Mf 319 developer
MF-319 is a positive-tone photoresist developer. It is a liquid chemical solution used in the photolithography process to selectively remove exposed areas of a photoresist film on a semiconductor wafer or other substrate.
Lab products found in correlation
5 protocols using mf 319 developer
Fabrication of PDMS Microcontact Printing Stamps
Polystyrene Bead Synthesis and Characterization
polystyrene
bead solutions (2.6% w/v, 1 μm diameter) were purchased from
Polysciences (Warrington, PA). Shipley S1808 photoresist, Thinner
P, and MF-319 developer were purchased from Microchem (Newton, MA).
Clean Earth Chemicals 24K gold plating solution (Grobet USA, Carlstadt,
NJ) was used as received. Fisher Premium glass microscope slides (1
mm thick) were used as substrates. Magnetite nanoparticles of 20 nm
(20 mg/mL in citrate buffer) were purchased from nanoComposix (San
Diego, CA) and diluted 1000-fold in water prior to use.
Fabrication of PDMS Microcontact Stamps
Synthesis and Functionalization of Iron Oxide Nanoparticles
Fabrication of Microfluidic Devices
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