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Xe 100 atomic force microscope

Manufactured by Park Systems
Sourced in Germany

The XE-100 atomic force microscope is a scientific instrument used for high-resolution imaging and analysis of surface topography at the nanoscale level. It operates by scanning a sharp probe across a sample surface, detecting and measuring the interactions between the probe and the sample to generate detailed three-dimensional images of the surface features.

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6 protocols using xe 100 atomic force microscope

1

Atomic Force Microscopy Imaging of Protein Fibrils

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An XE-100 atomic force microscope (Park Systems, Suwon, Korea) was used for the imaging of fibrils. Surface imaging was obtained in non-contact mode using silicon/aluminum coated cantilevers (SSS-NCHR 10M; Park Systems) 125 μm long with a resonance frequency of 204 to 397 kHz nominal force constant of 42 N/m and a typical tip radius 2 nm (<5 nm max). Here we used a low tip radius probe to improve measurements of fibril widths. The scan frequency was typically 0.5 Hz per line. When necessary, the AFM images were processed by flattening, in order to remove the background slope, and the contrast and brightness were adjusted. As done in [38 (link)], for sample preparation, muscovite mica with a surface area of ~1 cm2 was used as the substratum. The mica was freshly cleaved using adhesive tape prior to each deposition in order to ensure its cleanliness. The dried samples were dissolved in 10 mM phosphate buffer, pH7. 2 μL aliquots of protein were deposited on the substrates and the samples were dried by evaporation at room temperature under a ventilated fume hood. For washed samples, two min after deposition, the surfaces were gently washed with deionized water. Finally, the samples were dried as described above.
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2

Atomic Force Microscopy Analysis of CaOx Crystals

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Crystal shape and size were also investigated by atomic force microscopy (AFM). Briefly, 50 μl of CaOx crystals, obtained as mentioned above, were layered on glass surfaces and dried by nitrogen flow. The XE-100 atomic force microscope (AFM; PARK Systems Inc.) was used in this study; the instrument was equipped with a 50μm scanner controlled by XEP 1.8.1 software. The AFM was set in non-contact mode, with the X–Y stage in closed loop and high voltage modes. The Z scanner was set in closed loop and high voltage modes and resolution set to 1.8Å. The speed scan was 0.25Hz for large images and 1Hz for the 1x1μm acquisition. The tips used in the present study were the NCHR type with a nominal spring constant of 42 N/m and a typical resonant frequency between 250 and 300kHz. The data acquisition was performed in air at controlled temperature. In addition to topography, amplitude and phase signals were acquired. The amplitude signal was used as a unique drive for the Z feedback circuit, thus rendering the phase signal to exclusively depend on chemical and nano-mechanical proprieties of the surfaces. The phase signal evaluation (Phase Detection Microscopy PDM) was carried out randomly on CaOx particles by using a 1x1μm scanning area, with around 25 images for each condition analysed. AFM images were analysed using XEI software (PARK Systems Inc.).
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3

Atomic Force Microscopy Imaging of Films

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AFM imaging was carried out by using an XE-100 atomic force microscope (Park systems Corporation, Suwon, Korea). The analyses were carried out in a true noncontact mode under ambient conditions using silicon cantilevers with a spring constant of 42 N m−1 (PPP-NCHR, Park Systems Corp.) and images were recorded in topography mode. Images were collected from 15 to 20 arbitrary areas on the film and were recorded in 256 × 256 pixel resolution. Particles were then grouped at 5 nm intervals based on measured heights.
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4

Surface Roughness Characterization of ZrO2 Coatings

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The XE-100 atomic force microscope by Park Systems (Mannheim, Germany) in Silesian University of Technology in Gliwice was used for the research in the non-contact operation mode, requiring the micro-probe to vibrate. Due to capillary or van der Waals forces, the amplitude and frequency of the probe oscillate. The force acting on the probe is determined by amplitude or frequency detection, which allows the observation of the surface topography to be made. The distance between the probe and the surface ranges from several to tens of nanometers.
In order to describe the surface of the samples, the roughness coefficient (RMS), expressed in nanometers, was determined. The RMS coefficient is the standard deviation of the mean value calculated from the area on the basis of a grid of points (characterized by the height Zi). The surface roughness Ra was also determined. The RMS surface roughness coefficient and the surface roughness Ra were calculated in the XEI program integrated with the AFM microscope, which is a tool for editing the obtained images and processing them. The measurements were made for the initial state and with the ZrO2 layer applied for the areas 25 × 25 μm2. For each research variant, 10 measurements were made for each sample [18 ,19 ].
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5

Atomic Force Microscopy of Extracellular Vesicles

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Vn96-precipitated EVs were dispersed with proteinase K digestion in 50 µl PBS. The preparation was diluted 1∶100 in de-ionized water and adsorbed to freshly cleaved mica sheets that were rinsed with de-ionized water and dried under a gentle stream of nitrogen. Two to four biological repeats were used for each sample type. The samples were scanned in non-contact mode using a Park Systems XE-100 atomic force microscope equipped with a silicon cantilever (f0∼300 kHz, Park Systems). Topographic and phase images were recorded simultaneously at a resolution of 512×512 pixels, at a scan rate of 1 Hz. Image processing was performed using the Park Systems XEI software.
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6

Atomic Force Microscopy Imaging Protocol

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In addition, images were taken from one sample from each group using an atomic force microscope operated in noncontact mode (Park Systems XE 100 Atomic Force Microscope, Korea) (10000 μ at 4000 speed [10 × 10]).
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