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K575x high resolution sputter coater

Manufactured by Zeiss

The K575X is a high resolution sputter coater by Zeiss. It is designed to deposit thin, uniform metallic films onto samples for analysis in electron microscopy.

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2 protocols using k575x high resolution sputter coater

1

Nanoscale Imaging of SSHEL Particles

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SSHEL particles were washed with PBS and fixed in 4% formaldehyde, 2% glutaraldehyde in 0.1 M cacodylate buffer and post fixed using a 1% osmium tetroxide solution. They were then dehydrated in a series of graded alcohols and air dried after a final dehydration course of tetramethylsilane. The samples were subsequently coated with a thin layer of Au/Pd using an EMITECH K575X high resolution sputter coater set at 5 mA deposition current and imaged in a Zeiss NVision40 at a working distance of 5.0–8.2 mm; the SEM was operated at 3 keV landing energy and secondary electrons were recorded at the SE2 detector. The images were acquired with a fast dwell time of 50 ns with × 10 line averaging and at a pixel sampling of 5 nm.
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2

Bacterial Ultrastructure Imaging Protocol

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An aliquot of bacterial culture growing statically was carefully pipetted and gently placed onto a Sterlitech PETE membrane filter and incubated for 2 hours without disturbance or vacuum, allowing the bacteria to settle on the substrate and maintain the structural integrity of the fine fimbriae. The samples were covered to prevent contamination and drying out. The samples were then fixed in a cocktail of 4% formaldehyde and 2% glutaraldehyde in 0.1M cacodylate buffer and subsequently post-fixed using a 1% osmium tetroxide solution. They were then dehydrated in a series of graded alcohols ranging from 35% to 100% with the final dehydration completed using a Tousimis (Rockville, MD) critical point dryer. The dried samples were then coated with a thin layer of iridium using an EMITECH K575X high-resolution sputter coater and imaged with the Zeiss 450 FE-SEM (Oberkochen, DE) at 1.50kV using the InLens SE detector.
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