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Sigma 500 vp fe sem device

Manufactured by Zeiss

The SIGMA 500 VP FE SEM is a high-performance scanning electron microscope (SEM) developed by Zeiss. It features a field emission electron source, enabling high-resolution imaging of a wide range of samples. The core function of this device is to provide detailed topographical and compositional information about the surface of specimens through the interaction between the electron beam and the sample.

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2 protocols using sigma 500 vp fe sem device

1

Comprehensive Material Characterization Protocol

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X-ray powder diffraction (XRPD) patterns of the samples were recorded on a PANalytical empyrean machine equipped with Cu Kα radiation as the X-ray source [71 (link)]. Measurements were made between 5 and 40° 2θ angles. Fourier transform infra-red (FTIR) measurements were performed on a PerkinElmer Frontier device with ZnSe ATR unit in the wavenumber region from 4000–500 cm−1 in the transmittance mode at a scan rate of 64 scans per cycle [72 (link)]. Thermal stability of the samples was assessed using thermogravimetric analysis (TGA) employing 10 mg sample on a TGA 4000 device by PerkinElmer under N2 atmosphere [73 (link)]. Scanning electron microscopy (SEM) imaging was performed on a ZEISS SIGMA 500 VP FE SEM device under different magnifications [74 (link)].
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2

Electrochemical Characterization of SPCE

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The Autolab potentiostat/galvanostat PGSTAT101 (Metrohm) was used as the main instrument in which the NOVA 2.1 was the interfacing software. The electrode was screen‐printed carbon electrodes (SPCE, DRP‐C110) from Dropsens, Spain. Scanning electron microscopy (SEM) imaging and energy dispersive spectroscopy (EDS) were performed by Zeiss Sigma 500 VP FESEM device. The Zeiss‐EM10C‐80 KV TEM device completed transmission (TEM) imaging.
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