AFM images of treated bacterial samples were acquired with a Bruker Innova in dry condition on a ~ 25 mm2 p-type silicon wafer (Sigma-Aldrich). Before depositing bacterial suspension onto the substrate, it was cleaned with a CO2 snow jet while being held on a hot surface at 300 °C. Subsequently, 5 μl of E. coli (106 cfu/ml) suspended in PBS were deposited onto the substrate and allowed to air dry. Before scanning the sample, the substrate was rinsed with deionized water to reduce build-up of salt during dehydration. The images were acquired in tapping mode with a BRUKER RTESPA-300 probe (T: 3.4 μm; L: 125 μm; W: 40 μm; f0: 300 kHz; k: 40 Nm−1).
P type silicon wafer
Manufactured by Merck Group
A P-type silicon wafer is a semiconductor substrate made of silicon with a positive charge carrier concentration. It is a key component in the manufacturing of various electronic devices and integrated circuits.
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Lab products found in correlation
2 protocols using p type silicon wafer
1
Atomic Force Microscopy of E. coli
2
Graphene Oxide-M13 Hydrogel Synthesis
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The GO-M13 0303-5′ hydrogel was immediately self-assembled after mixing GO and M13 in DIW. The final concentration of GO and M13 was 0.3 mg mL -1 each, within a final volume of 1 mL. Subsequently, the microtube was placed on an orbital shaker at 250 rpm for 15 min and centrifuged at 15 000 rpm (SciSpin MICRO Centrifuge, RCF = 15 100g) for 1 min. A P-type silicon wafer (Sigma-Aldrich®) was cleaved (∼25 mm 2 ) and cleaned with a CO 2 snow jet on a hot plate at a temperature of 250 °C. After the centrifugation, 900 µL of the supernatant was removed, and the pellet was well resuspended. 50 µL of the final hydrogel were deposited onto the Si substrate and finally, dried for 1 h in a vacuum chamber (Edwards® Rotary vacuum pump E2M2) until reaching a pressure of ∼90 Pa.
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