotometer. The performance
of the VO2 mesh resistance switch was determined under
room temperature and atmospheric pressure. The IV characteristics of the device were measured by Agilent
B1500A digital source meter connected with triaxial cables to the
probe station.
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5

Comprehensive characterization of MOF and NPC materials

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The purity of MOF and NPC materials were investigated by powder x-ray diffraction (PXRD) using a Bruker D8 advance instrument (Billerica, MA, USA) equipped with CuKα radiation (λ = 1.54178 Å). The morphology of MOF and NPC materials were observed by high-resolution scanning electron microscopy (HR-SEM, JEOL JEM-7600F instrument, Akishima, Japan). The NPC materials morphology was characterized by transmission electron microscopy (TEM, using a JEM-2010 instrument, Tokyo, Japan) at a voltage of 200 KV. The synthesized NPC materials were also recorded with a Raman spectra on a CCD detector (Stanford Computer Optics Inc., Berkeley, CA, USA) using a He-Ne laser with an excitation wavelength of 632.8 nm. The Zn element presence was investigated by inductively coupled plasma-mass spectrometry (ICP-MS, Japan Agilent 7500ce, Tokyo, Japan). The elemental analysis (C, N, O) was executed by an elementar vario EL III CHN-OS elemental analyzer (Germany). N2 gas adsorption, CO2 gas adsorption of all materials were measured using micrometrics (Norcross, GA, USA) and the gas sorption analysis purpose, the materials were dried at 120 °C for 12 h under vacuum.
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6

Characterization of Nanoemulsion Formulation

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Transmission electron microscopy (TEM) was conducted to confirm the internal structure and physical size and surface morphology of trial formulation using electron microscope operating at accelerating voltage of 200 kv (JEM 1400-Plus, JEOL Ltd., Tokyo, Japan). Properly diluted (1:100) and filtered test sample was gently placed over copper grid (200 mesh), then stained with 2% phosphotungstic acid and after drying finally observed under the microscope. The external surface and physical size of CSO NE was examined by scanning electron microscopy (SEM) (JEM 7600F, JEOL Ltd., Tokyo, Japan). Trial NE was freezed at -196 • C in liquid nitrogen and then sublimed at -90 • C for 10 min. In next the step, trial samples were sputtered at 10 mA for 30 s and images were finally captured.
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