The largest database of trusted experimental protocols

Auriga small dual beam fib sem

Manufactured by Zeiss

The Auriga Small Dual-Beam FIB-SEM is a focused ion beam (FIB) scanning electron microscope (SEM) system designed for high-resolution imaging and precise material modification. It combines a gallium ion beam for milling and a high-resolution SEM column for imaging, enabling comprehensive sample analysis and preparation.

Automatically generated - may contain errors

Lab products found in correlation

2 protocols using auriga small dual beam fib sem

1

Multiscale Microscopy Techniques for Material Characterization

Check if the same lab product or an alternative is used in the 5 most similar protocols
SEM observations were carried out using Zeiss Auriga Small Dual-Beam FIB-SEM in the Laboratory for Multiscale Imaging (LMSI) at Stevens Institute of Technology. This microscope has a GEMINI field-emission electron column that provides a resolution of 1.0 nm @ 15 kV and 1.9 nm @ 1 kV. The SEM images were acquired at 2 kV with the in-lens EsB (energy selective backscattering) detector. HAADF-STEM observations were carried out using a probe-corrected Hitachi HD 2700C at the Center for Functional Nanomaterials at Brookhaven National Laboratory. The microscope has a cold field-emission gun source. The STEM images were acquired at 200 kV with a spatial resolution of 1.4 Å. AFM observations were carried out by Bruker MultiMode 8 AFM at the Advanced Science Research Center at the City University of New York (CUNY).
+ Open protocol
+ Expand
2

Microscopic Imaging of Crystal Morphology

Check if the same lab product or an alternative is used in the 5 most similar protocols
Imaging of internal crystal morphology was performed using a Zeiss Auriga Small Dual-Beam FIB-SEM.12 (link),13 For these analyses all samples were first coated with 4 nm iridium prior to SEM imaging, then coated with 50 nm of Au prior to performing FIB. A 30 kV 120 pA gallium ion beam was oriented perpendicular to the sample by tilting the sample stage to 54° and utilized to mill 15 nm serial cross-sections. SEM images of cross-sectioned surfaces were then obtained using a 2.0 kV 600 pA electron beam and a secondary electron detector at a working distance of 5.0 mm. Images of surfaces containing electron beam damage were created for comparison to images of undamaged surfaces but were not used for the purposes of discussion in this publication. Images were taken shortly after cross sectioning to limit the exposure of the uncoated surfaces to the electron beam.12 (link),13
+ Open protocol
+ Expand

About PubCompare

Our mission is to provide scientists with the largest repository of trustworthy protocols and intelligent analytical tools, thereby offering them extensive information to design robust protocols aimed at minimizing the risk of failures.

We believe that the most crucial aspect is to grant scientists access to a wide range of reliable sources and new useful tools that surpass human capabilities.

However, we trust in allowing scientists to determine how to construct their own protocols based on this information, as they are the experts in their field.

Ready to get started?

Sign up for free.
Registration takes 20 seconds.
Available from any computer
No download required

Sign up now

Revolutionizing how scientists
search and build protocols!