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Auriga field emission sem

Manufactured by Zeiss
Sourced in Germany

The Auriga field-emission scanning electron microscope (FE-SEM) is a high-performance imaging and analysis tool designed for advanced materials characterization. It features a high-brightness field emission electron source, delivering high-resolution imaging capabilities across a wide range of accelerating voltages. The Auriga FE-SEM is a versatile platform that enables comprehensive sample analysis and visualization at the nanoscale.

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6 protocols using auriga field emission sem

1

Microscopic Analysis of tGFRP Cross-section

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Optical reflected light microscopy (ZEISS Axioskop with differential interference contrast) and an analysis via a scanning electron microscope (ZEISS Auriga field-emission SEM) were used for the evaluation of the tGFRP cross-section for each plate. Specimens were taken from the center of the plates and were prepared in accordance with the method of the previous publication [8 (link)].
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2

Microscopic Analysis of Material Samples

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For the microscopic analyses of the cross-sections of the specimens, they were first embedded in an epoxy resin (Struers EpoFix Resin from Struers GmbH, Willich, Germany). The grinding and polishing steps were accomplished on the Struers TegraPol-11 machine (Struers GmbH, Willich, Germany). Wet grinding (water-based) was done with diamond suspensions (Struers DiaPro 3 µm and 9 µm) while polishing was done with alumina suspensions (Buehler MasterPrep 0.05 µm from ITW Test & Measurement GmbH, Esslingen am Neckar, Germany) on different adhesive discs (Struers MD-Plan and Struers MD-Dur for diamond-grinding and Buehler Master Tex MD Rondo for alumina-polishing). While ZEISS Axioskop with DIC (differential interference contrast) was used for optical reflected-light-microscopy, a ZEISS Auriga field-emission SEM was the scanning electron microscope used in this study. For the preparation of SEM samples, the specimens were sputtered with a 5 nm thick layer of Pt-Pd (with Sputter Coater Quorum Technologies Q150T-ES from Quorum Technologies Limited, Laughton, East Sussex, UK).
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3

Nanocomposite Morphology Investigation

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The morphology of the produced nanocomposite specimens is investigated through a Zeiss Auriga Field Emission SEM. Fracture surfaces of the films are realized upon immersion in liquid nitrogen and, when required, the fractured films are sputter coated with a conductive 10 nm Cr layer by employing a Quorum Tech Q150T sputter coater.
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4

Bacterial Cell Morphology and Propagation Characterization via SEM

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Scanning electron microscopy (SEM) was used to characterize bacterial cell morphology and μSiM-CA bacterial propagation as previously described (Masters et al., 2019a (link), 2020 (link)). For cell morphology characterization, S. aureus cultures were grown overnight, and then subcultured and seeded onto poly-L-lysine-coated glass coverslips for 6 h before rinsing bacterial cells and fixating with 2.5% glutaraldehyde/4% paraformaldehyde in 0.1 M cacodylate buffer overnight. Similarly, μSiM-CA membranes were incubated for 6 h, as described above, and fixed with 2.5% glutaraldehyde/4% paraformaldehyde in 0.1 M cacodylate buffer overnight. Samples were postfixed in 1% osmium tetroxide, dehydrated in a graded series of ethanol to 100%, and critical point dried in a Tousimis CPD (Rockville, MD, United States). Samples were sputter coated with gold and imaged using a Zeiss Auriga Field Emission SEM (Jena, Germany) for quantification of cell diameters or qualitative assessment of bacterial propagation. ImageJ, specifically Fiji (Schindelin et al., 2012 (link)), was used to measure the maximum cell diameter across six separate SEM images per cell type, where a minimum of 20 cells were measured in each image.
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5

Immature DCs Platelet Adhesion SEM

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Immature DCs complexed to platelets (day 5) were allowed to adhere onto poly‐L‐lysine–coated coverslips for 2 h and were subsequently placed into 0.1 M sodium cacodylate–buffered 2.5% glutaraldehyde at 4°C for overnight fixation. The cells on the cover glasses were post‐fixed using the same buffer in 1.0% osmium tetroxide and then transitioned through a graded series of ethanol to 100% (×2), then through a graded series of 100% ethanol/hexamethyldisilazane (HMDS) and finally into three changes of pure HMDS. The last change was allowed to evaporate off of the cover glasses overnight in a fume hood. The cover glasses were then mounted onto aluminum stubs and sputter coated with gold. Imaging was performed using a Zeiss Auriga field emission SEM (Carl Zeiss AG, Oberkochen, Germany).
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6

Cryo-SEM Visualization of CMF Structures

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Cryo-scanning electron microscopy (cryo-SEM) to visualize the CMF structures at high resolution. A small volume or each sample (1 drop) was placed on a rivet-type holder and immersed in liquid nitrogen. Cryo-planing was done using a cryo-ultramicrotome (Leica Ultracut UCT EM FCS) with a section thickness of 100 nm and a speed of 60 mm/s with a glass knife. The last sections were reduced to 20 nm, at a speed of 2 mm/s using a diamond knife (Diatome histo cryo 8 mm from DiATOME PA, USA) at -110 °C. The rivet was mounted on a chamber Cryoprotective product (Gatan Inc., USA) and the temperature of the sample was increased for a brief time to -90 °C under vacuum to remove a thin layer of water by sublimation. The sample was sputter-coated with platinum (20 to 120 s depending on the sample) and was imaged using a Zeiss Auriga field-emission SEM (Zeiss, Germany) at -125 °C and an acceleration voltage of 3 kV.
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